Pub Date : 2024-09-18DOI: 10.1557/s43579-024-00646-0
Rigoberto C. Advincula
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Pub Date : 2024-09-18DOI: 10.1557/s43579-024-00629-1
Elissa Klopfer, Ighodalo Idehenre, Deanna Sessions, Michael J. Carter, Philip R. Buskohl, Eric S. Harper
Abstract
Metasurfaces can replace bulk optical components in a more compact form factor in applications including communication systems, sensors, and manufacturing technology. However, their design and fabrication is challenging due to competing demands of selecting meta-atoms that simultaneously provide the required amplitude and phase modulation while being robust to fabrication errors. Here, we develop two design heuristics to assist with the down-selection of meta-atoms into sensitivity-informed libraries, based on either selecting meta-atoms with minimal sensitivity or minimizing the relative sensitivities between meta-atoms. We evaluate both methods on a polarization-dependent phase mask and compare the resulting phase and intensity errors.
{"title":"Design of fabrication-tolerant meta-atoms for polarization-multiplexed metasurfaces","authors":"Elissa Klopfer, Ighodalo Idehenre, Deanna Sessions, Michael J. Carter, Philip R. Buskohl, Eric S. Harper","doi":"10.1557/s43579-024-00629-1","DOIUrl":"https://doi.org/10.1557/s43579-024-00629-1","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Metasurfaces can replace bulk optical components in a more compact form factor in applications including communication systems, sensors, and manufacturing technology. However, their design and fabrication is challenging due to competing demands of selecting meta-atoms that simultaneously provide the required amplitude and phase modulation while being robust to fabrication errors. Here, we develop two design heuristics to assist with the down-selection of meta-atoms into sensitivity-informed libraries, based on either selecting meta-atoms with minimal sensitivity or minimizing the relative sensitivities between meta-atoms. We evaluate both methods on a polarization-dependent phase mask and compare the resulting phase and intensity errors.</p><h3 data-test=\"abstract-sub-heading\">Graphical Abstract</h3>","PeriodicalId":19016,"journal":{"name":"MRS Communications","volume":"13 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142248979","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-16DOI: 10.1557/s43579-024-00640-6
Brendan Karafinski, Nairiti Sinha
Inorganic nanoparticles are a critical component in a broad range of applications spanning catalysis, sensing, optics, and electronics. The nucleation and growth mechanisms involved during their synthesis are known to be crucial for controlling their final performance. Macromolecules can display sequence definition, inherent chirality, metal ion targeting moieties, and can also form self-assemblies, affording them the ability to not only stabilize but also precisely control the synthesis and organization of nanoparticles for an intended application. Herein, we report the recent trends in inorganic nanoparticle synthesis mediated by peptides, peptoids, DNA, other biopolymers, and synthetic polymers. Important design parameters and future trends are also discussed.