Elissa Klopfer, Ighodalo Idehenre, Deanna Sessions, Michael J. Carter, Philip R. Buskohl, Eric S. Harper
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引用次数: 0
Abstract
Metasurfaces can replace bulk optical components in a more compact form factor in applications including communication systems, sensors, and manufacturing technology. However, their design and fabrication is challenging due to competing demands of selecting meta-atoms that simultaneously provide the required amplitude and phase modulation while being robust to fabrication errors. Here, we develop two design heuristics to assist with the down-selection of meta-atoms into sensitivity-informed libraries, based on either selecting meta-atoms with minimal sensitivity or minimizing the relative sensitivities between meta-atoms. We evaluate both methods on a polarization-dependent phase mask and compare the resulting phase and intensity errors.
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MRS Communications is a full-color, high-impact journal focused on rapid publication of completed research with broad appeal to the materials community. MRS Communications offers a rapid but rigorous peer-review process and time to publication. Leveraging its access to the far-reaching technical expertise of MRS members and leading materials researchers from around the world, the journal boasts an experienced and highly respected board of principal editors and reviewers.
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