Degeneration mechanism of 30 MeV and 100 MeV proton irradiation effects on 1.2 kV SiC MOSFETs

IF 2.8 3区 物理与天体物理 Q3 CHEMISTRY, PHYSICAL Radiation Physics and Chemistry Pub Date : 2024-11-09 DOI:10.1016/j.radphyschem.2024.112378
Jae Hwa Seo , Young Jo Kim , In Ho Kang , Jeong Hyun Moon , Yu-Mi Kim , Young Jun Yoon , Hyoung Woo Kim
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Abstract

In this study, we evaluated and characterized the effects of various proton irradiation energies and fluences on the electrical characteristics of SiC MOSFETs using a proton accelerator. The devices under test (DUTs) were fabricated utilizing 1.2 kV SiC MOSFET processes. To assess the impact of total ionizing dose (TID) and displacement damage (DD) on SiC MOSFETs, the DUTs were exposed to protons irradiation at energies of 30 MeV and 100 MeV, under ambient temperature conditions. Additionally, we examined the radiation hardness of DUTs under varying proton fluences, including 1 × 1012 cm−2, 1 × 1013 cm−2, 5 × 1013 cm−2, and 1 × 1014 cm−2.
The results demonstrate that the threshold voltage (Vth) of the irradiated devices exhibited a negative shift, attributable to radiation-induced positive oxide trapped charges. This negative shift in Vth, coupled with the accumulation of positive trapped charges in the field limiting ring (FLR) oxide, resulted in augmented output currents and diminished breakdown voltage (BV) values. A significant reduction in current, ranging from 70% to 99%, was observed in the DUT subjected to irradiation at of 30 MeV and 1 × 1014 cm−2, highlighting the influence of DD. Conversely, irradiation at 100 MeV primarily revealed TID effects, characterized by a negatively shifted Vth. The on-state current at a gate voltage of 10 V and a drain voltage of 5 V of the DUT with irradiation of 100 MeV and 1 × 1014 cm−2 was a higher than that of DUT without irradiation because of a reduction of Vth.
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30 MeV 和 100 MeV 质子辐照对 1.2 kV SiC MOSFET 影响的退化机制
在这项研究中,我们利用质子加速器评估并鉴定了各种质子辐照能量和流量对 SiC MOSFET 电气特性的影响。被测器件 (DUT) 是利用 1.2 kV SiC MOSFET 工艺制造的。为了评估总电离剂量 (TID) 和位移损伤 (DD) 对 SiC MOSFET 的影响,我们在环境温度条件下将 DUT 暴露于能量为 30 MeV 和 100 MeV 的质子辐照。此外,我们还检测了不同质子通量(包括 1 × 1012 cm-2、1 × 1013 cm-2、5 × 1013 cm-2 和 1 × 1014 cm-2)下 DUT 的辐射硬度。阈值电压(Vth)的负偏移,加上场致限制环(FLR)氧化物中正电荷的积累,导致输出电流增大,击穿电压(BV)值降低。在 30 MeV 和 1 × 1014 cm-2 的辐照条件下,DUT 的电流明显降低了 70% 到 99%,这突出表明了 DD 的影响。相反,100 MeV 的辐照主要显示了 TID 效应,其特征是 Vth 负移。在栅极电压为 10 V、漏极电压为 5 V 的情况下,辐照 100 MeV 和 1 × 1014 cm-2 的 DUT 的导通电流高于未辐照的 DUT,原因是 Vth 减小了。
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来源期刊
Radiation Physics and Chemistry
Radiation Physics and Chemistry 化学-核科学技术
CiteScore
5.60
自引率
17.20%
发文量
574
审稿时长
12 weeks
期刊介绍: Radiation Physics and Chemistry is a multidisciplinary journal that provides a medium for publication of substantial and original papers, reviews, and short communications which focus on research and developments involving ionizing radiation in radiation physics, radiation chemistry and radiation processing. The journal aims to publish papers with significance to an international audience, containing substantial novelty and scientific impact. The Editors reserve the rights to reject, with or without external review, papers that do not meet these criteria. This could include papers that are very similar to previous publications, only with changed target substrates, employed materials, analyzed sites and experimental methods, report results without presenting new insights and/or hypothesis testing, or do not focus on the radiation effects.
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