Exploring the edge effect of single crystal silicon in nanoindentation with two indenters: A molecular dynamics investigation

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-11-27 DOI:10.1016/j.vacuum.2024.113891
Rongqi Shen , Duo Li , Yuhai Li
{"title":"Exploring the edge effect of single crystal silicon in nanoindentation with two indenters: A molecular dynamics investigation","authors":"Rongqi Shen ,&nbsp;Duo Li ,&nbsp;Yuhai Li","doi":"10.1016/j.vacuum.2024.113891","DOIUrl":null,"url":null,"abstract":"<div><div>Silicon is an important semiconductor material, and its mechanical properties at the workpiece edges are crucial for its applications at the nanoscale. This article uses a molecular dynamics model with two indenters to study the effect of indenter distance on the edge effect of single-crystal silicon. The simulation results show that as the distance between the two indenters gradually increases from 5 Å, the surface edge of the single crystal silicon workpiece collapses, the side accumulates, and the internal phase transition region and stress region gradually change from a whole to two separate entities. The average value of force <em>Fx</em> first decreases and then increases with the increasing indenter distance. This study elucidates the influence of the distance between the dual indenters on the edge effect of single-crystal silicon nanoindentation, enriching our understanding of the edge effects that occur in the single-crystal Si application process.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"232 ","pages":"Article 113891"},"PeriodicalIF":3.8000,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X24009370","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Silicon is an important semiconductor material, and its mechanical properties at the workpiece edges are crucial for its applications at the nanoscale. This article uses a molecular dynamics model with two indenters to study the effect of indenter distance on the edge effect of single-crystal silicon. The simulation results show that as the distance between the two indenters gradually increases from 5 Å, the surface edge of the single crystal silicon workpiece collapses, the side accumulates, and the internal phase transition region and stress region gradually change from a whole to two separate entities. The average value of force Fx first decreases and then increases with the increasing indenter distance. This study elucidates the influence of the distance between the dual indenters on the edge effect of single-crystal silicon nanoindentation, enriching our understanding of the edge effects that occur in the single-crystal Si application process.
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单晶硅在双压头纳米压痕中的边缘效应:分子动力学研究
硅是一种重要的半导体材料,其工件边缘的机械性能对其在纳米尺度上的应用至关重要。本文采用带有两个压头的分子动力学模型,研究了压头距离对单晶硅边缘效应的影响。仿真结果表明,随着两个压头之间的距离从5 Å开始逐渐增大,单晶硅工件的表面边缘坍塌,边沿累积,内部相变区和应力区逐渐由一个整体变为两个独立的实体。随着压头距离的增加,力Fx的平均值先减小后增大。本研究阐明了双压痕间距对单晶硅纳米压痕边缘效应的影响,丰富了我们对单晶硅应用过程中出现的边缘效应的认识。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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