Jizhang Wang, Meng Ye, Xiaomi Guo, Yang Li, Nianlong Zou, He Li, Zetao Zhang, Sibo Zhao, Zhiming Xu, Haowei Chen, Dezhao Wu, Ting Bao, Yong Xu, Wenhui Duan
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引用次数: 0
Abstract
One of the most important nonlinear optical (NLO) effects is the second-harmonic generation (SHG), and crystals with strong SHG effects are called NLO crystals. The traditional anion group theory has guided the early discovery of NLO crystals, but the variety of NLO-active motifs discovered so far is limited. In this study, material-type unbiased high-throughput first-principles calculations are performed to screen thousands of materials in a materials database for NLO crystals at target frequencies. The electronic, linear, and nonlinear optical properties of these materials are calculated. Among them, 40 NLO crystals suitable for mid-infrared (MIR) frequencies and 5 for deep-ultraviolet (DUV) frequencies are identified, from 229 materials to which scissors correction is applied. As an extension, several NLO-active motifs that dominate the SHG response are identified, and they all show good transferability among similar materials. Furthermore, for materials where scissors correction cannot be applied due to the lack of accurate bandgap value in the database, a recommendation list of NLO crystals based on the scaling law of bandgap and SHG susceptibility is presented. The discovery of new NLO crystals and NLO-active motifs beyond traditional methods will greatly accelerate the applications of NLO crystals at DUV and MIR frequencies and enrich our understanding in the search and design of new NLO crystals.
期刊介绍:
Physical Review Materials is a new broad-scope international journal for the multidisciplinary community engaged in research on materials. It is intended to fill a gap in the family of existing Physical Review journals that publish materials research. This field has grown rapidly in recent years and is increasingly being carried out in a way that transcends conventional subject boundaries. The journal was created to provide a common publication and reference source to the expanding community of physicists, materials scientists, chemists, engineers, and researchers in related disciplines that carry out high-quality original research in materials. It will share the same commitment to the high quality expected of all APS publications.