Electrochemically enzyme-free detection of lactic acid in human sweat using magnesium organic framework@carbon nanofiber composite

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-11-30 DOI:10.1016/j.mssp.2024.109177
Km Shivangee Kushwaha , Baban Dey , Mohd Shariq Khan , Md Wasi Ahmad , Asad Syed , Hind A. AL-Shwaiman , Ling Shing Wong , Pulak Datta , Arup Choudhury
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Abstract

Lactic acid is a by-product of glycolysis prevalent in the body fluid and significant in a living cell, it is also an important biomolecule that exists in human sweat. Lactic acid is firmly interlinked with various diseases for the direct detection by the technique of current is challenging. Hence, it is important to develop an enzyme-free electrochemical sensor for it. A monometallic salt magnesium-(3-hydroxypyridine-2-carboxilic acid) metal-organic framework anchored at carbon nanofiber mat in the solvothermal process. As prepared Mg(HPCA)MOF@CNF has a good surface area within high porosity and also possesses hydrophilicity, facilitating interaction between the analyte molecule and the active metal site of the MOF network for the redox process, which facilitates fast electron transfer with low resistance, which results in excellent sensitivity. The catalytic activity of MOF was improved in a basic medium, i.e., in pH 8 buffer solution, with excellent electrochemical sensitivity towards lactic acid. The redox reaction was diffusion-controlled and irreversible between lactic acid and hybrid mat. Mg(HPCA)MOF@CNF/GCE depicted the linear range of 0.1–5 mM, and the result of the lower limit of detection is 2.5 μM. The hybrid mat has good interference properties of some species such as sodium hydroxide, potassium chloride, hypoxanthine, xanthine, uric acid, dopamine, and citric acid, bending ability, and good storage capability for up to 35 days. Mg(HPCA)MOF@CNF/GCE demonstrates a significant sensor for the detection of lactic acid in human sweat under natural environments with accuracy and reliability. This work can lead to manufacting innovation in the future.

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Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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