Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment

IF 5.9 3区 工程技术 Q1 CHEMISTRY, MULTIDISCIPLINARY Journal of Industrial and Engineering Chemistry Pub Date : 2024-08-30 DOI:10.1016/j.jiec.2024.08.052
Fatemeh Delkhosh, Armaghan Qotbi, Amir Hossein Behroozi, Vahid Vatanpour
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Abstract

Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes.
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磁控溅射在膜制造和改性中的应用:气体和水处理中的应用
磁控溅射膜因其可控的厚度、化学成分、结晶结构和其他表面特性,一直是水和气体处理应用中令人感兴趣的候选材料。磁控溅射(MS)是一种可重复、可扩展的沉积技术,通过在支撑层上沉积薄层,可以定向制造或改性膜。本文首先概述了该技术的基本概念、详细加工机制和各种类型。然后,简要讨论了该技术在膜支持层上沉积薄膜的应用,这些薄膜主要来自聚合物、金属、氧化物和碳。接下来的重点是该领域的最新进展,报告了基于 MS 技术开发的膜在水和气体处理过程中的性能,提供了过滤效率方面的比较研究。最后,简要介绍了开发下一代磁控溅射膜的当前挑战和未来方向。
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来源期刊
CiteScore
10.40
自引率
6.60%
发文量
639
审稿时长
29 days
期刊介绍: Journal of Industrial and Engineering Chemistry is published monthly in English by the Korean Society of Industrial and Engineering Chemistry. JIEC brings together multidisciplinary interests in one journal and is to disseminate information on all aspects of research and development in industrial and engineering chemistry. Contributions in the form of research articles, short communications, notes and reviews are considered for publication. The editors welcome original contributions that have not been and are not to be published elsewhere. Instruction to authors and a manuscript submissions form are printed at the end of each issue. Bulk reprints of individual articles can be ordered. This publication is partially supported by Korea Research Foundation and the Korean Federation of Science and Technology Societies.
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