{"title":"Silicon carbide PIN diode for tritium detection","authors":"","doi":"10.1016/j.vacuum.2024.113707","DOIUrl":null,"url":null,"abstract":"<div><div>We have designed a prototype of silicon carbide PIN diode for tritium detection. Monte-Carlo calculations showed the necessity to work in vacuum and employ thin and low-density coating layers, and drew the energy deposition profile in the device. The deposited energies have then been used to implement finite-elements simulations, in order to optimize three structural parameters (<span><math><mrow><mi>n</mi><mo>−</mo></mrow></math></span> doping concentration, <span><math><mi>p</mi></math></span> doping concentration, <span><math><mi>p</mi></math></span> zone thickness) maximizing the electrical response. Temperature lowering improves the diode electrical response.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":null,"pages":null},"PeriodicalIF":3.8000,"publicationDate":"2024-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X2400753X","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
We have designed a prototype of silicon carbide PIN diode for tritium detection. Monte-Carlo calculations showed the necessity to work in vacuum and employ thin and low-density coating layers, and drew the energy deposition profile in the device. The deposited energies have then been used to implement finite-elements simulations, in order to optimize three structural parameters ( doping concentration, doping concentration, zone thickness) maximizing the electrical response. Temperature lowering improves the diode electrical response.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.