{"title":"Thermal stability of gold films on titanium-adhered silicon substrate","authors":"","doi":"10.1016/j.vacuum.2024.113645","DOIUrl":null,"url":null,"abstract":"<div><p>In this study, thermally induced changes in the surface of a thin gold film deposited on Si(100) with a 5 nm thick titanium adhesion layer were investigated. The analysis involved X-ray photoelectron spectroscopy, low-energy electron diffraction, and scanning tunnelling microscopy. The sample was subjected to stepwise annealing under ultra-high vacuum conditions at temperatures ranging from 430 to 1330 K. Low-temperature annealing up to 450 K did not alter the morphology but improved the cleanliness of the gold film surface. Annealing between 530 and 930 K resulted in the disintegration of the gold film, along with mixing and interaction between the sample components. Annealing the sample at 980 K led to the emergence of a gold silicide surface on Si(100) exhibiting the (5 × 3.2)R5.7° reconstruction.</p></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":null,"pages":null},"PeriodicalIF":3.8000,"publicationDate":"2024-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0042207X24006912/pdfft?md5=f6cdb69e38ba4cf4d1d5e3daf11b55c9&pid=1-s2.0-S0042207X24006912-main.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X24006912","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, thermally induced changes in the surface of a thin gold film deposited on Si(100) with a 5 nm thick titanium adhesion layer were investigated. The analysis involved X-ray photoelectron spectroscopy, low-energy electron diffraction, and scanning tunnelling microscopy. The sample was subjected to stepwise annealing under ultra-high vacuum conditions at temperatures ranging from 430 to 1330 K. Low-temperature annealing up to 450 K did not alter the morphology but improved the cleanliness of the gold film surface. Annealing between 530 and 930 K resulted in the disintegration of the gold film, along with mixing and interaction between the sample components. Annealing the sample at 980 K led to the emergence of a gold silicide surface on Si(100) exhibiting the (5 × 3.2)R5.7° reconstruction.
期刊介绍：
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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