Thermal conductivity of GaN with a vacancy and an oxygen point defect

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Journal of Crystal Growth Pub Date : 2024-10-28 DOI:10.1016/j.jcrysgro.2024.127948
Takahiro Kawamura , Ryogo Nishiyama , Toru Akiyama , Shigeyoshi Usami , Masayuki Imanishi , Yusuke Mori , Masashi Yoshimura
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Abstract

GaN has high thermal conductivity, therefore it is expected to be used in high-power, high-frequency, and compact electronic devices. However, GaN includes many defects and impurities, which reduce its thermal conductivity. Therefore, the effect of defects and impurities on the thermal conductivity of GaN needs to be understood for optimal thermal management. In this study, the thermal conductivity of GaN in three cases – with a Ga vacancy, an N vacancy, and an O impurity substituted at an N site – was investigated using first-principles calculations. Thermal conductivity was calculated based on the Boltzmann transportation equation under the relaxation time approximation. At 300 K, the thermal conductivity values of pure GaN and GaN with a Ga vacancy, an N vacancy, and an O substitutional impurity (defect concentrations1.3×1021 cm−3) were 325, 74, 70, and 138 W/(m K), respectively. It was found from the spectrum of thermal conductivity that acoustic phonons at frequencies lower than 10 THz were responsible for most of the thermal conductivity of GaN. We also examined the effect of sample size on thermal conductivity and found that the cumulative thermal conductivity value of pure GaN was less than 9% of the bulk value, when the sample size was smaller than 100 nm.
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具有空位和氧点缺陷的氮化镓的热导率
氮化镓具有高热导率,因此有望用于大功率、高频率和紧凑型电子设备。然而,氮化镓含有许多缺陷和杂质,会降低其热导率。因此,需要了解缺陷和杂质对氮化镓热导率的影响,以优化热管理。在本研究中,我们利用第一性原理计算研究了 GaN 在三种情况下的热导率:Ga 空位、N 空位和在 N 位点上被 O 杂质取代。热导率的计算基于弛豫时间近似下的玻尔兹曼输运方程。在 300 K 下,纯 GaN 和含有 Ga 空位、N 空位和 O 置换杂质(缺陷浓度∼1.3×1021 cm-3)的 GaN 的热导率值分别为 325、74、70 和 138 W/(m K)。从热导率频谱中发现,频率低于 10 太赫兹的声子是 GaN 热导率的主要原因。我们还研究了样品尺寸对热导率的影响,发现当样品尺寸小于 100 nm 时,纯氮化镓的累积热导率值不到块体值的 9%。
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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