Dielectric Barrier Discharge Plasma Combined with Ce-Ni Mesoporous catalysts for CO2 splitting to CO

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-09-18 DOI:10.1007/s11090-024-10512-5

Oleg V. Golubev, Anton L. Maximov

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Abstract

A process of CO₂ decomposition in dielectric barrier discharge reactor using mesoporous CeO₂-NiO catalysts was studied. Mesoporous materials of MCM-41, SBA-15 and MCF types were used in this study to investigate the influence of the material structure on CO₂ decomposition efficiency. The obtained catalysts were characterized by physico-chemical methods: low temperature N₂ adsorption, X-Ray diffraction and X-Ray photoelectron spectroscopy. CO₂ conversion, CO yield and CO selectivity as well as energy efficiency and specific energy input were calculated. The comparison of process efficiency was conducted with that in the absence of any catalyst (plasma-only reactor). It was shown that in the presence of Ce-based catalysts, the conversion of CO₂ (from 11 to 19%) and CO yield rise significantly, while CeNi samples show minor performance in CO₂ plasma-catalytic dissociation. Porous characteristics affected the performance of CO₂ decomposition. Using wide-porous MCF-type material as a support, it was possible to achieve the highest conversion due to enhanced CO₂ adsorption in pores and subsequent plasma-catalytic decomposition. The combination of mesoporous silica material as a support and a CeO₂ as an active component is promising for the plasma-catalytic CO₂ splitting.

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介质阻挡放电等离子体与铈-镍介孔催化剂结合用于将二氧化碳分离为一氧化碳

研究了介孔 CeO2-NiO 催化剂在介电阻挡放电反应器中的二氧化碳分解过程。本研究使用了 MCM-41、SBA-15 和 MCF 类型的介孔材料，以研究材料结构对 CO2 分解效率的影响。研究采用物理化学方法对所获得的催化剂进行了表征：低温 N2 吸附、X 射线衍射和 X 射线光电子能谱。计算了 CO2 转化率、CO 产率和 CO 选择性以及能效和比能量输入。与没有任何催化剂（纯等离子体反应器）时的工艺效率进行了比较。结果表明，在有铈基催化剂存在的情况下，二氧化碳的转化率（从 11% 到 19%）和一氧化碳的产率显著提高，而铈镍样品在二氧化碳等离子体催化解离中表现较差。多孔特性影响了二氧化碳的分解性能。使用宽孔 MCF 型材料作为支持物，可以获得最高的转化率，这是因为二氧化碳在孔隙中的吸附和随后的等离子体催化分解得到了增强。将介孔二氧化硅材料作为支撑物和 CeO2 作为活性成分相结合，有望实现等离子体催化 CO2 分离。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.