Stacking-tuned quantum anomalous Hall effect and multi-phase transition in Kagome lattice V2Se3†

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-09-20 DOI:10.1039/D4TC03058C
Lixin Zhang, Naibin Wang, Xiuwen Zhao, Guichao Hu, Junfeng Ren and Xiaobo Yuan
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Abstract

The physical properties induced by layer stacking in two dimensional materials are fascinating. Here, a hexagonal Kagome lattice V2Se3 is constructed to investigate the dependence of the quantum anomalous Hall effect (QAHE) and the phase transition on the different stacking. Based on first principles calculations, the tight-binding model, and the irreducible representations, it is found that QAHE with a Chern number of 1 can be realized in the V2Se3 monolayer. While the V2Se3 bilayer is constructed, the interlayer interaction affects the Dirac cone, so QAHE with Chern number changes from −1 to 2 can be obtained by changing the different stacking patterns. On the other hand, applying biaxial tensile strain and changing stacking patterns in the V2Se3 bilayer will affect the d orbitals of the V atoms. In bilayer V2Se3, applying biaxial tensile strain affects the d orbitals of the V atoms that constitute the Dirac cone, and then a topological phase transition appears. Moreover, changing the stacking patterns induces the hybridization competition of the d orbitals, which leads to a magnetic phase transition. Constructing a Kagome bilayer and changing their stacking patterns paves a pathway in exploring quantum effects of topology and magnetism in layered materials.

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鹿目晶格 V2Se3† 中的堆叠调谐量子反常霍尔效应和多相转变
二维材料中的层堆叠所诱导的物理性质令人着迷。这里,我们构建了一个六边形卡戈米晶格 V2Se3,以研究量子反常霍尔效应(QAHE)和相变对不同堆积的依赖性。基于第一性原理计算、紧束缚模型和不可还原表征,研究发现在 V2Se3 单层中可以实现切尔数为 1 的 QAHE。在构建 V2Se3 双层时,层间相互作用会影响狄拉克锥,因此可以通过改变不同的堆叠模式获得切尔数从-1 到 2 变化的 QAHE。另一方面,在 V2Se3 双层中施加双轴拉伸应变并改变堆叠模式会影响 V 原子的 d 轨道。在双层 V2Se3 中,施加双轴拉伸应变会影响构成狄拉克锥的 V 原子的 d 轨道,然后出现拓扑相变。此外,改变堆叠模式会引起 d 轨道的杂化竞争,从而导致磁性相变。构建卡戈米双分子层并改变它们的堆积模式,为探索层状材料中拓扑和磁性的量子效应铺平了道路。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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