Research on Analytical Model of Synchronous Discharge of Capacitive Pulsed Power Supply

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-08-14 DOI:10.1109/TPS.2024.3437478
Wanyu Liu;Kun Liu;Wenchao Li;Shikuo Cheng;Yaohong Sun;Ping Yan
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Abstract

Capacitive pulsed power supply (CPPS) has been obtained widespread applications because of its plenty of superiorities. The circuit model is developed, and the synchronous discharge process is investigated at first. Then, the synchronous discharge analytical model is developed for the system. The correctness of the analytical model is validated by simulation. To solve the power parameters quickly, the PC software is developed based on this analytical model to meet the experimental requirements. Finally, taking an experimental system as an example, the accuracy of the proposed model is demonstrated by comparing the simulation and experimental results. By developing the synchronous discharge analytical model, it provides an essential reference for CPPS control strategy for further investigation.
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电容式脉冲电源同步放电分析模型研究
电容式脉冲电源(CPPS)因其诸多优越性而得到广泛应用。本文首先建立了电路模型,并研究了同步放电过程。然后,为系统建立了同步放电分析模型。通过仿真验证了分析模型的正确性。为了快速求解功率参数,基于该分析模型开发了满足实验要求的 PC 软件。最后,以一个实验系统为例,通过比较仿真和实验结果,证明了所提出模型的准确性。通过建立同步放电分析模型,为进一步研究 CPPS 控制策略提供了重要参考。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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Table of Contents IEEE Transactions on Plasma Science Information for Authors IEEE Transactions on Plasma Science Publication Information Blank Page Extending the Operating Pressure Range of a Forevacuum-Pressure Plasma-Cathode Ribbon Electron Beam Source
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