Computational discovery of two-dimensional tetragonal group IV–V monolayers †

IF 3.9 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY RSC Advances Pub Date : 2024-11-12 DOI:10.1039/D4RA06623E
Qiubao Lin, Jungang Huang, Yimei Fang, Feng Zheng, Kaixuan Chen, Shunqing Wu and Zi-Zhong Zhu
{"title":"Computational discovery of two-dimensional tetragonal group IV–V monolayers †","authors":"Qiubao Lin, Jungang Huang, Yimei Fang, Feng Zheng, Kaixuan Chen, Shunqing Wu and Zi-Zhong Zhu","doi":"10.1039/D4RA06623E","DOIUrl":null,"url":null,"abstract":"<p >The two-dimensional (2D) hexagonal group IV–V family has attracted significant attention due to their unique properties and potential applications in electronics, spintronics, and photocatalysis. In this study, we report the discovery of a stable tetragonal allotrope, termed the Td4 phase, of 2D IV–V monolayers through a structural search utilizing an adaptive genetic algorithm. We investigate the geometric structures, structural stabilities, and band structures of the Td4-phase 2D IV–V monolayers (where IV = Si, Ge, Sn; V = P, As, Sb) based on the first-principles calculations. All the investigated 2D IV–V monolayers are dynamically and thermodynamically stable, and exhibit metallic behavior in their pristine form. Furthermore, we investigate the effects of surface hydrogenation on the electronic structures of these monolayers. Except for the hydrogenated GeSb monolayer, the remaining 2D IV–V monolayers turn into indirect semiconductors, with band gap values ranging from 0.15 to 1.12 eV. This work expands the known structural motifs within the 2D group IV–V family and contributes to the ongoing exploration of low-dimensional materials.</p>","PeriodicalId":102,"journal":{"name":"RSC Advances","volume":" 49","pages":" 36173-36180"},"PeriodicalIF":3.9000,"publicationDate":"2024-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.rsc.org/en/content/articlepdf/2024/ra/d4ra06623e?page=search","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"RSC Advances","FirstCategoryId":"92","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2024/ra/d4ra06623e","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The two-dimensional (2D) hexagonal group IV–V family has attracted significant attention due to their unique properties and potential applications in electronics, spintronics, and photocatalysis. In this study, we report the discovery of a stable tetragonal allotrope, termed the Td4 phase, of 2D IV–V monolayers through a structural search utilizing an adaptive genetic algorithm. We investigate the geometric structures, structural stabilities, and band structures of the Td4-phase 2D IV–V monolayers (where IV = Si, Ge, Sn; V = P, As, Sb) based on the first-principles calculations. All the investigated 2D IV–V monolayers are dynamically and thermodynamically stable, and exhibit metallic behavior in their pristine form. Furthermore, we investigate the effects of surface hydrogenation on the electronic structures of these monolayers. Except for the hydrogenated GeSb monolayer, the remaining 2D IV–V monolayers turn into indirect semiconductors, with band gap values ranging from 0.15 to 1.12 eV. This work expands the known structural motifs within the 2D group IV–V family and contributes to the ongoing exploration of low-dimensional materials.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
二维四方 IV-V 族单层的计算发现 †
二维(2D)六边形 IV-V 族因其独特的性质以及在电子学、自旋电子学和光催化领域的潜在应用而备受关注。在本研究中,我们利用自适应遗传算法进行结构搜索,发现了一种稳定的二维 IV-V 族单层四方同素异形体,称为 Td4 相。我们基于第一原理计算研究了 Td4 相二维 IV-V 单层(其中 IV = Si、Ge、Sn;V = P、As、Sb)的几何结构、结构稳定性和能带结构。所有被研究的二维 IV-V 单层在动力学和热力学上都很稳定,并在原始状态下表现出金属特性。此外,我们还研究了表面氢化对这些单层电子结构的影响。除了氢化 GeSb 单层外,其余的二维 IV-V 单层都变成了间接半导体,带隙值在 0.15 至 1.12 eV 之间。这项研究拓展了二维 IV-V 族中已知的结构模式,为目前对低维材料的探索做出了贡献。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
RSC Advances
RSC Advances chemical sciences-
CiteScore
7.50
自引率
2.60%
发文量
3116
审稿时长
1.6 months
期刊介绍: An international, peer-reviewed journal covering all of the chemical sciences, including multidisciplinary and emerging areas. RSC Advances is a gold open access journal allowing researchers free access to research articles, and offering an affordable open access publishing option for authors around the world.
期刊最新文献
Innovative multi-layered Fe3O4-Gr/carbon/polypyrrole nanofiber composite: “a new frontier in dielectric enhancement and EMI shielding” Establishment of a Raman microsphere-based immunochromatographic method for the combined detection of influenza A and B viruses and SARS-CoV-2 antigen on a single T-line† Facile synthesis of corticiolic acid—a bioactive pharmacophore from natural sources† Efficient photocatalytic performance of hydrogen bonding between P25 and microcrystalline cellulose aerogel† Development of flexible Zn/MnO2 secondary batteries using a fumed silica-doped hydrogel electrolyte†
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1