2D Steep-Slope Tunnel Field-Effect Transistors Tuned by van der Waals Ferroelectrics

IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Advanced Electronic Materials Pub Date : 2024-10-18 DOI:10.1002/aelm.202400463
Xinrui Chen, Tiantian Jiang, Hanbin Wang, Yang Wang, Miao Zhang, Yi Cui, Yong Wang, Nannan Li, Xinchuan Du, Chaoyi Yan, Yuqing Liu, Xianfu Wang
{"title":"2D Steep-Slope Tunnel Field-Effect Transistors Tuned by van der Waals Ferroelectrics","authors":"Xinrui Chen, Tiantian Jiang, Hanbin Wang, Yang Wang, Miao Zhang, Yi Cui, Yong Wang, Nannan Li, Xinchuan Du, Chaoyi Yan, Yuqing Liu, Xianfu Wang","doi":"10.1002/aelm.202400463","DOIUrl":null,"url":null,"abstract":"sPower consumption has emerged as a central concern in the realm of complementary metal-oxide-semiconductor (CMOS) technology. Silicon-based semiconductor devices have now approached the fundamental thermionic limit of the subthreshold swing (SS), which is 60 mV dec<sup>−1</sup>, as defined by the Boltzmann tyranny. Tunnel field-effect transistors (TFETs) are considered promising low-power devices due to the band-to-band tunneling mechanism, which effectively avoids the thermionic limit. However, TFETs require the establishment of a staggered band alignment and currently lack effective techniques for adjusting the band offset. Here, by harnessing the robust ferroelectric field inherent to 2D CuInP<sub>2</sub>S<sub>6</sub> (CIPS), a 2D WSe<sub>2</sub>/MoS<sub>2</sub> heterojunction as well as a WSe<sub>2</sub> homojunction TFET controlled by ferroelectric gate are presented. The newly developed TFET achieves an ultra-low SS of 14.2 mV dec<sup>−1</sup> at room temperature, an on/off current ratio exceeding 10<sup>8</sup>, and a minimal hysteresis window below 10 mV. Additionally, the device demonstrates gate tunable negative differential resistance (NDR) characteristics with a very large peak-to-valley current ratio (PVCR) of 10.56 at room temperature. These findings underscore the significant promise of 2D ferroelectric tuning heterojunction and homojunction for future low-power electronic applications.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"124 1","pages":""},"PeriodicalIF":5.3000,"publicationDate":"2024-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/aelm.202400463","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

sPower consumption has emerged as a central concern in the realm of complementary metal-oxide-semiconductor (CMOS) technology. Silicon-based semiconductor devices have now approached the fundamental thermionic limit of the subthreshold swing (SS), which is 60 mV dec−1, as defined by the Boltzmann tyranny. Tunnel field-effect transistors (TFETs) are considered promising low-power devices due to the band-to-band tunneling mechanism, which effectively avoids the thermionic limit. However, TFETs require the establishment of a staggered band alignment and currently lack effective techniques for adjusting the band offset. Here, by harnessing the robust ferroelectric field inherent to 2D CuInP2S6 (CIPS), a 2D WSe2/MoS2 heterojunction as well as a WSe2 homojunction TFET controlled by ferroelectric gate are presented. The newly developed TFET achieves an ultra-low SS of 14.2 mV dec−1 at room temperature, an on/off current ratio exceeding 108, and a minimal hysteresis window below 10 mV. Additionally, the device demonstrates gate tunable negative differential resistance (NDR) characteristics with a very large peak-to-valley current ratio (PVCR) of 10.56 at room temperature. These findings underscore the significant promise of 2D ferroelectric tuning heterojunction and homojunction for future low-power electronic applications.

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由范德华铁电体调谐的二维陡坡隧道场效应晶体管
功耗已成为互补金属氧化物半导体(CMOS)技术领域的核心问题。硅基半导体器件目前已接近阈下摆幅(SS)的基本热电极限,即波尔兹曼暴政定义的 60 mV dec-1。隧穿场效应晶体管(TFET)采用带间隧穿机制,有效避免了热离子极限,因此被认为是很有前途的低功耗器件。然而,TFET 需要建立交错的带对齐,目前缺乏有效的带偏移调整技术。本文利用二维 CuInP2S6(CIPS)固有的强大铁电场,提出了一种二维 WSe2/MoS2 异质结以及一种由铁电栅极控制的 WSe2 同质结 TFET。新开发的 TFET 在室温下实现了 14.2 mV dec-1 的超低 SS 值、超过 108 的导通/关断电流比以及低于 10 mV 的最小滞后窗口。此外,该器件还具有栅极可调负差分电阻 (NDR) 特性,在室温下具有 10.56 的超大峰谷电流比 (PVCR)。这些发现强调了二维铁电调谐异质结和同质结在未来低功耗电子应用中的重要前景。
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来源期刊
Advanced Electronic Materials
Advanced Electronic Materials NANOSCIENCE & NANOTECHNOLOGYMATERIALS SCIE-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
11.00
自引率
3.20%
发文量
433
期刊介绍: Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.
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