Synergistic effect of indium doping on thermoelectric performance of cubic GeTe-based thin films

IF 10 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Today Physics Pub Date : 2024-11-01 DOI:10.1016/j.mtphys.2024.101581
Suman Abbas , Bhawna Jarwal , Thi-Thong Ho , Suneesh Meledath Valiyaveettil , Cheng-Rong Hsing , Ta-Lei Chou , Ching-Ming Wei , Li-Chyong Chen , Kuei-Hsien Chen
{"title":"Synergistic effect of indium doping on thermoelectric performance of cubic GeTe-based thin films","authors":"Suman Abbas ,&nbsp;Bhawna Jarwal ,&nbsp;Thi-Thong Ho ,&nbsp;Suneesh Meledath Valiyaveettil ,&nbsp;Cheng-Rong Hsing ,&nbsp;Ta-Lei Chou ,&nbsp;Ching-Ming Wei ,&nbsp;Li-Chyong Chen ,&nbsp;Kuei-Hsien Chen","doi":"10.1016/j.mtphys.2024.101581","DOIUrl":null,"url":null,"abstract":"<div><div>Germanium Telluride (GeTe) has been widely explored as a promising lead-free thermoelectric material in its rhombohedral and cubic phases. However, the structural transition between these two phases at ∼700 K causes an abrupt change of thermal expansion coefficient, challenging its broader practical applications. Also, as characterized by multi-valence bands and strong anharmonic interaction, the high-temperature cubic phase exhibits a higher power factor, lower thermal conductivity, and ultimately superior thermoelectric performance than its rhombohedral counterpart. Prompted by these, in this work, the cubic phase of Ge<sub>0.9</sub>Sb<sub>0.1</sub>Te (presented as GeSbTe in the following content) nanocrystalline thin film is successfully realized by RF sputtering followed by post-annealing treatment. Additionally, indium, as an electron donor to the germanium site and an effective scattering center, further moderates carrier concentration, enhances the Seebeck coefficient and reduces thermal conductivity. The optimal composition achieves an estimated peak <span><math><mrow><mi>z</mi><mi>T</mi></mrow></math></span> of ∼1.95 and an estimated average <span><math><mrow><mi>z</mi><mi>T</mi></mrow></math></span> of ∼1.11 within the temperature range of 300 K–575 K, showcasing GeTe as a compelling candidate for applications close to room temperature.</div></div>","PeriodicalId":18253,"journal":{"name":"Materials Today Physics","volume":"49 ","pages":"Article 101581"},"PeriodicalIF":10.0000,"publicationDate":"2024-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Today Physics","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2542529324002578","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Germanium Telluride (GeTe) has been widely explored as a promising lead-free thermoelectric material in its rhombohedral and cubic phases. However, the structural transition between these two phases at ∼700 K causes an abrupt change of thermal expansion coefficient, challenging its broader practical applications. Also, as characterized by multi-valence bands and strong anharmonic interaction, the high-temperature cubic phase exhibits a higher power factor, lower thermal conductivity, and ultimately superior thermoelectric performance than its rhombohedral counterpart. Prompted by these, in this work, the cubic phase of Ge0.9Sb0.1Te (presented as GeSbTe in the following content) nanocrystalline thin film is successfully realized by RF sputtering followed by post-annealing treatment. Additionally, indium, as an electron donor to the germanium site and an effective scattering center, further moderates carrier concentration, enhances the Seebeck coefficient and reduces thermal conductivity. The optimal composition achieves an estimated peak zT of ∼1.95 and an estimated average zT of ∼1.11 within the temperature range of 300 K–575 K, showcasing GeTe as a compelling candidate for applications close to room temperature.

Abstract Image

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
掺杂铟对立方 GeTe 基薄膜热电性能的协同效应
碲化镉锗(GeTe)的斜方体相和立方体相作为一种前景广阔的无铅热电材料已被广泛探索。然而,这两种相在 ∼700 K 时的结构转变会导致热膨胀系数的突然变化,这对其更广泛的实际应用提出了挑战。此外,高温立方相具有多价带和强非谐相互作用的特点,与斜方体相相比,其功率因数更高,热导率更低,热电性能更优。有鉴于此,在这项工作中,通过射频溅射和退火后处理,成功实现了 Ge0.9Sb0.1Te(下文中称为 GeSbTe)纳米晶薄膜的立方相。此外,铟作为锗位点的电子供体和有效的散射中心,进一步缓和了载流子浓度,提高了塞贝克系数并降低了热导率。在 300 K 至 575 K 的温度范围内,最佳成分的峰值估计为 ∼ 1.95,平均值估计为 ∼ 1.11,这表明 GeTe 是接近室温应用的理想候选材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Materials Today Physics
Materials Today Physics Materials Science-General Materials Science
CiteScore
14.00
自引率
7.80%
发文量
284
审稿时长
15 days
期刊介绍: Materials Today Physics is a multi-disciplinary journal focused on the physics of materials, encompassing both the physical properties and materials synthesis. Operating at the interface of physics and materials science, this journal covers one of the largest and most dynamic fields within physical science. The forefront research in materials physics is driving advancements in new materials, uncovering new physics, and fostering novel applications at an unprecedented pace.
期刊最新文献
Mist CVD Technology for Gallium Oxide Deposition: A Review Atomic Imprint Crystallization: Externally-Templated Crystallization of Amorphous Silicon Achieving ultra-high resistivity and outstanding piezoelectric properties by co-substitution in CaBi2Nb2O9 ceramics Data-driven design of thermal-mechanical multifunctional metamaterials Construction of bifunctional MOF-based composite electrocatalysts promoting oxygen evolution reaction and glucose oxidation reaction and its kinetic deciphering
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1