Bonding mechanism of TC4 titanium alloy/T2 copper vacuum diffusion bonded joint with nickel as transition interlayer

IF 6.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING Journal of Manufacturing Processes Pub Date : 2024-10-03 DOI:10.1016/j.jmapro.2024.09.099
Baosheng Wu, Honggang Dong, Yueting Ma, Peng Li, Chao Li, Libing Huang
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Abstract

Vacuum diffusion bonding of TC4 titanium alloy (TC4) to T2 copper (T2) using nickel foil as transition interlayer was explored. Ti3Ni, Ti2Ni, TiNi, AlNi2Ti and TiNi3 phases arose at the TC4/Ni bonded interface, and Cu-Ni solid solution appeared in the Ni/T2 interface. Thereinto, AlNi2Ti was a kind of discontinuous nano precipitated phase, which distributed between TiNi and TiNi3 phases. The crystallographic orientations of Ti2Ni, TiNi, AlNi2Ti and TiNi3 phases were (201), (020), (11¯1) and (031), respectively. The interplanar spacing of (031), (11¯1) and (020) was correspondingly d(031) = 0.144 nm, d11¯1 = 0.275 nm and d(020) = 0.137 nm. The lattice mismatch between TiNi3 and TiNi was calculated to be 2.5 %, with low strain energy. The order of effective formation enthalpies for TiNi3, TiNi and Ti2Ni phases formed between titanium and nickel was HNiTi2 > HNiTi > HNi3Ti. The growth activation energy of TiNi3, TiNi and Ti2Ni phases was correspondingly 35.8 kJ/mol, 180.6 kJ/mol and 347.1 kJ/mol. When welding at 880 °C for 60 min, the highest shear strength of the joints could achieve 150 MPa. The joints fractured along the Ni/T2 interface, the fracture surface of joint was composed of elongated dimples and cellular pits, presenting a shear ductile fracture mode. FCC-Cu, FCC-Ni and (Ni, Cu)ss phases were detected on TC4 and T2 fracture surfaces by XRD. The interdiffusion coefficient ratio of (Ni in Cu)/(Cu in Ni) and (Ni in Ti)/(Ti in Ni) decreased gradually with increasing temperature.
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以镍为过渡中间层的 TC4 钛合金/T2 铜真空扩散粘接接头的粘接机理
以镍箔为过渡中间层,探索了 TC4 钛合金(TC4)与 T2 铜(T2)的真空扩散键合。在 TC4/Ni 粘合界面上出现了 Ti3Ni、Ti2Ni、TiNi、AlNi2Ti 和 TiNi3 相,在 Ni/T2 界面上出现了 Cu-Ni 固溶体。其中,AlNi2Ti 是一种不连续的纳米析出相,分布在 TiNi 和 TiNi3 相之间。Ti2Ni 相、TiNi 相、AlNi2Ti 相和 TiNi3 相的晶体学取向分别为(201)、(020)、(11¯1)和(031)。(031)、(11¯1) 和 (020) 的平面间距分别为 d(031) = 0.144 nm、d11¯1 = 0.275 nm 和 d(020) = 0.137 nm。经计算,TiNi3 和 TiNi 之间的晶格失配为 2.5%,应变能较低。钛和镍之间形成的 TiNi3、TiNi 和 Ti2Ni 相的有效形成焓顺序为 ∆H′NiTi2 > ∆H′NiTi > ∆H′Ni3Ti。TiNi3、TiNi 和 Ti2Ni 相的生长活化能分别为 35.8 kJ/mol、180.6 kJ/mol 和 347.1 kJ/mol。在 880 °C 下焊接 60 分钟时,接头的最高剪切强度可达 150 MPa。接头沿 Ni/T2 界面断裂,断裂面由细长的凹陷和蜂窝状坑洞组成,呈现剪切韧性断裂模式。通过 XRD 在 TC4 和 T2 断裂表面检测到 FCC-Cu、FCC-Ni 和 (Ni,Cu)ss 相。随着温度的升高,(Ni 在 Cu 中)/(Cu 在 Ni 中)和(Ni 在 Ti 中)/(Ti 在 Ni 中)的相互扩散系数比逐渐降低。
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来源期刊
Journal of Manufacturing Processes
Journal of Manufacturing Processes ENGINEERING, MANUFACTURING-
CiteScore
10.20
自引率
11.30%
发文量
833
审稿时长
50 days
期刊介绍: The aim of the Journal of Manufacturing Processes (JMP) is to exchange current and future directions of manufacturing processes research, development and implementation, and to publish archival scholarly literature with a view to advancing state-of-the-art manufacturing processes and encouraging innovation for developing new and efficient processes. The journal will also publish from other research communities for rapid communication of innovative new concepts. Special-topic issues on emerging technologies and invited papers will also be published.
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