Wei Huang , Guangliang Xu , Jing Chen , Wei Shi , Yingchang Yang
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引用次数: 0
Abstract
Due to its distinctive two-dimensional planar structure, room temperature quantum Hall effect, and high strength, graphene has garnered significant interest in the fields of energy storage and conversion. In order to achieve high efficiency in the production of graphene, electrochemical peeling has been extensively investigated. Nevertheless, the intermolecular forces between graphite layers are disrupted during ion intercalation in solution, leading to inconsistent bonding forces and low yields. In order to address the issues above, this study introduces a novel bottom-up electrochemical peeling method, wherein graphite expansion occurs above the electrolyte. By preventing contact between the peeled graphene and the electrolyte, the oxidation of graphene is significantly minimized, resulting in a substantial yield of 88 %. At the current density of 1.0 A g−1, the Go-QAS displayed 225.5 F g−1, and kept about 220.2 F g−1 after 500 cycles. The well-designed bottom-up peeling process leads to graphene nanosheets with reduced structural degradation, high purity, and excellent conductivity. This technique is expected to introduce innovative concepts for the field.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.