Nanoscale mapping of local intrinsic strain-induced anomalous bandgap variations in WSe2 using selective-wavelength scanning photoconductivity microscopy

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Today Nano Pub Date : 2024-11-17 DOI:10.1016/j.mtnano.2024.100545
Yuhyeon Oh, Mingyu Jung, Shashank Shekhar, Seunghyo Park, Seunghun Hong
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Abstract

Nanoscale defects can locally tailor the optoelectronic properties of two-dimensional materials such as bandgap. However, it is still challenging to directly map and analyze the defect-induced bandgap variations in a quantitative manner. Here, we report the nanoscale mapping of local intrinsic strain-induced anomalous bandgap variations in as-grown WSe2 by using a selective-wavelength scanning photoconductivity microscopy. In this method, a conducting nanoprobe is utilized to map the spatial distributions of strain, sheet-conductance, and charge trap density (Neff) of epitaxially-grown WSe2 on sapphire while illuminating monochromatic light of selective wavelengths. Under un-illuminated conditions, the maps showed WSe2 domain structures with boundaries having slightly lower sheet-conductance and higher Neff than those in domains, presumably due to low misorientation angles between adjacent epitaxially-grown domains. By measuring wavelength-dependent photoconductance maps and fitting each pixel value of the maps, we could successfully obtain the map of local bandgap. The map clearly showed bandgap variations inside domains as well as rather low bandgaps at boundaries. By comparing with local strain map, we found that tensile strain effectively reduced bandgap following two different power-law relationships. Such anomalous bandgap variations in WSe2 could be explained by strain-induced weakening of d-orbital couplings. Furthermore, in a monolayer-bilayer WSe2 interface, bilayer WSe2 exhibited lower bandgap than the underlying monolayer WSe2, while interfacial boundaries exhibited the strain-induced bandgap values in between those of monolayer and bilayer WSe2. Since our method allows us to directly map the intrinsic strain-induced bandgap variations with a nanoscale resolution down to tens-of-nm, it can be a powerful tool for basic research and practical applications of optoelectronic devices based on two-dimensional materials.

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利用选择性波长扫描光电导显微镜绘制 WSe2 中局部本征应变诱导反常带隙变化的纳米级图谱
纳米级缺陷可以局部调整二维材料的光电特性,如带隙。然而,直接绘制和定量分析缺陷诱导的带隙变化仍然具有挑战性。在此,我们报告了利用选择性波长扫描光电导显微镜绘制的局部本征应变诱导的 WSe2 生长异常带隙变化的纳米尺度图。在这种方法中,利用导电纳米探针绘制蓝宝石上外延生长的 WSe2 的应变、片状电导和电荷阱密度(Neff)的空间分布图,同时照射选择性波长的单色光。在非照明条件下,地图显示了 WSe2 域结构,其边界的片状电导率和 Neff 均略低于域内的电导率和 Neff,这可能是由于相邻外延生长域之间的错位角较小。通过测量随波长变化的光导图并拟合图中的每个像素值,我们成功地获得了局部带隙图。该图清楚地显示了畴内部的带隙变化以及边界处相当低的带隙。通过与局部应变图进行比较,我们发现拉伸应变按照两种不同的幂律关系有效地降低了带隙。WSe2 中的这种反常带隙变化可以用应变引起的 d 轨道耦合减弱来解释。此外,在单层-双层 WSe2 界面中,双层 WSe2 的带隙低于底层单层 WSe2,而界面边界的应变诱导带隙值介于单层和双层 WSe2 之间。由于我们的方法可以直接绘制出内在应变诱导的带隙变化图,其纳米级分辨率可达数十纳米,因此它可以成为基于二维材料的光电器件的基础研究和实际应用的有力工具。
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来源期刊
CiteScore
11.30
自引率
3.90%
发文量
130
审稿时长
31 days
期刊介绍: Materials Today Nano is a multidisciplinary journal dedicated to nanoscience and nanotechnology. The journal aims to showcase the latest advances in nanoscience and provide a platform for discussing new concepts and applications. With rigorous peer review, rapid decisions, and high visibility, Materials Today Nano offers authors the opportunity to publish comprehensive articles, short communications, and reviews on a wide range of topics in nanoscience. The editors welcome comprehensive articles, short communications and reviews on topics including but not limited to: Nanoscale synthesis and assembly Nanoscale characterization Nanoscale fabrication Nanoelectronics and molecular electronics Nanomedicine Nanomechanics Nanosensors Nanophotonics Nanocomposites
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