Determination of the Band Structure and Conductivity of the Si@O@Al Nanocomposite

IF 1.1 4区物理与天体物理 Q4 PHYSICS, APPLIED Technical Physics Pub Date : 2024-09-26 DOI:10.1134/S1063784224060379

A. S. Rudy, A. B. Churilov, S. V. Kurbatov, A. A. Mironrenko, V. V. Naumov, E. A. Kozlov

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Abstract

The purpose of this work is to study the characteristics of the junction between the titanium down conductor of a thin-film solid-state lithium-ion battery (a-Si) and a negative Si@O@Al nanocomposite electrode. The results of measuring the band gap of the Si@O@Al nanocomposite and the height of the Schottky barrier of the Ti–Si@O@Al junction are presented. The transmission and reflection spectra of Si@O@Al films and its main phases a-Si, a-SiO_x, and a-Si(Al_x) are studied. The band gap of Si@O@Al was determined by the Tauc method, which is 1.52 eV for a-Si and 1.15 eV for nc-Si. The IV characteristics of Ti‒Si@O@Al, Ti–a-Si, Ti–a-SiO_0.8, and Ti–a-Si_0.9(Al_0.1) structures have been studied and the height of the Schottky barrier has been determined. The results obtained make it possible to estimate the Fermi energy of the nanocomposite and to interpret the hike in the SSLIB charging voltage as a result of the Al acceptor impurity compensation during lithiation. A change in the majority charge carriers in Si@O@Al leads to a decrease in the hole current and an increase in the density of the over-barrier electron current, as a result of which a step with a height of 1.5 V is formed on the charging curve.

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确定 Si@O@Al 纳米复合材料的带状结构和电导率

这项工作的目的是研究薄膜固态锂离子电池（a-Si）的钛下导体与负极 Si@O@Al 纳米复合电极之间的结点特性。本文介绍了 Si@O@Al 纳米复合材料带隙和 Ti-Si@O@Al 结的肖特基势垒高度的测量结果。研究了 Si@O@Al 薄膜及其主要相 a-Si、a-SiOx 和 a-Si(Alx)的透射和反射光谱。通过陶克法确定了 Si@O@Al 的带隙，a-Si 为 1.52 eV，nc-Si 为 1.15 eV。研究了 Ti-Si@O@Al、Ti-a-Si、Ti-a-SiO0.8 和 Ti-a-Si0.9(Al0.1) 结构的 IV 特性，并确定了肖特基势垒的高度。研究结果有助于估算纳米复合材料的费米能，并将 SSLIB 充电电压的上升解释为锂化过程中 Al 受体杂质补偿的结果。Si@O@Al 中多数电荷载流子的变化导致空穴电流减小、过势垒电子流密度增大，从而在充电曲线上形成了一个高度为 1.5 V 的阶梯。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Technical Physics 物理-物理：应用

CiteScore

1.30

自引率

14.30%

发文量

139

审稿时长

3-6 weeks

期刊介绍： Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.