Structural, optical, surface topographical and electrical properties of transparent vanadium doped ZnO absorbing layer for photovoltaic application

IF 3.3 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Optical and Quantum Electronics Pub Date : 2024-11-23 DOI:10.1007/s11082-024-07185-x
Apoorva Katoch, Navneet Kaur, Iqbal Singh, Aman Mahajan, Balraj Singh, Vandana Shinde, Raminder Kaur
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Abstract

In the present investigation, vanadium-doped zinc oxide (V: ZnO) thin films were synthesized by the sol-gel dip-coating technique by varying the percentage of V. Raman spectroscopy was used for structural conformation, showing the making of an impurity phase on increasing the V doping whereas, SEM analysis revealed that increasing the vanadium (V) concentration surface gets smoothen. The V incorporation into the ZnO crystal lattice was confirmed by the EDS analysis. The 3-D surface topography and stereometric analysis show the 3-D surface texture parameters that affect the optical and electrical features of the material. The results from experimental measurements suggest that V: ZnO thin films prepared at 3% V had the most suitable surface in terms of roughness, texture, and waviness. UV analysis showed a decrease in Eg value with an increase in the doping percentage, the optical parameters such as absorption and transmission (%) were also analyzed. The electrical properties were studied using I-V measurements from which resistivity for doped ZnO films was found to significantly decrease and increase its current densities. In photovoltaic characteristic evaluation, the efficiency (η) was attributed to variation in the value of Jsc. The C-3 coated PV cells had superior JSC at 36.70 mA/cm2, resulting an increased overall efficiency without changing the open-circuit voltage or fill factor. Thus, 3% doping concentration has a favourable influence on PV cell performance, indicating a possible path for improving energy conversion efficiencyby ~ 11.76% with better stability. This material can be proven as a good coating-absorbing layer for PV cells.

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用于光伏应用的透明掺钒氧化锌吸收层的结构、光学、表面形貌和电学特性
本研究采用溶胶-凝胶浸涂技术合成了掺钒氧化锌(V:ZnO)薄膜,并改变了掺钒的比例。拉曼光谱用于结构构象分析,显示掺钒量增加时会产生杂质相,而扫描电镜分析则显示钒(V)浓度增加时表面会变得更平滑。EDS 分析证实了氧化锌晶格中掺入了钒。三维表面形貌和立体计量分析显示了影响材料光学和电学特性的三维表面纹理参数。实验测量结果表明,以 3% V 制备的氧化锌薄膜在粗糙度、纹理和波浪度方面具有最合适的表面。紫外线分析表明 Eg 值随着掺杂百分比的增加而降低,同时还分析了吸收和透射率(%)等光学参数。通过 I-V 测量研究了电学特性,发现掺杂氧化锌薄膜的电阻率显著降低,电流密度显著增加。在光伏特性评估中,效率(η)与 Jsc 值的变化有关。C-3 涂层光伏电池的 JSC 值为 36.70 mA/cm2,具有更高的性能,从而在不改变开路电压或填充因子的情况下提高了总效率。因此,3% 的掺杂浓度对光伏电池的性能产生了有利影响,为以更高的稳定性将能量转换效率提高约 11.76% 指明了可能的途径。这种材料可作为光伏电池的良好涂层吸收层。
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来源期刊
Optical and Quantum Electronics
Optical and Quantum Electronics 工程技术-工程:电子与电气
CiteScore
4.60
自引率
20.00%
发文量
810
审稿时长
3.8 months
期刊介绍: Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest. Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.
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