Yiyang Shan , Xingkun Wang , Xu Zheng , Xiang Zhao , Ze Feng , Weihua Wang , Yahui Cheng , Hui Liu , Kui Tan , Feng Luo , Hong Dong
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引用次数: 0
Abstract
Molecular layer deposition (MLD) of metal oxide and organic hybrid thin films has great potential to be utilized in extreme ultraviolet photoresist, thanks to its excellent uniformity on the nanometer scale thickness control. Zn has large photoelectron effect cross-section, resulting in lots of secondary electrons, which can break the organic bonds, causing changes in solubility upon the ultraviolet (UV) light exposure. In this work, Zn-based MLD thin films have been demonstrated for their potential to be used as photoresist for extreme ultraviolet (EUV) application. UV light exposure mechanisms have been proposed based on X-ray photoelectron spectroscopy (XPS) analysis.
期刊介绍：
Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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