Overestimation of Operational Stability in Polymer-Based Organic Field-Effect Transistors Caused by Contact Resistance

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-12-01 DOI:10.1021/acsami.4c15666
Kenji Sakamoto, Takeshi Yasuda, Takeo Minari, Masafumi Yoshio, Junpei Kuwabara, Masayuki Takeuchi
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Abstract

The bias-stress effects of bottom-gate top-contact polymer-based organic field-effect transistors (OFETs) with different channel lengths (50–500 μm) were evaluated by repeating cycles of prolonged on-state gate-bias application and transfer characteristics measurements in the linear regime. The thicknesses of poly(didodecylquaterthiophene-alt-didodecylbithiazole) active layers were 26 and 37 nm. All OFETs exhibited nonlinear (nonideal) transfer characteristics with a maximum transconductance within the gate-source voltage sweep range. Both a shift in threshold voltage (Vthlin) and a reduction in field-effect charge carrier mobility (μlin) were apparently observed during the bias-stress application. When μlin and Vthlin were conventionally extracted from the transfer characteristics around the maximum transconductance, the Vthlin shift amount and μlin reduction depended on the channel length and were smaller in OFETs with short channels. After contact resistance (Rc) correction, the channel length dependence disappeared. Thus, the operational stability in OFETs with short channels: ≤50 (150) μm for the 26 (37) nm-thick active layers, was found to be overestimated without Rc correction. This erroneous evaluation would become more pronounced in short-channel, high-mobility OFETs, because the Rc becomes larger relative to the channel resistance with increasing μlin and decreasing channel length. These results suggest that one should pay attention to Rc in the fundamental research into the origin of operational instability and in evaluating the effects of active layers, gate dielectrics, and active layer/gate dielectric interfaces on operational stability.

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ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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