{"title":"Nano-Meter Resolution Line-Offset Detector Arrays (LODAs) for Pattern Monitoring in EUV Lithography System","authors":"Wei Chang;Burn Jeng Lin;Pin-Jiun Wu;Jiaw-Ren Shih;Yue-Der Chih;Jonathan Chang;Chrong Jung Lin;Ya-Chin King","doi":"10.1109/TED.2024.3462670","DOIUrl":null,"url":null,"abstract":"A novel line-offset detector array (LODA) is demonstrated for the first time, which can resolve projected patterns in extreme ultraviolet (EUV) scanners for advanced integrated circuit (IC) processes. Fine layout patterns on the projected plane can be truthfully reconstructed by the uniquely designed line-offset array. With nano-meter spatial resolution, the on-wafer battery-less detector array can be read out offline through wafer-level tests. The LODA provides a new direction of nano-meter pattern monitoring that helps maintain stability in EUV lithography systems for CMOS nodes beyond 5 nm.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"71 11","pages":"6850-6856"},"PeriodicalIF":2.9000,"publicationDate":"2024-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10700037/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
A novel line-offset detector array (LODA) is demonstrated for the first time, which can resolve projected patterns in extreme ultraviolet (EUV) scanners for advanced integrated circuit (IC) processes. Fine layout patterns on the projected plane can be truthfully reconstructed by the uniquely designed line-offset array. With nano-meter spatial resolution, the on-wafer battery-less detector array can be read out offline through wafer-level tests. The LODA provides a new direction of nano-meter pattern monitoring that helps maintain stability in EUV lithography systems for CMOS nodes beyond 5 nm.
期刊介绍：
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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