Investigation of the Adaptability of Pt/HfO2/n+Si Memristors with Self-Limiting Oxygen-Deficient Hafnium Oxide Films under Repetitive Pulse Stimuli

Kexiang Wang, Jie Lu, Zeyang Xiang, Mengrui Shi, Liuxuan Wu, Fuyu Yan, Ran Jiang
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Abstract

In this study, the performance of memristive devices made of oxygen-deficient HfO2 films is investigated when exposed to various electrical pulse stimulations. The devices exhibited signs of fatigue with the number increasing of a fixed frequency pulse, mirroring the synaptic adaptation to repeat stimuli. Interestingly, the synaptic behavior can be highly simulated by logic function, and the pulse frequency and magnitude play different roles in changing the synaptic curves. Only pulses with certain quantized frequencies can reshape the synaptic current response curve. In addition, a similarity is observed between the frequency stability of these devices and the biological lifespan in response to external stimuli. These observations strengthen the case for the potential of memristors in emulating cognitive functions.

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带有自限制缺氧氧化铪薄膜的 Pt/HfO2/n+Si Memristors 在重复脉冲刺激下的适应性研究
本研究调查了由缺氧二氧化铪薄膜制成的记忆器件在受到各种电脉冲刺激时的性能。随着固定频率脉冲次数的增加,器件表现出疲劳迹象,这反映了突触对重复刺激的适应性。有趣的是,突触行为可通过逻辑函数进行高度模拟,脉冲频率和幅度在改变突触曲线方面发挥着不同的作用。只有特定量化频率的脉冲才能重塑突触电流响应曲线。此外,这些装置的频率稳定性与生物对外界刺激的反应寿命之间也有相似之处。这些观察结果增强了忆阻器在模拟认知功能方面的潜力。
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