Primary photodegradation pathways of an exciplex-forming A–D molecular system†

IF 5.2 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Advances Pub Date : 2024-09-25 DOI:10.1039/D4MA00532E
Yeongcheol Ki, Jonghyun Kim, Yeri Son, Suhyun Park, Won-jin Chung, Tae-Young Kim and Hohjai Lee
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Abstract

The photodegradation process of pyrene–(CH2)12–O–(CH2)2-N,N-dimethylaniline (Py-DMA), serving as a model molecular system for exciplex-forming A–D systems, is meticulously examined in solution. The alkyl chain-linker ensures efficient electron transfer between Py and DMA, enabling exciplex formation at concentrations as low as ∼5 μM, free from the interferences dominant in solid-state devices (domain–electrode interface, domain morphological change, accumulation of defects, and so on). The photodegradation mechanism of Py-DMA is proposed for the first time based on chemical identification using steady-state spectroscopy and LC-UV-MS techniques. The mechanism predicts Py-MMA (N-monomethylaniline) and Py-MFA (N-methylformanilide) as primary products and is verified by crosschecking experimental data from FT-IR and 1H NMR, as well as quantum mechanical calculation data. The heavy involvement of molecular oxygen (O2) predicted in the mechanism is confirmed by a series of deoxygenated condition experiments. Although we focus on the two primary photodegradation products, secondary, tertiary, and subsequent photodegradation products are also reported, such as PyOH-MPCA (methylphenylcarbamic acid), Py-FA (formanilide), and even unspecified black carbon precipitates. With recent emerging evidence of a close correlation between the stabilities of optoelectronic devices and their active molecules, the molecular photodegradation pathways of Py-DMA will shed light on the molecular design for exciplex-based optoelectronic devices with longer lifespans.

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形成赋形剂的 A-D 分子体系的主要光降解途径†。
芘-(CH2)12-O-(CH2)2-N,N-二甲基苯胺(Py-DMA)是形成赋形剂的 A-D 系统的典范分子体系,本研究对其在溶液中的光降解过程进行了细致的研究。烷基链连接剂确保了 Py 和 DMA 之间有效的电子传递,使得在低至 5 μM 的浓度下就能形成簇合物,不受固态器件中主要干扰因素(畴-电极界面、畴形态变化、缺陷积累等)的影响。在利用稳态光谱和 LC-UV-MS 技术进行化学鉴定的基础上,首次提出了 Py-DMA 的光降解机理。该机制预测 Py-MMA(N-单甲基苯胺)和 Py-MFA(N-甲基甲酰苯胺)为主要产物,并通过傅立叶变换红外光谱和 1H NMR 实验数据以及量子力学计算数据进行了交叉验证。一系列脱氧条件实验证实了该机制中分子氧(O2)的严重参与。虽然我们重点研究了两种主要光降解产物,但也报道了二级、三级和后续光降解产物,如 PyOH-MPCA(甲基苯基氨基甲酸)、Py-FA(甲酰苯胺),甚至还有未指定的黑炭沉淀物。最近新出现的证据表明,光电器件的稳定性与其活性分子之间存在密切联系,Py-DMA 的分子光降解途径将为设计寿命更长的基于赋形剂的光电器件的分子设计提供启示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Materials Advances
Materials Advances MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
7.60
自引率
2.00%
发文量
665
审稿时长
5 weeks
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