Band Gap Engineering of Binary and Cobalt-Doped PbS Thin Films Integrated by SILAR Method for Optoelectronic Potentials.

IF 2 3区工程技术 Q2 ANATOMY & MORPHOLOGY Microscopy Research and Technique Pub Date : 2024-12-02 DOI:10.1002/jemt.24750

Tanzeela Fazal, Sajid Mahmood, Bushra Ismail, Mazloom Shah, Ammar Zidan, Ali Bahadur, Shahid Iqbal, Komal Rizwan, Shahid Alam, Fayyaz Ali, Abd-ElAziem Farouk, Salman Aloufi

{"title":"Band Gap Engineering of Binary and Cobalt-Doped PbS Thin Films Integrated by SILAR Method for Optoelectronic Potentials.","authors":"Tanzeela Fazal, Sajid Mahmood, Bushra Ismail, Mazloom Shah, Ammar Zidan, Ali Bahadur, Shahid Iqbal, Komal Rizwan, Shahid Alam, Fayyaz Ali, Abd-ElAziem Farouk, Salman Aloufi","doi":"10.1002/jemt.24750","DOIUrl":null,"url":null,"abstract":"Thin films of PbS, both undoped and cobalt-doped (Co-PbS), were produced on glass substrates using the straightforward and controllable approach of sequential ionic layer adsorption and reaction (SILAR). The reactive substances employed to deposit the PbS thin films were lead nitrate (Pb(NO3)2), cobalt nitrate (Co(NO₃)₂(H₂O)₆), sodium thiosulphate (Na2S2O3) and H2O for different dipping concentrations of lead and cobalt. The films were adherent to the substrate and were compact, and crack-free with a shiny silver color. The films were structurally characterized by XRD and were found well crystallized according to the face-centered cubic formation. The films were optically characterized by the UV-Vis. spectrophotometer and absorption were found stronger in the UV and UV-Vis. region and then diminishes. Band gaps were determined to be between 1.8 eV and 2.2 eV, making them significant materials with the option of band gap engineering according to the desire by manipulating the compositions.","PeriodicalId":18684,"journal":{"name":"Microscopy Research and Technique","volume":" ","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microscopy Research and Technique","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1002/jemt.24750","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ANATOMY & MORPHOLOGY","Score":null,"Total":0}

引用次数: 0

Abstract

Thin films of PbS, both undoped and cobalt-doped (Co-PbS), were produced on glass substrates using the straightforward and controllable approach of sequential ionic layer adsorption and reaction (SILAR). The reactive substances employed to deposit the PbS thin films were lead nitrate (Pb(NO₃)₂), cobalt nitrate (Co(NO₃)₂(H₂O)₆), sodium thiosulphate (Na₂S₂O₃) and H₂O for different dipping concentrations of lead and cobalt. The films were adherent to the substrate and were compact, and crack-free with a shiny silver color. The films were structurally characterized by XRD and were found well crystallized according to the face-centered cubic formation. The films were optically characterized by the UV-Vis. spectrophotometer and absorption were found stronger in the UV and UV-Vis. region and then diminishes. Band gaps were determined to be between 1.8 eV and 2.2 eV, making them significant materials with the option of band gap engineering according to the desire by manipulating the compositions.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

用SILAR方法集成二元和钴掺杂PbS薄膜的光电势带隙工程。

采用顺序离子层吸附和反应（SILAR）的直接可控方法，在玻璃衬底上制备了未掺杂和掺杂钴的PbS薄膜。沉积PbS薄膜的活性物质分别是硝酸铅（Pb(NO3)2）、硝酸钴（Co（NO₃）₂（H₂O）₆）、硫代硫酸钠（Na2S2O3）和不同浸提浓度的水。薄膜粘附在基材上，致密，无裂纹，呈闪亮的银色。用XRD对薄膜进行了结构表征，发现薄膜具有良好的面心立方结构。用紫外-可见光谱对膜进行了光学表征。紫外和紫外-可见紫外吸收较强。区域，然后减少。带隙被确定在1.8 eV和2.2 eV之间，使其成为重要的材料，可以根据需要通过操纵成分来选择带隙工程。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Microscopy Research and Technique 医学-解剖学与形态学

CiteScore

5.30

自引率

20.00%

发文量

233

审稿时长

4.7 months

期刊介绍： Microscopy Research and Technique (MRT) publishes articles on all aspects of advanced microscopy original architecture and methodologies with applications in the biological, clinical, chemical, and materials sciences. Original basic and applied research as well as technical papers dealing with the various subsets of microscopy are encouraged. MRT is the right form for those developing new microscopy methods or using the microscope to answer key questions in basic and applied research.