Investigating the effect of Cu underlayer and FTO etching towards photoelectrochemical performance enhancement of Cu2O photoelectrode

Abstract

Cuprous oxide (Cu₂O) exhibits potential as a photoactive material for photoelectrochemical water splitting, owing to its appropriate bandgap, efficient charge carrier separation, and ability to enhance solar-driven hydrogen production. This study investigates the influence of substrate etching, Cu underlayer and Cu₂O electrodeposition time, and annealing time on enhancing the photoelectrochemical (PEC) performance. Electrodeposition and thermal oxidation techniques were used to fabricate the Cu₂O/Cu/FTOe-A photocathode. It has been observed that FTO etching improves adhesion, light transmission, and efficiency. A Cu underlayer also impacts the PEC performance, wherein an ideal thickness of Cu leads to enhanced PEC performance. This study also focuses on the annealing time that leads to CuO layers and nanowires forming on the Cu₂O surface. The structural and chemical changes before and after annealing are confirmed via XRD, XPS, AFM and FESEM analyses. UV–Vis analysis also reveals that the presence of Cu underlayer, FTO etching, and the annealing process affect the electrical properties and light absorption capacities of the Cu₂O photoelectrode. Electrochemical impedance analysis (EIS) and Mott-Schottky analysis have provided insights into the enhanced charge transfer properties and band bending in the Cu₂O/Cu/FTOe-A, resulting in enhanced PEC performance. Overall, this study provides significant insights into the understanding and enhancement of Cu₂O/Cu/FTOe-A photocathodes for potential use in PEC water splitting applications.