Laser scanning patterns induced surface properties variations of Ti-V-Hf-Zr non-evaporable getter film with 316L stainless steel substrates

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-09-11 DOI:10.1016/j.vacuum.2024.113639

引用次数: 0

Abstract

The effects of laser treatment scanning patterns on the properties of Ti-V-Hf-Zr non-evaporable getter (NEG) film on 316L stainless steel (316L SS) substrates were analyzed. 316L SS substrates were laser-treated with different patterns, which resulted in spherical structure and protrusions on the surface of the substrates. Subsequently, Ti-V-Hf-Zr NEG films were deposited on ultrasonically cleaned laser-treated 316L SS by a direct current (DC) magnetron sputtering machine. Based on the XPS results of Ti-V-Hf-Zr, it has been revealed that the atomic proportions of film elements on the surface of samples #1-1∼#3–1 were about 2.2 (Ti):1.7 (Zr):0.9 (V):1.0 (Hf). In this paper, the Ar⁺-induced secondary electron yield (SEY) and surface resistivity of Ti-V-Hf-Zr NEG are discussed for the first time, and it has been observed that the laser treatment leads to an increase of the substrate surface roughness, which decreases the SEY and increases the surface resistivity.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

激光扫描图案诱导的带有 316L 不锈钢基底的 Ti-V-Hf-Zr 非蒸发获取薄膜的表面特性变化

分析了激光处理扫描模式对 316L 不锈钢（316L SS）基底上 Ti-V-Hf-Zr 非蒸发获取剂（NEG）薄膜性能的影响。316L SS 基材经过不同图案的激光处理后，基材表面形成球形结构和突起。随后，使用直流磁控溅射机在经过超声波清洗的激光处理过的 316L SS 上沉积了 Ti-V-Hf-Zr NEG 薄膜。根据 Ti-V-Hf-Zr 的 XPS 结果显示，1-1∼3-1 号样品表面薄膜元素的原子比例约为 2.2（Ti）:1.7（Zr）:0.9（V）:1.0（Hf）。本文首次讨论了 Ti-V-Hf-Zr NEG 的 Ar+诱导二次电子产率（SEY）和表面电阻率，并观察到激光处理会导致衬底表面粗糙度增加，从而降低 SEY 并增加表面电阻率。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.