首页 > 最新文献

Advanced Physics Research最新文献

英文 中文
Issue Information (Adv. Phys. Res. 1/2026) 发行信息(物理广告)研究》1/2026)
IF 2.8 Pub Date : 2026-01-12 DOI: 10.1002/apxr.70084
{"title":"Issue Information (Adv. Phys. Res. 1/2026)","authors":"","doi":"10.1002/apxr.70084","DOIUrl":"https://doi.org/10.1002/apxr.70084","url":null,"abstract":"","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2026-01-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.70084","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145969873","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information (Adv. Phys. Res. 12/2025) 发行信息(物理广告)研究》12/2025)
IF 2.8 Pub Date : 2025-12-12 DOI: 10.1002/apxr.70056
{"title":"Issue Information (Adv. Phys. Res. 12/2025)","authors":"","doi":"10.1002/apxr.70056","DOIUrl":"https://doi.org/10.1002/apxr.70056","url":null,"abstract":"","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"4 12","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.70056","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145719554","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Magneto-Tunable Thermal Diode Based on Bulk Superconductor (Adv. Phys. Res. 12/2025) 基于体超导体的磁可调谐热二极管。研究》12/2025)
IF 2.8 Pub Date : 2025-12-12 DOI: 10.1002/apxr.70055
Poonam Rani, Masayuki Mashiko, Keisuke Hirata, Ken-ichi Uchida, Yoshikazu Mizuguchi

Superconductor-Based Thermal Diode

In Research Article e00080, Yoshikazu Mizuguchi and co-workers report the experimental observation of thermal rectification in a bulk-superconductor-based thermal diode. The cover illustrates the Pb-Al thermal diode where the cooler part is superconducting Pb, and the hotter part is normal-conducting Al. Because of low thermal conductivity of a superconductor, the resulting effective thermal conductivity is lower than the opposite heat flow where the cooler part is normal-conducting Al, and the hotter part is normal-conducting Pb.

在论文e00080中,Yoshikazu Mizuguchi和他的同事报告了在大块超导体基热二极管中热整流的实验观察。所述罩示出的Pb-Al热二极管,其中较冷的部分为超导Pb,较热的部分为正导Al。由于超导体的导热系数较低,所产生的有效导热系数低于相反的热流,即较冷的部分为正导Al,较热的部分为正导Pb。
{"title":"Magneto-Tunable Thermal Diode Based on Bulk Superconductor (Adv. Phys. Res. 12/2025)","authors":"Poonam Rani,&nbsp;Masayuki Mashiko,&nbsp;Keisuke Hirata,&nbsp;Ken-ichi Uchida,&nbsp;Yoshikazu Mizuguchi","doi":"10.1002/apxr.70055","DOIUrl":"https://doi.org/10.1002/apxr.70055","url":null,"abstract":"<p><b>Superconductor-Based Thermal Diode</b></p><p>In Research Article e00080, Yoshikazu Mizuguchi and co-workers report the experimental observation of thermal rectification in a bulk-superconductor-based thermal diode. The cover illustrates the Pb-Al thermal diode where the cooler part is superconducting Pb, and the hotter part is normal-conducting Al. Because of low thermal conductivity of a superconductor, the resulting effective thermal conductivity is lower than the opposite heat flow where the cooler part is normal-conducting Al, and the hotter part is normal-conducting Pb.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"4 12","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.70055","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145730540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Ion Irradiation on the Anomalous Hall Effect in Cr1+δTe2 离子辐照对Cr1+δTe2中反常霍尔效应的影响
IF 2.8 Pub Date : 2025-12-09 DOI: 10.1002/apxr.202500150
Huixin Wang, Yifei Ma, Yang Xu, Feng Luo, Shuai Ning

The emergence of intrinsic 2D magnetic materials has opened new avenues for spintronic applications. Among them, Cr1+δTe2 has attracted significant interest due to its near-room-temperature ferromagnetism and widely-tunable chemical stoichiometry. In this work, we demonstrate a comprehensive study on the controlled modification of magnetic and electronic transport properties in 2D Cr1+δTe2 through focused Ga⁺ ion irradiation. Specifically, we achieved a progressive reduction and eventual full suppression of the anomalous Hall effect (AHE) sign-reversal temperature via modulating the irradiation dose, while the Curie temperature remains notably stable. Cross-sectional and elemental mapping analyses revealed irradiation-induced structural and compositional changes, highlighting the potentially distinct role of structural amorphization and stoichiometric variation in mediating the AHE behavior and magnetic ordering. The discovery of residual magnetism and tunable AHE in the amorphized structures establishes focused ion beam irradiation as a viable method for designing crystalline/amorphous architectures, offering great promise for the design of novel functionalities.

本征二维磁性材料的出现为自旋电子的应用开辟了新的途径。其中,Cr1+δTe2由于其近室温铁磁性和广泛可调的化学计量学而引起了人们的极大兴趣。在这项工作中,我们通过聚焦Ga +离子辐照对二维Cr1+δTe2的磁性和电子输运性质进行了全面的研究。具体来说,我们通过调节辐照剂量实现了异常霍尔效应(AHE)信号反转温度的逐步降低和最终完全抑制,而居里温度保持明显稳定。横断面和元素映射分析揭示了辐照引起的结构和成分变化,强调了结构非晶化和化学计量变化在介导AHE行为和磁有序中的潜在独特作用。在非晶结构中发现的残余磁性和可调谐AHE确立了聚焦离子束辐照作为设计晶体/非晶结构的可行方法,为设计新功能提供了巨大的希望。
{"title":"Effect of Ion Irradiation on the Anomalous Hall Effect in Cr1+δTe2","authors":"Huixin Wang,&nbsp;Yifei Ma,&nbsp;Yang Xu,&nbsp;Feng Luo,&nbsp;Shuai Ning","doi":"10.1002/apxr.202500150","DOIUrl":"https://doi.org/10.1002/apxr.202500150","url":null,"abstract":"<p>The emergence of intrinsic 2D magnetic materials has opened new avenues for spintronic applications. Among them, Cr<sub>1+δ</sub>Te<sub>2</sub> has attracted significant interest due to its near-room-temperature ferromagnetism and widely-tunable chemical stoichiometry. In this work, we demonstrate a comprehensive study on the controlled modification of magnetic and electronic transport properties in 2D Cr<sub>1+δ</sub>Te<sub>2</sub> through focused Ga⁺ ion irradiation. Specifically, we achieved a progressive reduction and eventual full suppression of the anomalous Hall effect (AHE) sign-reversal temperature via modulating the irradiation dose, while the Curie temperature remains notably stable. Cross-sectional and elemental mapping analyses revealed irradiation-induced structural and compositional changes, highlighting the potentially distinct role of structural amorphization and stoichiometric variation in mediating the AHE behavior and magnetic ordering. The discovery of residual magnetism and tunable AHE in the amorphized structures establishes focused ion beam irradiation as a viable method for designing crystalline/amorphous architectures, offering great promise for the design of novel functionalities.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500150","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145969655","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering ECWR辅助中频磁控溅射沉积TiN层的等离子体特性
IF 2.8 Pub Date : 2025-12-08 DOI: 10.1002/apxr.202500166
Libor Nožka, Miroslav Hrabovský, Zdenek Hubička, Aneta Písaříková, Jan Krajczewski, Petr Schovánek, Jan Tomáštík, Lukas Václavek

This study investigates the plasmonic properties of TiN thin films deposited by pulsed mid-frequency reactive magnetron sputtering combined with RF inductively coupled plasma in a DC magnetic field and electron cyclotron wave resonance (ECWR). The substrate was grounded while the plasma potential was tuned by applying a positive DC bias from 0 to 120 V to the ECWR coil relative to ground. Raising the DC bias increased the plasma potential and thus accelerated ions to energies corresponding to that potential, producing energetic ion bombardment of the grounded substrate. The principal benefit of adding ECWR plasma and a DC bias is an increased degree of ionization in the reactive plasma. Consequently, the resulting denser plasma and enhanced N2 dissociation improve the internal structure of the deposited films even at low substrate temperatures.

研究了脉冲中频反应磁控溅射与射频感应耦合等离子体在直流磁场和电子回旋波共振(ECWR)下沉积TiN薄膜的等离子体特性。衬底接地,同时通过对ECWR线圈施加0到120 V的正直流偏置来调谐等离子体电位。提高直流偏置增加了等离子体电位,从而使离子加速到与该电位相对应的能量,从而对接地衬底产生高能离子轰击。增加ECWR等离子体和直流偏置的主要好处是增加了反应等离子体的电离程度。因此,即使在较低的衬底温度下,所产生的更致密的等离子体和增强的N2解离也改善了沉积膜的内部结构。
{"title":"Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering","authors":"Libor Nožka,&nbsp;Miroslav Hrabovský,&nbsp;Zdenek Hubička,&nbsp;Aneta Písaříková,&nbsp;Jan Krajczewski,&nbsp;Petr Schovánek,&nbsp;Jan Tomáštík,&nbsp;Lukas Václavek","doi":"10.1002/apxr.202500166","DOIUrl":"https://doi.org/10.1002/apxr.202500166","url":null,"abstract":"<p>This study investigates the plasmonic properties of TiN thin films deposited by pulsed mid-frequency reactive magnetron sputtering combined with RF inductively coupled plasma in a DC magnetic field and electron cyclotron wave resonance (ECWR). The substrate was grounded while the plasma potential was tuned by applying a positive DC bias from 0 to 120 V to the ECWR coil relative to ground. Raising the DC bias increased the plasma potential and thus accelerated ions to energies corresponding to that potential, producing energetic ion bombardment of the grounded substrate. The principal benefit of adding ECWR plasma and a DC bias is an increased degree of ionization in the reactive plasma. Consequently, the resulting denser plasma and enhanced N<sub>2</sub> dissociation improve the internal structure of the deposited films even at low substrate temperatures.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500166","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145969648","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
N-Type Behavior from a P-Type Dopant: Charge Compensation Mechanisms in Trivalent Y-Doped HfO2 p型掺杂剂的n型行为:三价y掺杂HfO2的电荷补偿机制
IF 2.8 Pub Date : 2025-12-07 DOI: 10.1002/apxr.202500120
Oliver Rehm, Lutz Baumgarten, Florian Wunderwald, Andreas Fuhrberg, Pia Maria Düring, Andrei Gloskovskii, Christoph Schlueter, Thomas Mikolajick, Uwe Schroeder, Martina Müller

The current market launch of HfO2 -based ferroelectric devices relies on the control of the inherent oxygen vacancies (OVs) and their impact on the ferroelectric performance. Due to the necessary stabilization of the ferroelectric phase by doping, several dopants are investigated for their applicability to control the vacancy concentration. Hf signatures in X-ray photoemission spectra are often used as an indication of OVs for both qualitative and quantitative analysis. The analysis of Y doped HfO2 (Y:HfO2) as investigated by hard x-ray photoelectron spectroscopy (HAXPES) reveals the inapplicability of the Hf signature for a quantitative determination of OVs in the case of heterovalent doping and is restricted to pure HfO2 or isoelectronic substitution of Hf by, for example, Zr.

目前市场上基于HfO2的铁电器件的推出依赖于固有氧空位(OVs)的控制及其对铁电性能的影响。由于掺杂对铁电相的稳定性是必要的,因此研究了几种掺杂剂对控制空位浓度的适用性。x射线光发射光谱中的Hf特征常被用作OVs的指示,用于定性和定量分析。硬x射线光电子能谱(HAXPES)对Y掺杂的HfO2 (Y:HfO2)进行了分析,发现在杂价掺杂的情况下,Hf特征不适用于OVs的定量测定,仅限于纯HfO2或Hf被Zr等电子取代。
{"title":"N-Type Behavior from a P-Type Dopant: Charge Compensation Mechanisms in Trivalent Y-Doped HfO2","authors":"Oliver Rehm,&nbsp;Lutz Baumgarten,&nbsp;Florian Wunderwald,&nbsp;Andreas Fuhrberg,&nbsp;Pia Maria Düring,&nbsp;Andrei Gloskovskii,&nbsp;Christoph Schlueter,&nbsp;Thomas Mikolajick,&nbsp;Uwe Schroeder,&nbsp;Martina Müller","doi":"10.1002/apxr.202500120","DOIUrl":"https://doi.org/10.1002/apxr.202500120","url":null,"abstract":"<p>The current market launch of HfO<sub>2</sub> -based ferroelectric devices relies on the control of the inherent oxygen vacancies (OVs) and their impact on the ferroelectric performance. Due to the necessary stabilization of the ferroelectric phase by doping, several dopants are investigated for their applicability to control the vacancy concentration. Hf <span></span><math></math> signatures in X-ray photoemission spectra are often used as an indication of OVs for both qualitative and quantitative analysis. The analysis of Y doped HfO<sub>2</sub> (Y:HfO<sub>2</sub>) as investigated by hard x-ray photoelectron spectroscopy (HAXPES) reveals the inapplicability of the Hf <span></span><math></math> signature for a quantitative determination of OVs in the case of heterovalent doping and is restricted to pure HfO<sub>2</sub> or isoelectronic substitution of Hf by, for example, Zr.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500120","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145969688","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Modeling Self-Rectifying Bipolar Resistive Switching Memory Through Machine Learning 基于机器学习的自整流双极电阻开关存储器建模
IF 2.8 Pub Date : 2025-12-01 DOI: 10.1002/apxr.202500116
Chen-Fang Kang, Shih-Min Huang, Yen-Hsuan Chen, Jian-Fu Tang, Po-Kang Yang

Resistive switching memory has emerged as a promising candidate for next-generation data storage and is regarded as a key enabler for the advancement of artificial intelligence technologies. However, conventional resistive memory architectures face critical challenges, including sneak-path current interference, poor scalability, and limited integration density, which hinder their practical deployment in high-density neuromorphic systems. In this study, a self-rectifying 3D 2 × 2 crossbar array based on a diode–memristor–diode (DMD) architecture using a Pt/SrMnO3/Pt configuration is demonstrated for the first time, exhibiting excellent electrical performance and outstanding operational stability. The device effectively suppresses sneak-path currents, thereby enabling the integration of high-density memory arrays. The reset process is quantitatively analyzed through machine learning applied to electrical transport characteristics, while the high-resistance state is accurately described using the Poisson–Boltzmann formalism. These results highlight the significant potential of the stacked Pt/SrMnO3/Pt structure for next-generation non-volatile memory and provide a solid foundation for its application in neuromorphic computing and artificial neural networks.

电阻开关存储器已成为下一代数据存储的有前途的候选者,并被视为人工智能技术进步的关键推动者。然而,传统的电阻式存储架构面临着严峻的挑战,包括潜行路径电流干扰、低可扩展性和有限的集成密度,这些都阻碍了它们在高密度神经形态系统中的实际部署。在这项研究中,首次展示了一种基于二极管-忆阻二极管(DMD)结构的自整流3D 2 × 2交叉棒阵列,该阵列采用Pt/SrMnO3/Pt结构,具有优异的电气性能和出色的工作稳定性。该器件有效地抑制了潜路电流,从而实现了高密度存储器阵列的集成。复位过程通过应用于电输运特性的机器学习进行定量分析,而高电阻状态则使用泊松-玻尔兹曼形式主义进行准确描述。这些结果突出了Pt/SrMnO3/Pt堆叠结构在下一代非易失性存储器中的巨大潜力,并为其在神经形态计算和人工神经网络中的应用提供了坚实的基础。
{"title":"Modeling Self-Rectifying Bipolar Resistive Switching Memory Through Machine Learning","authors":"Chen-Fang Kang,&nbsp;Shih-Min Huang,&nbsp;Yen-Hsuan Chen,&nbsp;Jian-Fu Tang,&nbsp;Po-Kang Yang","doi":"10.1002/apxr.202500116","DOIUrl":"https://doi.org/10.1002/apxr.202500116","url":null,"abstract":"<p>Resistive switching memory has emerged as a promising candidate for next-generation data storage and is regarded as a key enabler for the advancement of artificial intelligence technologies. However, conventional resistive memory architectures face critical challenges, including sneak-path current interference, poor scalability, and limited integration density, which hinder their practical deployment in high-density neuromorphic systems. In this study, a self-rectifying 3D 2 × 2 crossbar array based on a diode–memristor–diode (DMD) architecture using a Pt/SrMnO<sub>3</sub>/Pt configuration is demonstrated for the first time, exhibiting excellent electrical performance and outstanding operational stability. The device effectively suppresses sneak-path currents, thereby enabling the integration of high-density memory arrays. The reset process is quantitatively analyzed through machine learning applied to electrical transport characteristics, while the high-resistance state is accurately described using the Poisson–Boltzmann formalism. These results highlight the significant potential of the stacked Pt/SrMnO<sub>3</sub>/Pt structure for next-generation non-volatile memory and provide a solid foundation for its application in neuromorphic computing and artificial neural networks.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500116","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145969746","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimization of High-κ HfO2 Transistor Dielectrics by Atomic Layer Deposition as an Enabler of Novel Thin-Film Circuits and Sensors 利用原子层沉积技术优化高κ HfO2晶体管介质,实现新型薄膜电路和传感器
IF 2.8 Pub Date : 2025-12-01 DOI: 10.1002/apxr.202500191
Matin Forouzmehr, Hamed Pourkheirollah, Fabio Leite, Elin Howard, Sunil Kumar Behera, Amit Tewari, Jarmo Laakso, Kimmo Lahtonen, Cesar A. T. Laia, A. Jorge Parola, Phillipe Marrec, Donald Lupo, Paul. R. Berger

This study explores the integration of atomic layer deposited (ALD) HfO2 dielectric films with solution-processed In2O3 semiconductor channel, thin-film transistors (TFTs) for a silicon chip-free temperature sensor label. The inclusion of the HfO2 high-κ dielectric permits reduced voltage operation of the sensor label. HfO2 films are deposited by atomic layer deposition (ALD) at three different hot source temperatures (80°C, 90°C, 100°C), with XPS revealing improved stoichiometry and O/Hf ratios of 1.75, 1.92, and 1.95, respectively, as temperature increases. MOSCAP measurements show improved oxide/semiconductor interface with higher deposition temperatures. The extracted dielectric constants (εr ≈ 18.5–18.8) correspond to an equivalent oxide thickness (EOT) of about 3.1 nm, consistent with optimized high-κ film formation. To enhance drain current, a reduced 7.5 nm HfO2 film thickness is used, achieving higher current but reducing yield by 30% due to increased leakage probability in ultrathin films. A voltage divider circuit is developed to integrate an electrochemical thermal sensor, TFT, and an irreversible visual indicator (IVI), allowing for temperature monitoring with a resistivity change of three orders of magnitude at 8°C. The circuit is powered by a 60 mF supercapacitor array providing approximately 0.21 J of available energy, resulting in IVI activation within 40 min at measured activation currents of 20 µA. The system demonstrates potential for low-voltage, energy-efficient, silicon-free sensor labels in applications such as food safety and healthcare monitoring.

本研究探索了原子层沉积(ALD) HfO2介电薄膜与溶液处理的In2O3半导体通道,薄膜晶体管(TFTs)的集成,用于无硅芯片温度传感器标签。HfO2高κ介电介质的包含允许降低传感器标签的电压操作。采用原子层沉积法(ALD)在三种不同的热源温度下(80℃、90℃、100℃)沉积HfO2薄膜,XPS显示,随着温度的升高,HfO2薄膜的化学计量学和O/Hf比值分别为1.75、1.92和1.95。MOSCAP测量显示,随着沉积温度的升高,氧化物/半导体界面得到改善。得到的介电常数(εr≈18.5 ~ 18.8)对应的等效氧化物厚度(EOT)约为3.1 nm,与优化后的高κ膜形成一致。为了提高漏极电流,使用了减少7.5 nm的HfO2薄膜厚度,虽然获得了更高的电流,但由于超薄薄膜的泄漏概率增加,产量降低了30%。开发了分压器电路,集成了电化学热传感器,TFT和不可逆视觉指示器(IVI),允许在8°C时以三个数量级的电阻率变化进行温度监测。该电路由一个60 mF的超级电容器阵列供电,提供约0.21 J的可用能量,在测量的20 μ a激活电流下,在40分钟内实现IVI激活。该系统展示了在食品安全和医疗监控等应用中低压、节能、无硅传感器标签的潜力。
{"title":"Optimization of High-κ HfO2 Transistor Dielectrics by Atomic Layer Deposition as an Enabler of Novel Thin-Film Circuits and Sensors","authors":"Matin Forouzmehr,&nbsp;Hamed Pourkheirollah,&nbsp;Fabio Leite,&nbsp;Elin Howard,&nbsp;Sunil Kumar Behera,&nbsp;Amit Tewari,&nbsp;Jarmo Laakso,&nbsp;Kimmo Lahtonen,&nbsp;Cesar A. T. Laia,&nbsp;A. Jorge Parola,&nbsp;Phillipe Marrec,&nbsp;Donald Lupo,&nbsp;Paul. R. Berger","doi":"10.1002/apxr.202500191","DOIUrl":"https://doi.org/10.1002/apxr.202500191","url":null,"abstract":"<p>This study explores the integration of atomic layer deposited (ALD) HfO<sub>2</sub> dielectric films with solution-processed In<sub>2</sub>O<sub>3</sub> semiconductor channel, thin-film transistors (TFTs) for a silicon chip-free temperature sensor label. The inclusion of the HfO<sub>2</sub> high-κ dielectric permits reduced voltage operation of the sensor label. HfO<sub>2</sub> films are deposited by atomic layer deposition (ALD) at three different hot source temperatures (80°C, 90°C, 100°C), with XPS revealing improved stoichiometry and O/Hf ratios of 1.75, 1.92, and 1.95, respectively, as temperature increases. MOSCAP measurements show improved oxide/semiconductor interface with higher deposition temperatures. The extracted dielectric constants (<i>ε</i><sub>r</sub> ≈ 18.5–18.8) correspond to an equivalent oxide thickness (EOT) of about 3.1 nm, consistent with optimized high-κ film formation. To enhance drain current, a reduced 7.5 nm HfO<sub>2</sub> film thickness is used, achieving higher current but reducing yield by 30% due to increased leakage probability in ultrathin films. A voltage divider circuit is developed to integrate an electrochemical thermal sensor, TFT, and an irreversible visual indicator (IVI), allowing for temperature monitoring with a resistivity change of three orders of magnitude at 8°C. The circuit is powered by a 60 mF supercapacitor array providing approximately 0.21 J of available energy, resulting in IVI activation within 40 min at measured activation currents of 20 µA. The system demonstrates potential for low-voltage, energy-efficient, silicon-free sensor labels in applications such as food safety and healthcare monitoring.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500191","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145983539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrically Induced Liquid Metal Resonance Phenomena 电致液态金属共振现象
IF 2.8 Pub Date : 2025-11-30 DOI: 10.1002/apxr.202500160
Jingyi Li, Ju Wang, Xi Zhao, Jing Liu

Liquid metals possess excellent electrical conductivity, fluidity, and high density, exhibiting unique electroresponsive characteristics under applied electric fields. This article systematically investigates the instantaneous response, frequency synchronization, and resonance phenomena of gallium-based liquid metal droplets under square-wave alternating electric fields. We comprehensively clarify the effects of droplet volume, alloy composition, electric field intensity, and mechanical confinement on electrically induced resonance behavior. In free spaces, we reveal a critical transition in governing laws characterized by the modified Bond number (Bom) as the dimensionless parameter. We observe coordinated linear responses of transverse and longitudinal amplitudes to applied electric field amplitude for liquid metal droplets with Bom < 1, while droplets with Bom > 1 exhibit nonlinear responses featuring asymmetric deformation and multi-modal transitions. Within confined channels, droplets display multi-mode standing wave patterns, with the number of surface wave crests correlating with droplet volume. Multi-droplet systems display collective dynamics modulated by array size and the spatial positioning of droplets within the collective. These findings establish theoretical foundations for controlling and amplifying the electrically induced behavior of positionally stable liquid metal droplets, and open new pathways for developing liquid metal resonance-based multi-excitation point mixers, flexible actuators, and reconfigurable electronic systems.

液态金属具有优良的导电性、流动性和高密度,在外加电场作用下表现出独特的电响应特性。本文系统地研究了镓基液态金属液滴在方波交变电场作用下的瞬时响应、频率同步和共振现象。我们全面阐明了液滴体积、合金成分、电场强度和机械约束对电致共振行为的影响。在自由空间中,我们揭示了以修改的键数(Bom)作为无量纲参数为特征的控制律的关键转变。我们观察到具有Bom <; 1的液态金属液滴的横向和纵向振幅对外加电场振幅的协调线性响应,而具有Bom <; 1的液滴则表现出非对称变形和多模态转变的非线性响应。在狭窄的通道内,液滴表现出多模驻波模式,表面波峰的数量与液滴体积相关。多液滴系统显示由阵列大小和液滴在集体内的空间定位调制的集体动力学。这些发现为控制和放大位置稳定液态金属液滴的电诱导行为奠定了理论基础,并为开发基于液态金属共振的多励磁点混合器、柔性执行器和可重构电子系统开辟了新的途径。
{"title":"Electrically Induced Liquid Metal Resonance Phenomena","authors":"Jingyi Li,&nbsp;Ju Wang,&nbsp;Xi Zhao,&nbsp;Jing Liu","doi":"10.1002/apxr.202500160","DOIUrl":"https://doi.org/10.1002/apxr.202500160","url":null,"abstract":"<p>Liquid metals possess excellent electrical conductivity, fluidity, and high density, exhibiting unique electroresponsive characteristics under applied electric fields. This article systematically investigates the instantaneous response, frequency synchronization, and resonance phenomena of gallium-based liquid metal droplets under square-wave alternating electric fields. We comprehensively clarify the effects of droplet volume, alloy composition, electric field intensity, and mechanical confinement on electrically induced resonance behavior. In free spaces, we reveal a critical transition in governing laws characterized by the modified Bond number (Bo<sub>m</sub>) as the dimensionless parameter. We observe coordinated linear responses of transverse and longitudinal amplitudes to applied electric field amplitude for liquid metal droplets with Bo<sub>m</sub> &lt; 1, while droplets with Bo<sub>m</sub> &gt; 1 exhibit nonlinear responses featuring asymmetric deformation and multi-modal transitions. Within confined channels, droplets display multi-mode standing wave patterns, with the number of surface wave crests correlating with droplet volume. Multi-droplet systems display collective dynamics modulated by array size and the spatial positioning of droplets within the collective. These findings establish theoretical foundations for controlling and amplifying the electrically induced behavior of positionally stable liquid metal droplets, and open new pathways for developing liquid metal resonance-based multi-excitation point mixers, flexible actuators, and reconfigurable electronic systems.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500160","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145984039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
DFT-Based Insights Into Elastic, Thermophysical, Electronic, and Optical Properties of Topological Insulators XTe5 (X = Zr, Hf) 基于dft的拓扑绝缘体XTe5 (X = Zr, Hf)的弹性、热物理、电子和光学性质研究
IF 2.8 Pub Date : 2025-11-30 DOI: 10.1002/apxr.202500132
Syed Shovon Mahbub Mahin, Suptajoy Barua, B. Rahman Rano, Ishtiaque M. Syed, S. H. Naqib

Transition metal penta-tellurides, ZrTe5 and HfTe5 have recently drawn a lot of attention due to their fascinating physical properties and for being prominent materials showing topological phase transitions. In this work, we present first in-depth investigation of elasto-mechanical, thermophysical, and optical properties of these compounds. In particular, we analyzed the directional dependence of the elastic properties, explored the optical response for different photon polarization directions and examined previously unreported potential industrial applications of these materials. We also studied their electronic and topological properties. We used Density Functional Theory (DFT) based calculations to study all of these properties. This study suggests that the materials are mechanically stable, possess high mechanical and bondinganisotropy, are soft and brittle in nature. Investigation of thermophysical properties indicates weak bonding strength in these compounds and suggests their possible application in acoustic and thermoelectric devices. Examination of their optical characteristics reveals that they have high refractive indices at low energy. They are very good ultraviolate absorbers and potential candidates for solar coating devices. Our study also reveals that these materials show characteristics of weak ℤ2 topological insulators. Spin-orbit interaction is responsible for enhancing energy gaps and promoting insulating characteristics in these compounds.

过渡金属五碲化物,ZrTe5和HfTe5由于其迷人的物理性质和表现出拓扑相变的突出材料近年来引起了人们的广泛关注。在这项工作中,我们首次深入研究了这些化合物的弹性力学、热物理和光学性质。特别地,我们分析了弹性特性的方向依赖性,探索了不同光子偏振方向下的光学响应,并研究了这些材料以前未报道的潜在工业应用。我们还研究了它们的电子和拓扑性质。我们使用基于密度泛函理论(DFT)的计算来研究所有这些性质。研究表明,该材料力学稳定,具有较高的力学和粘结各向异性,具有软脆性质。热物理性质的研究表明,这些化合物的结合强度较弱,并提出了它们在声学和热电器件中的可能应用。对其光学特性的研究表明,它们在低能量下具有高折射率。它们是非常好的紫外线吸收剂,是太阳能涂层器件的潜在候选材料。我们的研究还揭示了这些材料具有弱的拓扑绝缘体的特征。自旋轨道相互作用增强了这些化合物的能隙并促进了它们的绝缘特性。
{"title":"DFT-Based Insights Into Elastic, Thermophysical, Electronic, and Optical Properties of Topological Insulators XTe5 (X = Zr, Hf)","authors":"Syed Shovon Mahbub Mahin,&nbsp;Suptajoy Barua,&nbsp;B. Rahman Rano,&nbsp;Ishtiaque M. Syed,&nbsp;S. H. Naqib","doi":"10.1002/apxr.202500132","DOIUrl":"https://doi.org/10.1002/apxr.202500132","url":null,"abstract":"<p>Transition metal penta-tellurides, ZrTe<sub>5</sub> and HfTe<sub>5</sub> have recently drawn a lot of attention due to their fascinating physical properties and for being prominent materials showing topological phase transitions. In this work, we present first in-depth investigation of elasto-mechanical, thermophysical, and optical properties of these compounds. In particular, we analyzed the directional dependence of the elastic properties, explored the optical response for different photon polarization directions and examined previously unreported potential industrial applications of these materials. We also studied their electronic and topological properties. We used Density Functional Theory (DFT) based calculations to study all of these properties. This study suggests that the materials are mechanically stable, possess high mechanical and bondinganisotropy, are soft and brittle in nature. Investigation of thermophysical properties indicates weak bonding strength in these compounds and suggests their possible application in acoustic and thermoelectric devices. Examination of their optical characteristics reveals that they have high refractive indices at low energy. They are very good ultraviolate absorbers and potential candidates for solar coating devices. Our study also reveals that these materials show characteristics of weak ℤ<sub>2</sub> topological insulators. Spin-orbit interaction is responsible for enhancing energy gaps and promoting insulating characteristics in these compounds.</p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"5 1","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202500132","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145970167","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Advanced Physics Research
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1