Nanosheet overlayer growing on nanoporous anodized alumina substrates studied with reflectance interference spectroscopy technology

IF 4.6 2区 物理与天体物理 Q1 OPTICS Optics and Laser Technology Pub Date : 2024-09-18 DOI:10.1016/j.optlastec.2024.111759
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Abstract

Non-destructive and real-time monitoring of the detailed growth process is essential for the manufacture of multilayer nanofilms. In this paper, the process of a layer of transparent nanosheets growing on the top surface of nanoporous anodized alumina (NpAA) is monitored by reflectance interference spectroscopy (RIfS) combining theoretical simulation and experimental detection. The main influencing factors on the properties of RIfS and effective optical thickness (EOT) are investigated systematically and in detail, where both NpAA and nanosheets parameters are changed individually as well as simultaneously. The experimental results for ∼ 1 μm thickness of (ZnO-ZnCl2) nanosheets growing on the NpAA measured with a home-made RIfS system are in good agreement with the simulation data. We have shown that both the modeling and the experimental methodologies proposed have a high accuracy and a simplicity highly suitable in the fields of non-destructive, in situ and real-time monitoring of the fabrication process of transparent multi-layer composites, and can be readily employed to determine the nano structured thin film growth.

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利用反射干涉光谱技术研究纳米多孔阳极氧化铝基底上生长的纳米片覆盖层
对详细的生长过程进行无损和实时监控对于制造多层纳米薄膜至关重要。本文结合理论模拟和实验检测,利用反射干涉光谱(RIfS)监测了一层透明纳米片在纳米多孔阳极氧化铝(NpAA)顶面上的生长过程。在单独或同时改变 NpAA 和纳米片参数的情况下,对 RIfS 特性和有效光学厚度 (EOT) 的主要影响因素进行了系统而详细的研究。使用自制的 RIfS 系统测量了在 NpAA 上生长的(ZnO-ZnCl2)纳米片厚度为 1 μm 的实验结果与模拟数据非常吻合。我们已经证明,所提出的建模和实验方法都具有很高的准确性和简便性,非常适合于对透明多层复合材料的制造过程进行无损、原位和实时监测,并可随时用于确定纳米结构薄膜的生长情况。
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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