pH-responsive corrosion protection coating with chitosan encapsulated halloysite nanotubes for active protection of copper

IF 4.3 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2024-11-22 DOI:10.1016/j.matchemphys.2024.130182

Hao Shi , Zhihao Wang , Guiwen Chu , Zhengli Li , Haoran Zhang , Liying Song , Yixiang Wang , Lei Sun , ZiChen Cao , Fubin Ma

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Abstract

Alkaline-etched halloysite nanotubes (HNTs) loaded the corrosion inhibitor 5-ethyl-1,3,4-thiadiazol-2-amine (ETDA), and encapsulated with chitosan (CS), was prepared as a novel nanofiller. Nanofillers were incorporated into the coating to prepare an anticorrosion coating with good dispersion and pH responsiveness. The mass of HNTs loaded ETDA and encapsulated CS were approximately 11 wt% and 41 wt%. CS-HNTs-ETDA nanoparticles exhibited good dispersion in Epoxide resin (EP). A better active protection was obtained after the scratched coating immersion in 3.5 wt% NaCl solution for 30 d. The active protection rate of coating with CS-HNTs-ETDA is better than that of coating with HNTs-ETDA at pH = 3, 7 and 9, and the best at pH = 3. ETDA was released from the uniformly dispersed CS-HNTs-ETDA in the coating and adsorbed on the copper surface at the scratch, formed a tight and thin film that isolated corrosive substances. This enables the coating to actively protect damaged areas and extending the equipment's lifespan.

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利用壳聚糖封装哈洛石纳米管的 pH 响应型防腐涂层为铜提供活性保护

制备了负载缓蚀剂 5-乙基-1,3,4-噻二唑-2-胺（ETDA）并包裹壳聚糖（CS）的碱蚀刻埃洛石纳米管（HNTs）作为新型纳米填料。在涂层中加入纳米填料，制备了一种具有良好分散性和 pH 响应性的防腐涂层。HNTs 负载 ETDA 和封装 CS 的质量分别约为 11 wt% 和 41 wt%。CS-HNTs-ETDA 纳米粒子在环氧树脂（EP）中表现出良好的分散性。在 pH = 3、7 和 9 条件下，CS-HNTs-ETDA 涂层的活性保护率优于 HNTs-ETDA 涂层，而在 pH = 3 条件下活性保护率最佳。ETDA 从涂层中均匀分散的 CS-HNTs-ETDA 中释放出来，吸附在划痕处的铜表面，形成一层紧密的薄膜，隔离了腐蚀性物质。这使得涂层能够主动保护受损区域，延长设备的使用寿命。

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来源期刊

Materials Chemistry and Physics 工程技术-材料科学：综合

CiteScore

8.70

自引率

4.30%

发文量

1515

审稿时长

69 days

期刊介绍： Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.