Bio-inspired colloidal photonic crystal pattern with multiple optical variable images

IF 4.2 3区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-09-18 DOI:10.1016/j.mssp.2024.108922

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Abstract

Colloidal photonic crystals (CPCs) are highly significant for display and anti-counterfeiting applications due to their vibrant structural colors and light-manipulating properties. Efficient and extensive CPC patterns is required for practical applications. Additionally, it is essential to incorporate complex optical elements or responsive qualities to the CPC patterns in order to enhance their performances for security applications. Herein, we proposed CPC patterns with alterable images revealed by changes in viewing angle or exposure to certain vapors. The CPC patterns were prepared by inkjet printing method. Through substrate modification to achieve varying wettability, angle-dependent optical adaptable images could potentially be shown by the patterns. The mesoporous silica nanoparticles (MSNs) were employed as building blocks to impart vapor-chromic characteristics to the CPC patterns. The CPC complex patterns responsive optical characteristics rendered them suitable for use in public authentication and anti-counterfeiting applications.

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具有多重光学可变图像的生物启发胶体光子晶体图案

胶体光子晶体（CPC）因其鲜艳的结构色彩和光操纵特性，在显示和防伪应用中具有重要意义。实际应用需要高效、广泛的 CPC 图案。此外，还必须在 CPC 图案中加入复杂的光学元件或响应特性，以提高其防伪应用性能。在此，我们提出了可通过改变视角或接触某些蒸汽来显示可改变图像的 CPC 图案。CPC 图案是通过喷墨打印方法制备的。通过对基底进行改性以实现不同的润湿性，图案就有可能显示出随角度变化的光学适应图像。介孔二氧化硅纳米颗粒（MSNs）被用作构件，为 CPC 图案赋予了蒸汽变色特性。CPC 复杂图案的响应光学特性使其适用于公共认证和防伪应用。

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来源期刊

Materials Science in Semiconductor Processing 工程技术-材料科学：综合

CiteScore

8.00

自引率

4.90%

发文量

780

审稿时长

42 days

期刊介绍： Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.