Thin Solid Films最新文献

Compositional effects on the structural, mechanical, and electrical properties of Cr–Nb–N thin films 成分对Cr-Nb-N薄膜结构、力学和电学性能的影响

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-10 DOI: 10.1016/j.tsf.2025.140840

A. Farhadizadeh , Y. Wei , M. Odén

This study reports the structural, morphological, mechanical, and electrical properties of Cr-Nb-N films deposited on MgO (001) and c-plane sapphire substrates by dc magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy, nanoindentation, and electrical resistivity measurements. High-quality epitaxial Cr and CrN films were obtained, and the effects of Nb and N incorporation were systematically analyzed. Cr films on MgO remained epitaxial with increased hardness and electric resistivity when the Nb content was increased to 12%, while a high Nb content (40 at%) resulted in a nanocrystalline film. Adding nitrogen to such nanocrystalline Cr–Nb alloys yielded a phase mixture of metallic and ternary nitrides, which enhanced the hardness up to 26 GPa and resulted in a large variation in the electrical behavior. Additions of Nb into epitaxial CrN resulted in a linear lattice expansion while decreasing the electrical resistivity of CrN by two orders of magnitude. These findings demonstrate that precise control of Nb and nitrogen enables tunable structural, mechanical, and electrical properties in Cr-Nb-N films.

本文报道了用直流磁控溅射技术在MgO（001）和c平面蓝宝石衬底上沉积Cr-Nb-N薄膜的结构、形态、力学和电学性能。通过x射线衍射、扫描电子显微镜、纳米压痕和电阻率测量对薄膜进行了表征。获得了高质量的Cr和CrN外延膜，并系统分析了Nb和N掺入对外延膜的影响。当铌含量增加到12%时，MgO表面的Cr膜仍呈外延状，硬度和电阻率均有所提高，而当铌含量达到40%时，MgO表面形成纳米晶膜。在纳米晶Cr-Nb合金中加入氮气，形成了金属氮化物和三元氮化物的混合相，使合金硬度提高到26gpa，电学性能也发生了很大的变化。在外延CrN中加入Nb后，CrN的电阻率降低了两个数量级，晶格呈线性膨胀。这些发现表明，精确控制Nb和氮可以使Cr-Nb-N薄膜的结构、机械和电学性能可调。

{"title":"Compositional effects on the structural, mechanical, and electrical properties of Cr–Nb–N thin films","authors":"A. Farhadizadeh , Y. Wei , M. Odén","doi":"10.1016/j.tsf.2025.140840","DOIUrl":"10.1016/j.tsf.2025.140840","url":null,"abstract":"<div><div>This study reports the structural, morphological, mechanical, and electrical properties of Cr-Nb-N films deposited on MgO (001) and c-plane sapphire substrates by dc magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy, nanoindentation, and electrical resistivity measurements. High-quality epitaxial Cr and CrN films were obtained, and the effects of Nb and N incorporation were systematically analyzed. Cr films on MgO remained epitaxial with increased hardness and electric resistivity when the Nb content was increased to 12%, while a high Nb content (40 at%) resulted in a nanocrystalline film. Adding nitrogen to such nanocrystalline Cr–Nb alloys yielded a phase mixture of metallic and ternary nitrides, which enhanced the hardness up to 26 GPa and resulted in a large variation in the electrical behavior. Additions of Nb into epitaxial CrN resulted in a linear lattice expansion while decreasing the electrical resistivity of CrN by two orders of magnitude. These findings demonstrate that precise control of Nb and nitrogen enables tunable structural, mechanical, and electrical properties in Cr-Nb-N films.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140840"},"PeriodicalIF":2.0,"publicationDate":"2025-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737381","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Peculiar orientation relationships of metallic AsSb nanoparticles embedded in low temperature molecular beam epitaxy grown GaAsSb 低温分子束外延生长GaAsSb中金属AsSb纳米颗粒的特殊取向关系

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-06 DOI: 10.1016/j.tsf.2025.140838

L.A. Snigirev , A.V. Myasoedov , N.A. Bert , V.V. Preobrazhenskii , M.A. Putyato , B.R. Semyagin , V.V. Chaldyshev

GaAs_0.97Sb_0.03 and Al_0.3Ga_0.7As_0.97Sb_0.03 epitaxial layers were grown on GaAs (001) substrates by molecular beam epitaxy at temperatures as low as 150 °C or 200 °C. The grown samples were then subjected to thermal treatment within a temperature range of 400–600 °C. The microstructure evolution of the samples upon annealing was examined using transmission electron microscopy. The results indicated that the second phase AsSb nanoparticles formed within the epitaxial layers as a result of thermal treatment have rhombohedral lattice of

R \bar{3} m

space group inherent in bulk As and Sb. However, the fine AsSb particles, measuring less than approximately 10 nm, were discovered to adopt an abnormal, symmetry-incompatible orientation in respect to the zinc-blende GaAs_0.97Sb_0.03 semiconductor matrix. Furthermore, an increase in the particle size over 10 nm was found to be accompanied by reorientation of the particles towards the ordinary, symmetry-compatible orientation relationships. This reorientation is believed to be driven by minimization of the particle-matrix lattice mismatch stress and to occur through atom migration.

采用分子束外延技术，在低至150℃或200℃的温度下，在GaAs（001）衬底上生长出GaAs0.97Sb0.03和Al0.3Ga0.7As0.97Sb0.03外延层。然后在400-600°C的温度范围内对生长的样品进行热处理。用透射电镜观察了样品退火后的微观组织演变。结果表明，热处理后在外延层内形成的第二相AsSb纳米颗粒具有块体as和Sb固有的R3¯m空间群的菱形晶格。然而，尺寸小于约10 nm的细小AsSb粒子在锌-闪锌矿GaAs0.97Sb0.03半导体基体中呈现出异常的、对称不相容的取向。此外，当粒径超过10 nm时，颗粒会向普通的对称相容取向关系重新取向。这种重定向被认为是由粒子-基质晶格错配应力的最小化驱动的，并通过原子迁移发生。

{"title":"Peculiar orientation relationships of metallic AsSb nanoparticles embedded in low temperature molecular beam epitaxy grown GaAsSb","authors":"L.A. Snigirev , A.V. Myasoedov , N.A. Bert , V.V. Preobrazhenskii , M.A. Putyato , B.R. Semyagin , V.V. Chaldyshev","doi":"10.1016/j.tsf.2025.140838","DOIUrl":"10.1016/j.tsf.2025.140838","url":null,"abstract":"<div><div>GaAs<sub>0.97</sub>Sb<sub>0.03</sub> and Al<sub>0.3</sub>Ga<sub>0.7</sub>As<sub>0.97</sub>Sb<sub>0.03</sub> epitaxial layers were grown on GaAs (001) substrates by molecular beam epitaxy at temperatures as low as 150 °C or 200 °C. The grown samples were then subjected to thermal treatment within a temperature range of 400–600 °C. The microstructure evolution of the samples upon annealing was examined using transmission electron microscopy. The results indicated that the second phase AsSb nanoparticles formed within the epitaxial layers as a result of thermal treatment have rhombohedral lattice of <span><math><mrow><mi>R</mi><mover><mn>3</mn><mo>¯</mo></mover><mi>m</mi></mrow></math></span> space group inherent in bulk As and Sb. However, the fine AsSb particles, measuring less than approximately 10 nm, were discovered to adopt an abnormal, symmetry-incompatible orientation in respect to the zinc-blende GaAs<sub>0.97</sub>Sb<sub>0.03</sub> semiconductor matrix. Furthermore, an increase in the particle size over 10 nm was found to be accompanied by reorientation of the particles towards the ordinary, symmetry-compatible orientation relationships. This reorientation is believed to be driven by minimization of the particle-matrix lattice mismatch stress and to occur through atom migration.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140838"},"PeriodicalIF":2.0,"publicationDate":"2025-12-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737380","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Polymorphism and defect structure of CdTe thin films grown on different substrates by thermal sputtering 热溅射生长在不同衬底上的碲化镉薄膜的多态性和缺陷结构

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-05 DOI: 10.1016/j.tsf.2025.140835

I.S. Volchkov , I.O. Koshelev , D.R. Khairetdinova , P.V. Reznikova , D.N. Khmelenin , A.V. Butashin , V.M. Kanevsky

The paper presents data on the structural features, including defects features, of thin CdTe films grown by high-vacuum thermal sputtering on Al₂O₃ (0001), Si (111) substrates, fluorine tin oxide and indium tin oxide layers on silicate glasses, and amorphous silicate glass under different temperature conditions. The results demonstrate that the kinetic features of sputtering processes lead excess Cd formation with increasing substrate temperature what could be related to an increase of desorption rates of Cd and Te atoms. This leads to a violation of stoichiometry and the formation of Te precipitates covered with a TeO₂ layer due to the presence of free Te regions, which has been demonstrated using X-ray diffraction, atomic force microscopy, energy-dispersive X-ray spectroscopy, transmission electron microscopy, diffraction of electrons and Raman spectroscopy. It is shown for the first time that increasing the substrate temperature to 500 °C leads not only to a decrease in the film growth rate due to an increase in the desorption rates of the sputtered atoms, but also to the formation of a highly oriented thin CdTe film with a sphalerite structure on an amorphous substrate.

本文介绍了不同温度条件下，在Al2O3（0001）、Si（111）衬底、氟氧化锡和铟氧化锡硅酸玻璃和非晶硅酸玻璃上采用高真空热溅射生长CdTe薄膜的结构特征，包括缺陷特征。结果表明，随着衬底温度的升高，溅射过程的动力学特征导致Cd的过量生成，这可能与Cd和Te原子的解吸速率的增加有关。由于自由Te区域的存在，这导致了化学计量学的违反和TeO2层覆盖的Te沉淀的形成，这已经用x射线衍射、原子力显微镜、能量色散x射线光谱、透射电子显微镜、电子衍射和拉曼光谱证明了。首次表明，将衬底温度提高到500℃，不仅由于溅射原子的解吸速率增加而导致薄膜生长速率降低，而且在非晶衬底上形成具有闪锌矿结构的高取向CdTe薄膜。

{"title":"Polymorphism and defect structure of CdTe thin films grown on different substrates by thermal sputtering","authors":"I.S. Volchkov , I.O. Koshelev , D.R. Khairetdinova , P.V. Reznikova , D.N. Khmelenin , A.V. Butashin , V.M. Kanevsky","doi":"10.1016/j.tsf.2025.140835","DOIUrl":"10.1016/j.tsf.2025.140835","url":null,"abstract":"<div><div>The paper presents data on the structural features, including defects features, of thin CdTe films grown by high-vacuum thermal sputtering on Al<sub>2</sub>O<sub>3</sub> (0001), Si (111) substrates, fluorine tin oxide and indium tin oxide layers on silicate glasses, and amorphous silicate glass under different temperature conditions. The results demonstrate that the kinetic features of sputtering processes lead excess Cd formation with increasing substrate temperature what could be related to an increase of desorption rates of Cd and Te atoms. This leads to a violation of stoichiometry and the formation of Te precipitates covered with a TeO<sub>2</sub> layer due to the presence of free Te regions, which has been demonstrated using X-ray diffraction, atomic force microscopy, energy-dispersive X-ray spectroscopy, transmission electron microscopy, diffraction of electrons and Raman spectroscopy. It is shown for the first time that increasing the substrate temperature to 500 °C leads not only to a decrease in the film growth rate due to an increase in the desorption rates of the sputtered atoms, but also to the formation of a highly oriented thin CdTe film with a sphalerite structure on an amorphous substrate.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140835"},"PeriodicalIF":2.0,"publicationDate":"2025-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737379","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Tailoring the composition and deposition kinetics of RF-sputtered BaTiO3 thin films through working pressure and target-substrate distance adjustments 通过工作压力和靶基距离的调整来调整rf溅射BaTiO3薄膜的组成和沉积动力学

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-04 DOI: 10.1016/j.tsf.2025.140836

Edgar Chaslin, Jade Clément, Quentin Simon, Alejandro Borroto, Mohamed Himdi, Xavier Castel

Optimizing the growth of BaTiO₃ thin films is essential for operating their ferroelectric and dielectric properties for embedded microelectronic applications. The present study investigates in a combinatorial-like approach the deposition of BaTiO₃ thin films by radiofrequency magnetron sputtering on SiO₂/Si substrates under various working pressures (1 to 6 Pa) and target-substrate distances (7.5 to 9.2 cm). X-ray diffraction (XRD), Atomic Force Microscopy (AFM) and Rutherford Backscattering Spectroscopy (RBS) characterizations were used to establish the relationships between the sputtering deposition parameters and the resulting deposition rates, crystalline quality, surface roughness, and stoichiometry of the BaTiO₃ thin films. Low pressures and short distances lead to high kinetic growth of amorphous Ba-deficient films. Increasing working pressure

\times

target-substrate distance values above 0.30 Pa.m enables to attain the stoichiometric Ba/Ti ratio. This result is related to both Ba and Ti species thermalization into the plasma leading to improve the chemical composition of the films. Furthermore, crystalline quality of the BaTiO₃ films is improved by reducing the deposition rate through working pressure and target-substrate distance adjustment. These results can provide valuable roadmaps to set BaTiO₃ sputtering parameters for high-quality thin films deposition based on the stoichiometry balance and deposition kinetics, that can be further extended to other perovskite compounds.

优化BaTiO3薄膜的生长对其铁电性能和介电性能在嵌入式微电子应用中的应用至关重要。本研究在不同的工作压力（1 ~ 6 Pa）和靶基距离（7.5 ~ 9.2 cm）下，采用射频磁控溅射方法在SiO2/Si衬底上沉积了BaTiO3薄膜。通过x射线衍射（XRD）、原子力显微镜（AFM）和卢瑟福后向散射光谱（RBS）表征，建立了溅射沉积参数与BaTiO3薄膜的沉积速率、结晶质量、表面粗糙度和化学计量学之间的关系。低压和短距离导致非晶缺钡薄膜的高动力学生长。增加工作压力×目标-衬底距离值大于0.30 Pa。m可以得到Ba/Ti的化学计量比。这一结果与Ba和Ti在等离子体中热化导致薄膜化学成分的改善有关。此外，通过调节工作压力和靶基距离来降低沉积速率，提高了BaTiO3薄膜的结晶质量。这些结果可以为基于化学计量平衡和沉积动力学设定高质量薄膜沉积的BaTiO3溅射参数提供有价值的路线图，并可以进一步扩展到其他钙钛矿化合物。

{"title":"Tailoring the composition and deposition kinetics of RF-sputtered BaTiO3 thin films through working pressure and target-substrate distance adjustments","authors":"Edgar Chaslin, Jade Clément, Quentin Simon, Alejandro Borroto, Mohamed Himdi, Xavier Castel","doi":"10.1016/j.tsf.2025.140836","DOIUrl":"10.1016/j.tsf.2025.140836","url":null,"abstract":"<div><div>Optimizing the growth of BaTiO<sub>3</sub> thin films is essential for operating their ferroelectric and dielectric properties for embedded microelectronic applications. The present study investigates in a combinatorial-like approach the deposition of BaTiO<sub>3</sub> thin films by radiofrequency magnetron sputtering on SiO<sub>2</sub>/Si substrates under various working pressures (1 to 6 Pa) and target-substrate distances (7.5 to 9.2 cm). X-ray diffraction (XRD), Atomic Force Microscopy (AFM) and Rutherford Backscattering Spectroscopy (RBS) characterizations were used to establish the relationships between the sputtering deposition parameters and the resulting deposition rates, crystalline quality, surface roughness, and stoichiometry of the BaTiO<sub>3</sub> thin films. Low pressures and short distances lead to high kinetic growth of amorphous Ba-deficient films. Increasing working pressure <span><math><mo>×</mo></math></span> target-substrate distance values above 0.30 Pa.m enables to attain the stoichiometric Ba/Ti ratio. This result is related to both Ba and Ti species thermalization into the plasma leading to improve the chemical composition of the films. Furthermore, crystalline quality of the BaTiO<sub>3</sub> films is improved by reducing the deposition rate through working pressure and target-substrate distance adjustment. These results can provide valuable roadmaps to set BaTiO<sub>3</sub> sputtering parameters for high-quality thin films deposition based on the stoichiometry balance and deposition kinetics, that can be further extended to other perovskite compounds.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140836"},"PeriodicalIF":2.0,"publicationDate":"2025-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737382","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Thermoplasmonic enhanced detection efficiency by gold nanoparticles/ chlorophyll heterojunction on silicon nanowires 热等离子体在硅纳米线上利用金纳米粒子/叶绿素异质结提高检测效率

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-04 DOI: 10.1016/j.tsf.2025.140837

S. Valimohammadi , S.M. Hamidi , L. Rajaee

This study presents the development of a ternary heterojunction nanostructure for visible-light detection at 532 nm. Silicon nanowires (SiNWs) were grown using the metal-assisted chemical etching (MACE) method. The structure incorporates gold nanoparticles (Au NPs), synthesized via laser ablation (a fixed amount of S₀: 1500 µL), which were combined with varying concentrations of chlorophyll-a (Chl-a) (S₁: 1000 µL, S₂: 1500 µL, S₃: 2000 µL). Characterization techniques included SEM and AFM to confirm SiNWs morphology, UV–Vis spectroscopy to examine the optical properties of the Au/Chl-a combination, and current-voltage (I-V) measurements to evaluate the enhanced photodetector performance. Key findings demonstrated that plasmon-exciton dipole interactions effectively increase electron-hole pair separation via the formation of plexcitons. Furthermore, thermoplasmonic heating raised the temperature of the optimal sample (SiNWs@S₂) to 51.6 °C (compared to the baseline SiNWs@S₀ temperature of 40.7 °C), representing a 26.78 % improvement. This system shows promising potential for high-performance optical sensing applications.

本研究提出了一种用于532 nm可见光检测的三元异质结纳米结构。采用金属辅助化学蚀刻（MACE）法制备了硅纳米线。该结构包含通过激光烧蚀合成的金纳米粒子（Au NPs）（固定数量的S0: 1500µL），并与不同浓度的叶绿素-a (Chl-a) （S1: 1000µL, S2: 1500µL, S3: 2000µL）结合。表征技术包括SEM和AFM来确认SiNWs的形态，UV-Vis光谱来检查Au/Chl-a组合的光学性质，以及电流-电压（I-V）测量来评估增强的光电探测器性能。主要研究结果表明，等离子体-激子偶极相互作用通过形成激子有效地增加了电子-空穴对的分离。此外，热等离子体加热将最佳样品（SiNWs@S2）的温度提高到51.6°C（与基线SiNWs@S0温度40.7°C相比），提高了26.78%。该系统在高性能光学传感应用中显示出良好的潜力。

{"title":"Thermoplasmonic enhanced detection efficiency by gold nanoparticles/ chlorophyll heterojunction on silicon nanowires","authors":"S. Valimohammadi , S.M. Hamidi , L. Rajaee","doi":"10.1016/j.tsf.2025.140837","DOIUrl":"10.1016/j.tsf.2025.140837","url":null,"abstract":"<div><div>This study presents the development of a ternary heterojunction nanostructure for visible-light detection at 532 nm. Silicon nanowires (SiNWs) were grown using the metal-assisted chemical etching (MACE) method. The structure incorporates gold nanoparticles (Au NPs), synthesized via laser ablation (a fixed amount of S<sub>0</sub>: 1500 µL), which were combined with varying concentrations of chlorophyll-a (Chl-a) (S<sub>1</sub>: 1000 µL, S<sub>2</sub>: 1500 µL, S<sub>3</sub>: 2000 µL). Characterization techniques included SEM and AFM to confirm SiNWs morphology, UV–Vis spectroscopy to examine the optical properties of the Au/Chl-a combination, and current-voltage (I-V) measurements to evaluate the enhanced photodetector performance. Key findings demonstrated that plasmon-exciton dipole interactions effectively increase electron-hole pair separation via the formation of plexcitons. Furthermore, thermoplasmonic heating raised the temperature of the optimal sample (SiNWs@S<sub>2</sub>) to 51.6 °C (compared to the baseline SiNWs@S<sub>0</sub> temperature of 40.7 °C), representing a 26.78 % improvement. This system shows promising potential for high-performance optical sensing applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140837"},"PeriodicalIF":2.0,"publicationDate":"2025-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737383","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Annealing temperature dependence of tensile cracking of indium tin oxide films on polycarbonate substrates 聚碳酸酯衬底氧化铟锡薄膜拉伸开裂的退火温度依赖性

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-12-02 DOI: 10.1016/j.tsf.2025.140834

Jiali Zhou , Wenqiao Zhang , Yuandong Chen , Xianhua Huan , Youxiu Wei , Xuan Zhang , Xiaofeng Zhang , Yue Yan

Indium tin oxide (In₂O₃:Sn, ITO) films deposited on rigid polycarbonate (PC) substrates exhibit susceptibility to microcracking under mechanical loading and thermal cycling conditions, compromising the mechanical durability of aerospace transparencies. To address this issue, this study systematically investigated the influence of annealing on tensile cracking behavior and crack resistance of 500 nm ITO films on PC substrates. ITO films were subjected to annealing temperatures of 80 °C to 130 °C for 1 h. In situ electrical resistance test under uniaxial tension was employed to characterize the conductive failure strain (ε_c), a key indicator of crack initiation resistance. The results revealed that ε_c demonstrate a non-monotonic relationship with increasing annealing temperature, with a peak ε_c of 1.01 ± 0.01 % achieved at 120 °C. This temperature-dependent behavior of ε_c is principally governed by the competing effects of thermal compressive stress (resulting from the coefficient of thermal expansion mismatch) and intrinsic tensile stress (associated with microstructural evolution). Furthermore, fracture toughness evaluation through the energy release rate method revealed maximum critical energy release rate values for 120 °C-annealed specimens, indicating optimal crack propagation resistance at this annealing condition.

沉积在刚性聚碳酸酯（PC）衬底上的氧化铟锡（In2O3:Sn， ITO）薄膜在机械载荷和热循环条件下易发生微裂纹，从而影响航天透明材料的机械耐久性。为了解决这一问题，本研究系统地研究了退火对PC衬底上500 nm ITO薄膜拉伸开裂行为和抗裂性能的影响。将ITO薄膜在80 ~ 130℃的温度下退火1 h，采用单轴拉伸下的原位电阻测试来表征导电破坏应变（εc），这是裂纹起裂阻力的关键指标。结果表明，εc随退火温度的升高呈非单调关系，在120℃时达到峰值1.01±0.01%。εc的这种温度依赖行为主要是由热压应力（由热膨胀系数失配引起）和本征拉应力（与微观结构演化有关）的竞争作用所决定的。此外，通过能量释放率法评估断裂韧性，发现120℃退火试样的最大临界能量释放率值表明在该退火条件下裂纹扩展阻力最佳。

{"title":"Annealing temperature dependence of tensile cracking of indium tin oxide films on polycarbonate substrates","authors":"Jiali Zhou , Wenqiao Zhang , Yuandong Chen , Xianhua Huan , Youxiu Wei , Xuan Zhang , Xiaofeng Zhang , Yue Yan","doi":"10.1016/j.tsf.2025.140834","DOIUrl":"10.1016/j.tsf.2025.140834","url":null,"abstract":"<div><div>Indium tin oxide (In<sub>2</sub>O<sub>3</sub>:Sn, ITO) films deposited on rigid polycarbonate (PC) substrates exhibit susceptibility to microcracking under mechanical loading and thermal cycling conditions, compromising the mechanical durability of aerospace transparencies. To address this issue, this study systematically investigated the influence of annealing on tensile cracking behavior and crack resistance of 500 nm ITO films on PC substrates. ITO films were subjected to annealing temperatures of 80 °C to 130 °C for 1 h. In situ electrical resistance test under uniaxial tension was employed to characterize the conductive failure strain (<em>ε</em><sub>c</sub>), a key indicator of crack initiation resistance. The results revealed that <em>ε</em><sub>c</sub> demonstrate a non-monotonic relationship with increasing annealing temperature, with a peak <em>ε</em><sub>c</sub> of 1.01 ± 0.01 % achieved at 120 °C. This temperature-dependent behavior of <em>ε</em><sub>c</sub> is principally governed by the competing effects of thermal compressive stress (resulting from the coefficient of thermal expansion mismatch) and intrinsic tensile stress (associated with microstructural evolution). Furthermore, fracture toughness evaluation through the energy release rate method revealed maximum critical energy release rate values for 120 °C-annealed specimens, indicating optimal crack propagation resistance at this annealing condition.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140834"},"PeriodicalIF":2.0,"publicationDate":"2025-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145682787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Formation of mixed monolayers of organo-modified inorganic nanoparticles with miscible modified chains and interactions between their components 具有混相修饰链的有机修饰无机纳米颗粒混合单层的形成及其组分之间的相互作用

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-11-29 DOI: 10.1016/j.tsf.2025.140833

Ryoma Nakada , Tsubasa Takiguchi , Atsuhiro Fujimori

We investigated the interactions between a mixed Langmuir monolayer of organo-modified nanoclays and nanodiamonds surface-modified with stearyl chains. In the organo-modified nanoclay, the montmorillonite surface was chemically modified with a long-chain quaternary ammonium salt. The organo-diamond surfaces were anionically modified with stearic acid. The modified chains, dimethyl distearyl ammonium chloride, and stearic acid exhibited ideal mixing in a mixed monolayer. Nonetheless, the organo-modified nanoclay and the organo-modified nanodiamond were phase-separated systems in the mixed monolayer. The surface morphology confirmed the independent aggregate morphology of each modified nanoparticle and the maintenance of two-dimensional order between the modified chains. However, the layered regularity of the multilayers was lost. From the results of this study, even if the interactions between the modified chains were compatible, there were cases in which the mixed monolayer became a phase-separated system because of the effect of the size and shape of the nanoparticles bound as hydrophilic groups. This study established a methodology for the miscibility of Langmuir monolayers that combines mesoscopic evaluation using two-dimensional state curves with comparative microscopic morphological evaluation. It also provides a means of establishing a method for patterned morphology control by evaluating the interactions between the modified chain moieties and the nanoparticles.

我们研究了混合朗缪尔单层有机修饰纳米粘土和表面有硬脂基链修饰的纳米金刚石之间的相互作用。在有机改性纳米粘土中，用长链季铵盐对蒙脱土表面进行了化学改性。硬脂酸对有机金刚石表面进行阴离子修饰。改性链、二甲基二硬脂酰氯化铵和硬脂酸在混合单层中表现出理想的混合。然而，有机改性纳米粘土和有机改性纳米金刚石在混合单层中是相分离的体系。表面形貌证实了每个修饰纳米颗粒的独立聚集形态和修饰链之间的二维秩序。然而，多层材料的层状规则性被破坏。从本研究的结果来看，即使修饰链之间的相互作用是相容的，在某些情况下，由于作为亲水性基团结合的纳米颗粒的大小和形状的影响，混合单层成为相分离系统。本研究建立了一种结合使用二维状态曲线的介观评价和比较微观形态评价的Langmuir单层混相性方法。它还提供了一种通过评价修饰链段与纳米颗粒之间的相互作用来建立模式形态控制方法的手段。

{"title":"Formation of mixed monolayers of organo-modified inorganic nanoparticles with miscible modified chains and interactions between their components","authors":"Ryoma Nakada , Tsubasa Takiguchi , Atsuhiro Fujimori","doi":"10.1016/j.tsf.2025.140833","DOIUrl":"10.1016/j.tsf.2025.140833","url":null,"abstract":"<div><div>We investigated the interactions between a mixed Langmuir monolayer of organo-modified nanoclays and nanodiamonds surface-modified with stearyl chains. In the organo-modified nanoclay, the montmorillonite surface was chemically modified with a long-chain quaternary ammonium salt. The organo-diamond surfaces were anionically modified with stearic acid. The modified chains, dimethyl distearyl ammonium chloride, and stearic acid exhibited ideal mixing in a mixed monolayer. Nonetheless, the organo-modified nanoclay and the organo-modified nanodiamond were phase-separated systems in the mixed monolayer. The surface morphology confirmed the independent aggregate morphology of each modified nanoparticle and the maintenance of two-dimensional order between the modified chains. However, the layered regularity of the multilayers was lost. From the results of this study, even if the interactions between the modified chains were compatible, there were cases in which the mixed monolayer became a phase-separated system because of the effect of the size and shape of the nanoparticles bound as hydrophilic groups. This study established a methodology for the miscibility of Langmuir monolayers that combines mesoscopic evaluation using two-dimensional state curves with comparative microscopic morphological evaluation. It also provides a means of establishing a method for patterned morphology control by evaluating the interactions between the modified chain moieties and the nanoparticles.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140833"},"PeriodicalIF":2.0,"publicationDate":"2025-11-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145682786","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhancement of electrochemical reversibility and self-organization of vacuum evaporated 1, 4, 5, 8-naphthalene-tetracarboxylic-dianhydride thin films for dynamic glasses applications 真空蒸发1,4,5,8 -萘-四羧酸二酐薄膜在动态玻璃中的电化学可逆性和自组织增强

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-11-26 DOI: 10.1016/j.tsf.2025.140831

P. Aruna , M.R. Rajani , Aditya Surana , Shreyas Kapri , S. Sindhu , Rajesh Cheruku , C.M. Joseph

The electrochromic properties of post-deposition high vacuum (1.3 × 10^–4 Pa) annealed 1, 4, 5, 8-naphthalene-tetracarboxylic-dianhydride (NTCDA) thin films were investigated in this study. As-deposited samples were vacuum annealed at different temperatures of 323 K, 373 K, 423 K and 473 K. From x-ray diffraction patterns, it was observed that annealing increased the crystallinity due to a better molecular packing of the NTCDA thin films and scanning electron micrographs revealed that the annealing promotes uniformity and diminishes structural defects. Band gap was around 2.25 eV for the as-deposited NTCDA film. Electrochemical reversibility was calculated for all the annealed samples and it was found that the film annealed at 423 K exhibited better reversibility compared to the other annealed films. Post deposition annealing changes the self-organization of NTCDA thin films which in turn influences its electrochromic properties.

研究了沉积后高真空（1.3 × 10-4 Pa）退火1,4,5,8 -萘-四羧基二酐（NTCDA）薄膜的电致变色性能。在323 K、373 K、423 K和473 K的不同温度下对沉积态样品进行真空退火。从x射线衍射图中可以看出，退火使NTCDA薄膜具有更好的分子堆积，从而提高了结晶度；扫描电镜显示，退火提高了薄膜的均匀性，减少了结构缺陷。nctda薄膜带隙约为2.25 eV。对所有退火样品进行了电化学可逆性计算，发现在423 K退火的膜具有更好的可逆性。沉积后退火改变了NTCDA薄膜的自组织，从而影响了其电致变色性能。

{"title":"Enhancement of electrochemical reversibility and self-organization of vacuum evaporated 1, 4, 5, 8-naphthalene-tetracarboxylic-dianhydride thin films for dynamic glasses applications","authors":"P. Aruna , M.R. Rajani , Aditya Surana , Shreyas Kapri , S. Sindhu , Rajesh Cheruku , C.M. Joseph","doi":"10.1016/j.tsf.2025.140831","DOIUrl":"10.1016/j.tsf.2025.140831","url":null,"abstract":"<div><div>The electrochromic properties of post-deposition high vacuum (1.3 × 10<sup>–4</sup> Pa) annealed 1, 4, 5, 8-naphthalene-tetracarboxylic-dianhydride (NTCDA) thin films were investigated in this study. As-deposited samples were vacuum annealed at different temperatures of 323 K, 373 K, 423 K and 473 K. From x-ray diffraction patterns, it was observed that annealing increased the crystallinity due to a better molecular packing of the NTCDA thin films and scanning electron micrographs revealed that the annealing promotes uniformity and diminishes structural defects. Band gap was around 2.25 eV for the as-deposited NTCDA film. Electrochemical reversibility was calculated for all the annealed samples and it was found that the film annealed at 423 K exhibited better reversibility compared to the other annealed films. Post deposition annealing changes the self-organization of NTCDA thin films which in turn influences its electrochromic properties.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140831"},"PeriodicalIF":2.0,"publicationDate":"2025-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145682788","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Scalable palladium and tin-free pretreatment for direct nickel electroplating of acrylonitrile-butadiene-styrene plastics 丙烯腈-丁二烯-苯乙烯塑料直接镀镍的可扩展无钯预处理

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-11-24 DOI: 10.1016/j.tsf.2025.140832

Shady Alwakeel , Nobl F. El Boarei , El-Said H. El-Mosallamy , Magdy A.M. Ibrahim

Metalized acrylonitrile-butadiene-styrene (ABS) plastic has gained popularity in the commercial market, particularly in the automotive and electronics industries. In this work, we replaced the ABS surface activation with Pd-Sn-free pretreatments, synthesizing a conductive nickel sulphide (NiS) seed thin film using chemical treatments on ABS. Instead of the usual sensitization and activation, the etched ABS plastic was immediately dipped into a metal sulfide solution, and consequently, no acceleration step was required. Hence, three steps can be used to obtain Ni plating on ABS (etching, NiS seeding, and plating). The Ni films' adhesion demonstrates strong adherence between the ABS substrate and Ni film (2.0 - 2.2 MPa). The film formed after electroplating under such conditions is crystalline and composed mainly of Ni in addition to a small amount of β-Ni(OH)₂, according to X-ray diffraction (XRD) results. EDS (energy-dispersive X-ray spectroscopy) and SEM (scanning electron microscopy) were used to characterize the coatings' composition and morphology. Developing a NiS seed layer through a simplified three-step process offers a cost-effective and scalable alternative with strong potential for metallization technologies of ABS plastics.

金属化丙烯腈-丁二烯-苯乙烯（ABS）塑料在商业市场，特别是在汽车和电子工业中获得了广泛的应用。在这项工作中，我们用不含pd - sn的预处理取代了ABS的表面活化，在ABS上使用化学处理合成了导电的硫化镍（NiS）种子薄膜，而不是通常的敏化和活化，蚀刻的ABS塑料立即浸入金属硫化物溶液中，因此不需要加速步骤。因此，在ABS上镀镍可采用三个步骤（蚀刻、播种和镀镍）。Ni膜的附着力表现为ABS基材与Ni膜之间的强附着力（2.0 ~ 2.2 MPa）。根据x射线衍射（XRD）结果，在这种条件下电镀后形成的薄膜呈结晶状，主要由Ni和少量β-Ni(OH) 2组成。利用能量色散x射线能谱仪（EDS）和扫描电子显微镜（SEM）对涂层的组成和形貌进行了表征。通过简化的三步工艺开发NiS种子层，为ABS塑料的金属化技术提供了一种具有成本效益和可扩展性的替代方案，具有强大的潜力。

{"title":"Scalable palladium and tin-free pretreatment for direct nickel electroplating of acrylonitrile-butadiene-styrene plastics","authors":"Shady Alwakeel , Nobl F. El Boarei , El-Said H. El-Mosallamy , Magdy A.M. Ibrahim","doi":"10.1016/j.tsf.2025.140832","DOIUrl":"10.1016/j.tsf.2025.140832","url":null,"abstract":"<div><div>Metalized acrylonitrile-butadiene-styrene (ABS) plastic has gained popularity in the commercial market, particularly in the automotive and electronics industries. In this work, we replaced the ABS surface activation with Pd-Sn-free pretreatments, synthesizing a conductive nickel sulphide (NiS) seed thin film using chemical treatments on ABS. Instead of the usual sensitization and activation, the etched ABS plastic was immediately dipped into a metal sulfide solution, and consequently, no acceleration step was required. Hence, three steps can be used to obtain Ni plating on ABS (etching, NiS seeding, and plating). The Ni films' adhesion demonstrates strong adherence between the ABS substrate and Ni film (2.0 - 2.2 MPa). The film formed after electroplating under such conditions is crystalline and composed mainly of Ni in addition to a small amount of β-Ni(OH)₂, according to X-ray diffraction (XRD) results. EDS (energy-dispersive X-ray spectroscopy) and SEM (scanning electron microscopy) were used to characterize the coatings' composition and morphology. Developing a NiS seed layer through a simplified three-step process offers a cost-effective and scalable alternative with strong potential for metallization technologies of ABS plastics.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"833 ","pages":"Article 140832"},"PeriodicalIF":2.0,"publicationDate":"2025-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145610560","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Role of oxygen on functional properties of TiOxNy coating for polymer electrolyte membrane fuel cell’s bipolar plate 氧对聚合物电解质膜燃料电池双极板TiOxNy涂层功能性能的影响

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films

Pub Date : 2025-11-21 DOI: 10.1016/j.tsf.2025.140829

Clément Cambier , Marie-Alix Leroy , Benoit Ter-Ovanessian , Jules Galipaud , Matthieu Bugnet , Christophe Heau , Bernard Normand

Titanium oxynitride (TiON) coatings were synthesized via reactive magnetron sputtering to functionalize the surface of metallic bipolar plates in polymer electrolyte membrane fuel cells (PEMFCs), with the dual objective of ensuring both durability and electrical conductivity. The incorporation of oxygen into titanium nitride (TiN) was identified as a critical factor in enhancing the chemical stability of the material, particularly at elevated potentials (>1.2 V/NHE), due to the greater stability of iono-covalent bonds—characterized by partial electron sharing and separation—compared to metallic bonds. Beyond influencing the chemical properties, oxygen addition also altered the coating morphology, leading to larger columnar structures and smoother, less reactive surfaces. Ex-situ potentiodynamic polarization and interfacial contact resistance (ICR) measurements were performed to determine the optimal oxygen content, identified as 5 at.%, which simultaneously maintains a low ICR (<10 mΩ·cm²) suitable for practical applications, while significantly improving corrosion resistance relative to pure TiN coatings. This comprehensive study highlights the intricate interplay between microstructural and chemical factors, providing valuable insights for the development of advanced coatings specifically designed for PEMFC applications.

采用反应磁控溅射法制备了氧化氮化钛涂层，使聚合物电解质膜燃料电池（PEMFCs）金属双极板表面功能化，同时保证了材料的耐久性和导电性。氮化钛（TiN）中加入氧气被认为是提高材料化学稳定性的关键因素，特别是在高电位（>1.2 V/NHE）下，因为与金属键相比，离子共价键具有更大的稳定性，其特征是部分电子共享和分离。除了影响化学性质外，氧的加入也改变了涂层的形态，导致更大的柱状结构和更光滑、更少反应的表面。通过离地动电位极化和界面接触电阻（ICR）测量来确定最佳氧含量，确定为5 at。%，同时保持适合实际应用的低ICR （<10 mΩ·cm²），同时相对于纯TiN涂层显着提高耐腐蚀性。这项全面的研究强调了微观结构和化学因素之间复杂的相互作用，为开发专门为PEMFC应用设计的先进涂层提供了有价值的见解。

{"title":"Role of oxygen on functional properties of TiOxNy coating for polymer electrolyte membrane fuel cell’s bipolar plate","authors":"Clément Cambier , Marie-Alix Leroy , Benoit Ter-Ovanessian , Jules Galipaud , Matthieu Bugnet , Christophe Heau , Bernard Normand","doi":"10.1016/j.tsf.2025.140829","DOIUrl":"10.1016/j.tsf.2025.140829","url":null,"abstract":"<div><div>Titanium oxynitride (TiON) coatings were synthesized via reactive magnetron sputtering to functionalize the surface of metallic bipolar plates in polymer electrolyte membrane fuel cells (PEMFCs), with the dual objective of ensuring both durability and electrical conductivity. The incorporation of oxygen into titanium nitride (TiN) was identified as a critical factor in enhancing the chemical stability of the material, particularly at elevated potentials (>1.2 V/NHE), due to the greater stability of iono-covalent bonds—characterized by partial electron sharing and separation—compared to metallic bonds. Beyond influencing the chemical properties, oxygen addition also altered the coating morphology, leading to larger columnar structures and smoother, less reactive surfaces. <em>Ex-situ</em> potentiodynamic polarization and interfacial contact resistance (ICR) measurements were performed to determine the optimal oxygen content, identified as 5 at.%, which simultaneously maintains a low ICR (<10 mΩ·cm²) suitable for practical applications, while significantly improving corrosion resistance relative to pure TiN coatings. This comprehensive study highlights the intricate interplay between microstructural and chemical factors, providing valuable insights for the development of advanced coatings specifically designed for PEMFC applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"832 ","pages":"Article 140829"},"PeriodicalIF":2.0,"publicationDate":"2025-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145624083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0