Overestimation of Operational Stability in Polymer-Based Organic Field-Effect Transistors Caused by Contact Resistance

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-12-01 DOI:10.1021/acsami.4c15666
Kenji Sakamoto, Takeshi Yasuda, Takeo Minari, Masafumi Yoshio, Junpei Kuwabara, Masayuki Takeuchi
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Abstract

The bias-stress effects of bottom-gate top-contact polymer-based organic field-effect transistors (OFETs) with different channel lengths (50–500 μm) were evaluated by repeating cycles of prolonged on-state gate-bias application and transfer characteristics measurements in the linear regime. The thicknesses of poly(didodecylquaterthiophene-alt-didodecylbithiazole) active layers were 26 and 37 nm. All OFETs exhibited nonlinear (nonideal) transfer characteristics with a maximum transconductance within the gate-source voltage sweep range. Both a shift in threshold voltage (Vthlin) and a reduction in field-effect charge carrier mobility (μlin) were apparently observed during the bias-stress application. When μlin and Vthlin were conventionally extracted from the transfer characteristics around the maximum transconductance, the Vthlin shift amount and μlin reduction depended on the channel length and were smaller in OFETs with short channels. After contact resistance (Rc) correction, the channel length dependence disappeared. Thus, the operational stability in OFETs with short channels: ≤50 (150) μm for the 26 (37) nm-thick active layers, was found to be overestimated without Rc correction. This erroneous evaluation would become more pronounced in short-channel, high-mobility OFETs, because the Rc becomes larger relative to the channel resistance with increasing μlin and decreasing channel length. These results suggest that one should pay attention to Rc in the fundamental research into the origin of operational instability and in evaluating the effects of active layers, gate dielectrics, and active layer/gate dielectric interfaces on operational stability.

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接触电阻对聚合物基有机场效应晶体管工作稳定性的过高估计
通过长时间的on-state栅极偏置应用和线性环境下的转移特性测量,研究了不同沟道长度(50-500 μm)的底栅顶接触聚合物有机场效应晶体管(ofet)的偏置应力效应。聚二十二烷基季噻吩-二十二烷基二噻唑活性层厚度分别为26 nm和37 nm。所有的ofet都表现出非线性(非理想)转移特性,在栅极-源电压扫描范围内具有最大的跨导。在偏置应力作用下,阈值电压(Vthlin)发生了明显的位移,场效应载流子迁移率(μlin)也明显降低。当从最大跨导附近的转移特性中提取μlin和Vthlin时,Vthlin的位移量和μlin的减少量与沟道长度有关,并且在短沟道的ofet中较小。经过接触电阻(Rc)校正后,通道长度依赖性消失。因此,在26 (37)nm厚有源层≤50 (150)μm的短通道ofet中,如果没有Rc校正,则发现其工作稳定性被高估了。这种错误的评价在短沟道、高迁移率的ofet中更加明显,因为Rc相对于沟道电阻随着μlin的增加和沟道长度的减小而变大。这些结果表明,在对运行不稳定性起源的基础研究以及评价有源层、栅极介质和有源层/栅极介质界面对运行稳定性的影响时,应该重视Rc。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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