Advanced atmospheric pressure CVD of a-Si:H using pure and cyclooctane-diluted trisilane as precursors†

IF 5 3区 材料科学 Q2 CHEMISTRY, PHYSICAL Sustainable Energy & Fuels Pub Date : 2024-10-21 DOI:10.1039/D4SE01308E
Benedikt Fischer, Maurice Nuys, Oleksandr Astakhov, Stefan Haas, Michael Schaaf, Astrid Besmehn, Peter Jakes, Rüdiger-A. Eichel and Uwe Rau
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Abstract

Liquid silanes can be used for low-cost, fast deposition of hydrogenated amorphous silicon (a-Si:H) as an alternative to state-of-the-art deposition processes such as plasma enhanced chemical vapor deposition or electron beam evaporation. However, liquid silane deposition techniques are still in their infancy. In this paper, we present a new version of the atmospheric pressure chemical vapor deposition technique designed to improve the reproducibility of a-Si:H deposition. With this new tool, we explore ways to improve the quality of the material. The films can be prepared using pure trisilane as a precursor; frequently, however, trisilane is diluted with cyclooctane for better handling and process control. Currently, the influence of this dilution on the film quality is not well understood. In our work, we investigate and compare both precursor strategies. This paper presents a comprehensive analysis of the effects of cyclooctane dilution, deposition temperature, process duration, and precursor amount on the structure stoichiometry and electronic properties of the resulting films. The analysis was performed using a range of techniques, including Fourier transform infrared spectroscopy, electronic spin resonance spectroscopy, Raman spectroscopy, ellipsometry, secondary ion mass spectrometry, and conductivity measurements. For films deposited with pure silane, we found a low oxygen (O) and carbon (C) impurity incorporation and an adjustable H content up to 10%, resulting in a photosensitivity of up to 104. Dependent on the dilution and deposition temperature, the films deposited with cyclooctane dilution showed various amounts of C incorporation, culminating in an a-Si:H/a-SiC:H structure for high temperatures and dilutions. High purity a-Si:H films as a-Si:C:H films are promising for application in solar cells and transistors either as an amorphous functional layer or as a precursor for recrystallization processes, e.g., in TOPCon solar cell technology.

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以纯三硅烷和环辛烷稀释三硅烷为前驱体的先进常压气相沉积 a-Si:H 技术†。
液态硅烷可用于低成本、快速沉积氢化非晶硅(a-Si:H),以替代等离子体增强化学气相沉积或电子束蒸发等最先进的沉积工艺。然而,液态硅烷沉积技术仍处于起步阶段。在本文中,我们介绍了一种新的常压化学气相沉积技术,旨在提高非晶硅:H 沉积的可重复性。利用这一新工具,我们探索了提高材料质量的方法。薄膜可使用纯三硅烷作为前驱体制备;但为了更好地处理和控制过程,通常会用环辛烷稀释三硅烷。目前,这种稀释对薄膜质量的影响还不十分清楚。在我们的工作中,我们研究并比较了这两种前驱体策略。本文全面分析了环辛烷稀释、沉积温度、工艺持续时间和前驱体用量对薄膜结构化学计量和电子特性的影响。分析采用了一系列技术,包括傅立叶变换红外光谱法、电子自旋共振光谱法、拉曼光谱法、椭偏仪、二次离子质谱法和电导率测量法。对于使用纯硅烷沉积的薄膜,我们发现氧(O)和碳(C)杂质掺入量较低,H 含量可调至 10%,因此光敏性高达 104。根据稀释度和沉积温度的不同,用环辛烷稀释沉积的薄膜显示出不同数量的碳掺杂,最终在高温和稀释度下形成了 a-Si:H/a-SiC:H 结构。作为 a-Si:C:H 薄膜的高纯度 a-Si:H 薄膜有望应用于太阳能电池和晶体管,无论是作为非晶功能层还是作为再结晶过程的前驱体,例如 TOPCon 太阳能电池技术。
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来源期刊
Sustainable Energy & Fuels
Sustainable Energy & Fuels Energy-Energy Engineering and Power Technology
CiteScore
10.00
自引率
3.60%
发文量
394
期刊介绍: Sustainable Energy & Fuels will publish research that contributes to the development of sustainable energy technologies with a particular emphasis on new and next-generation technologies.
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