Tb-doped borosilicate glass scintillators with high thermal stability for high-resolution X-ray imaging

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-09-24 DOI:10.1016/j.vacuum.2024.113677
Yingying Yuan, Rennai Yu, Wenhui Dai, Falin Zhang, Rongfei Wei, Hai Guo, Fangfang Hu
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Abstract

Scintillators with high thermal stability and excellent spatial resolution are desirable for X-ray imaging applications in harsh environments. Here, Tb3+-doped borosilicate glass scintillators were prepared using conventional melt-quenching method. The optimized Tb3+-doped borosilicate glass (G-15Tb) scintillator exhibited a significantly higher X-ray excited luminescence intensity (147 % of Bi4Ge3O12). Furthermore, it possessed a remarkable imaging spatial resolution of 20 lp/mm, surpassing the standard requirement for X-ray imaging and medical computed tomography scans (2 lp/mm). Moreover, the X-ray excited luminescence intensity of G-15Tb glass sample remained unchanged even after being submerged in water for 30 days, indicating exceptional water resistance. Additionally, the integral intensity of photoluminescence at 573 K is 96.7 % of its initial value. Most importantly, the G-15Tb glass scintillator remains high-quality X-ray images even at elevated operating temperatures. Therefore, the Tb3+-doped borosilicate glass scintillator holds immense potential for high-resolution X-ray imaging in harsh environments.
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用于高分辨率 X 射线成像的高热稳定性掺铽硼硅酸盐玻璃闪烁体
具有高热稳定性和出色空间分辨率的闪烁体是恶劣环境中 X 射线成像应用的理想之选。本文采用传统的熔淬法制备了掺杂 Tb3+ 的硼硅玻璃闪烁体。优化后的掺 Tb3+ 硼硅酸盐玻璃闪烁体(G-15Tb)具有更高的 X 射线激发发光强度(Bi4Ge3O12 的 147%)。此外,它的成像空间分辨率高达 20 lp/mm,超过了 X 射线成像和医学计算机断层扫描的标准要求(2 lp/mm)。此外,即使在水中浸泡 30 天,G-15Tb 玻璃样品的 X 射线激发发光强度仍保持不变,这表明它具有优异的耐水性。此外,573 K 时的光致发光积分强度是其初始值的 96.7%。最重要的是,即使在较高的工作温度下,G-15Tb 玻璃闪烁体仍能保持高质量的 X 射线图像。因此,掺杂 Tb3+ 的硼硅酸盐玻璃闪烁体在恶劣环境下进行高分辨率 X 射线成像方面具有巨大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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