Tilted-wave optical modes in thin passive waveguide: Theoretical simulation and experimental realization

IF 4.6 2区 物理与天体物理 Q1 OPTICS Optics and Laser Technology Pub Date : 2024-11-14 DOI:10.1016/j.optlastec.2024.112121
Zhongyao Yan , Fengyang Ma , Kaixin Liu , Debao Zhang , Xun Zhang , Yan Wang , Songyou Wang , Jian Sun , Dongchen Wang , Ming Lu
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Abstract

The conventional tilted-wave light source (TWL) features high intensity and thick passive waveguide with thickness of hundreds of micrometers or more. However, this large thickness of waveguide prevents its application in the current Si photonic integrated circuits or chips (PICs) due to the requirement of planar technique. Hence, TWL with thin passive waveguide is demanded for Si PICs. In this work, firstly, Si nanocrystal-based TW light emission in thin passive waveguide is simulated in search of allowed TW optical modes. Then, a TWL device identical to the simulated one is fabricated and its photoluminescence (PL) emission is measured. The emitting light covers the range from 650 to 850 nm in wavelength. PL peaks with narrow line widths are observed and are consistent with the simulated TW modes in peak position, mode spacing and emission angle dependence of the allowed modes. Meanwhile, light amplification of the TW modes is observed. Since Si nanocrystals are a lasing material with a wide gain spectrum covering the whole PL range, typical criteria of lasing of the TWL are tested. The results suggest that Si nanocrystal-based TW lasing in thin passive waveguide can be available.
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薄无源波导中的倾斜波光学模式:理论模拟和实验实现
传统的倾斜波光源(TWL)具有强度高、厚度达数百微米或更厚的无源波导。然而,由于平面技术的要求,这种大厚度波导无法应用于当前的硅光子集成电路或芯片(PIC)。因此,硅光子集成电路需要薄无源波导 TWL。在这项工作中,首先模拟了基于硅纳米晶体的薄无源波导 TW 光发射,以寻找允许的 TW 光学模式。然后,制作了与模拟相同的 TWL 器件,并测量了其光致发光(PL)发射。发射光的波长范围为 650 至 850 nm。观察到的光致发光峰具有较窄的线宽,在峰值位置、模式间距和允许模式的发射角依赖性方面与模拟的 TW 模式一致。同时,还观察到 TW 模式的光放大现象。由于硅纳米晶体是一种具有覆盖整个 PL 范围的宽增益谱的激光材料,因此对 TWL 的典型激光标准进行了测试。结果表明,可以在薄无源波导中实现基于硅纳米晶的 TW 激光。
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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