Formation of vanadium dioxide nanocrystal arrays via post-growth annealing for stable and energy-efficient switches

IF 2.9 3区 物理与天体物理 Q3 NANOSCIENCE & NANOTECHNOLOGY Physica E-low-dimensional Systems & Nanostructures Pub Date : 2024-11-26 DOI:10.1016/j.physe.2024.116165
K.E. Kapoguzov , S.V. Mutilin , N.I. Lysenko , V.N. Kichay , L.V. Yakovkina , B.V. Voloshin , V.A. Seleznev
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Abstract

The abrupt and reversible semiconductor-metal phase transition in vanadium dioxide nanocrystals has attracted considerable attention for potential applications in oxide electronics, including neuromorphic systems. This study presents a systematic investigation of post-growth annealing conditions for the formation of single VO2 M-phase nanocrystals arrays from VOx films synthesized by atomic layer deposition. The composition of the initial VOx films and the annealing parameters were found to significantly affect the morphology, phase composition and electrical properties of the obtained single nanocrystal arrays. Our results demonstrate that the formation of VO2 M-phase nanocrystal arrays occurs at annealing temperatures of 650 °C and above, irrespective of the initial film composition. More homogeneous in size nanocrystals are formed from initial VOx films with higher V+4 content. The structures with the initial V+4 content of 60 % annealed at 650 °C for 2 h demonstrates the resistive switching with an energy less than 150 fJ, and a total number of stable switching cycles more than 101⁰. Our results pave the way for the novel energy-efficient nanoelectronic and nanophotonic devices based on VO₂ nanoparticles.

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通过生长后退火形成稳定和节能开关的二氧化钒纳米晶阵列
二氧化钒纳米晶体中半导体-金属相变的突变和可逆引起了人们的广泛关注,其在氧化物电子学(包括神经形态系统)中的潜在应用。本研究系统地研究了原子层沉积法合成VOx薄膜形成单VO2 m相纳米晶阵列的生长后退火条件。发现初始VOx膜的组成和退火参数对所得单纳米晶阵列的形貌、相组成和电学性能有显著影响。我们的研究结果表明,无论初始膜成分如何,在650℃及以上的退火温度下都可以形成VO2 m相纳米晶阵列。具有较高V+4含量的初始VOx膜形成了尺寸更均匀的纳米晶体。初始V+4含量为60%的结构在650°C退火2小时,显示出能量小于150 fJ的电阻开关,并且稳定开关循环的总次数大于101⁰。我们的研究结果为基于VO₂纳米颗粒的新型节能纳米电子和纳米光子器件铺平了道路。
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来源期刊
CiteScore
7.30
自引率
6.10%
发文量
356
审稿时长
65 days
期刊介绍: Physica E: Low-dimensional systems and nanostructures contains papers and invited review articles on the fundamental and applied aspects of physics in low-dimensional electron systems, in semiconductor heterostructures, oxide interfaces, quantum wells and superlattices, quantum wires and dots, novel quantum states of matter such as topological insulators, and Weyl semimetals. Both theoretical and experimental contributions are invited. Topics suitable for publication in this journal include spin related phenomena, optical and transport properties, many-body effects, integer and fractional quantum Hall effects, quantum spin Hall effect, single electron effects and devices, Majorana fermions, and other novel phenomena. Keywords: • topological insulators/superconductors, majorana fermions, Wyel semimetals; • quantum and neuromorphic computing/quantum information physics and devices based on low dimensional systems; • layered superconductivity, low dimensional systems with superconducting proximity effect; • 2D materials such as transition metal dichalcogenides; • oxide heterostructures including ZnO, SrTiO3 etc; • carbon nanostructures (graphene, carbon nanotubes, diamond NV center, etc.) • quantum wells and superlattices; • quantum Hall effect, quantum spin Hall effect, quantum anomalous Hall effect; • optical- and phonons-related phenomena; • magnetic-semiconductor structures; • charge/spin-, magnon-, skyrmion-, Cooper pair- and majorana fermion- transport and tunneling; • ultra-fast nonlinear optical phenomena; • novel devices and applications (such as high performance sensor, solar cell, etc); • novel growth and fabrication techniques for nanostructures
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