Simultaneous laser polishing and N-doping of niobium

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2024-11-11 DOI:10.1063/5.0228817
Florian Brockner, Dirk Lützenkirchen-Hecht
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Abstract

Superconducting niobium is the base material for many modern particle accelerators. The high cleanliness requirements in all radio frequency superconductor technology have led to the development of complex cleaning processes in recent decades. High-pressure rinsing, heating processes under vacuum and gas atmospheres as well as chemical and electrochemical polishing are commonly applied procedures, that are required to obtain the properties needed for their application. In order to optimize the surface finish of Nb materials in a more environment-compatible way, i.e., with less energy consumption and avoiding hazardous liquids, we report on a combination of simultaneous N-doping and laser polishing here. A nanosecond laser was employed, and the prepared Nb surfaces were investigated with a combination of electron microscopy, x-ray fluorescence spectroscopy (EDX), optical profilometry, and x-ray absorption spectroscopy (EXAFS) to show the effect of different N2-pressures during the laser polishing procedure in an ultrahigh vacuum chamber. The results show that for N2-pressures above ca. 10−3 mbar, traces of nitrogen can be observed by both EDX and EXAFS. In parallel, a smoothing of the surfaces occur, with slightly different roughnesses and microstructures of the polycrystalline Nb surfaces depending on the N2-pressure.
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铌的同步激光抛光和 N 掺杂
超导铌是许多现代粒子加速器的基础材料。由于所有射频超导体技术都对清洁度有很高的要求,因此近几十年来开发出了复杂的清洁工艺。高压冲洗、真空和气体环境下的加热过程以及化学和电化学抛光都是常用的程序,这些都是获得应用所需的性能所必需的。为了以更环保的方式优化铌材料的表面光洁度,即减少能源消耗和避免使用有害液体,我们在此报告了同时进行掺钕和激光抛光的方法。我们使用纳秒激光,并结合电子显微镜、X 射线荧光光谱(EDX)、光学轮廓仪和 X 射线吸收光谱(EXAFS)对制备的铌表面进行了研究,以显示在超高真空室中进行激光抛光过程中不同 N2 压力的影响。结果表明,当氮气压力高于约 10-3 毫巴时,氮气的痕迹就会消失。10-3 毫巴时,EDX 和 EXAFS 都能观察到氮的痕迹。同时,表面出现平滑现象,多晶铌表面的粗糙度和微观结构因 N2 压力而略有不同。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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