Guoying Li , Zhanqiang Liu , Bing Wang , Zhao Qian , Zongde Kou
{"title":"Magnetic property of tellurium-infiltrated Inconel 718: First-principles calculations and experimental validation","authors":"Guoying Li , Zhanqiang Liu , Bing Wang , Zhao Qian , Zongde Kou","doi":"10.1016/j.matlet.2024.137762","DOIUrl":null,"url":null,"abstract":"<div><div>The fission product element tellurium in fourth-generation molten salt reactors is the primary cause of cracking in nickel-based high-temperature alloy components. This paper reports the emergence and origin of magnetism in the tellurium-infiltrated Inconel 718. The source of magnetism is identified through first-principles calculations. The accuracy of the theoretical calculations is confirmed by comparative magnetic attraction experiments. It indicates that the primary source of magnetism after tellurium infiltration is the generation of Cr<sub>3</sub>Te<sub>4</sub> but not NiNbTe<sub>2</sub>. The magnetism generated by Cr<sub>3</sub>Te<sub>4</sub> provides an additional driving force for their clustering distribution. This study facilitates the understanding of the mechanisms behind crack formation in nickel-based alloy components and potential solutions.</div></div>","PeriodicalId":384,"journal":{"name":"Materials Letters","volume":"381 ","pages":"Article 137762"},"PeriodicalIF":2.7000,"publicationDate":"2024-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Letters","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0167577X24019025","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The fission product element tellurium in fourth-generation molten salt reactors is the primary cause of cracking in nickel-based high-temperature alloy components. This paper reports the emergence and origin of magnetism in the tellurium-infiltrated Inconel 718. The source of magnetism is identified through first-principles calculations. The accuracy of the theoretical calculations is confirmed by comparative magnetic attraction experiments. It indicates that the primary source of magnetism after tellurium infiltration is the generation of Cr3Te4 but not NiNbTe2. The magnetism generated by Cr3Te4 provides an additional driving force for their clustering distribution. This study facilitates the understanding of the mechanisms behind crack formation in nickel-based alloy components and potential solutions.
期刊介绍：
Materials Letters has an open access mirror journal Materials Letters: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review.
Materials Letters is dedicated to publishing novel, cutting edge reports of broad interest to the materials community. The journal provides a forum for materials scientists and engineers, physicists, and chemists to rapidly communicate on the most important topics in the field of materials.
Contributions include, but are not limited to, a variety of topics such as:
• Materials - Metals and alloys, amorphous solids, ceramics, composites, polymers, semiconductors
• Applications - Structural, opto-electronic, magnetic, medical, MEMS, sensors, smart
• Characterization - Analytical, microscopy, scanning probes, nanoscopic, optical, electrical, magnetic, acoustic, spectroscopic, diffraction
• Novel Materials - Micro and nanostructures (nanowires, nanotubes, nanoparticles), nanocomposites, thin films, superlattices, quantum dots.
• Processing - Crystal growth, thin film processing, sol-gel processing, mechanical processing, assembly, nanocrystalline processing.
• Properties - Mechanical, magnetic, optical, electrical, ferroelectric, thermal, interfacial, transport, thermodynamic
• Synthesis - Quenching, solid state, solidification, solution synthesis, vapor deposition, high pressure, explosive
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
