Crystallinity and adhesiveness improvements of Ag thin films by Bi- and Sb-assisted growth

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Applied Physics A Pub Date : 2024-12-05 DOI:10.1007/s00339-024-08156-5
Naoki Nishimoto, Junko Fujihara
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Abstract

Ag thin films are used in a variety of electrical devices, but they easily condense owing to the low cohesive energy of Ag. In this study, Bi- and Sb-assisted growth techniques were utilized to improve the stability of Ag thin films. Thin films of Ag, Bi-doped Ag, and Sb-doped Ag were deposited on polyimide (PI) films at 160 and 320 °C by radio frequency magnetron sputtering. The thin-film orientation and strain were determined by analyzing the X-ray diffraction patterns. In addition, the adhesiveness between the thin films and PI substrates was evaluated by immersion tests. The [111] growth of the Ag thin films was assisted by Bi at 160 °C and by Sb at 320 °C, where the (111) orientation possesses the lowest surface energy for the face-centered cubic structure of the Ag thin films. The strain present in the PI film was not applied to the grown thin films. Doping with Bi or Sb decreased the thin-film strain and prevented the detachment of the Ag thin film from the PI film in pH 9 buffer, with the exception of the Sb-doped Ag thin film grown at 160 °C, which exhibited non-uniform growth. Thus, Bi or Sb doping can suppress the condensation of Ag thin films by enhancing their (111) orientation and adhesiveness to the substrate. The obtained results indicate that Bi- and Sb-assisted growth techniques can stabilize Ag thin films and improve the reliability of devices based on these films.

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铋和锑辅助生长对银薄膜结晶度和粘附性的改善
银薄膜用于各种电子器件,但由于银的低凝聚力,它们容易凝结。在本研究中,利用Bi和sb辅助生长技术来提高银薄膜的稳定性。采用射频磁控溅射的方法,在160℃和320℃的温度下,在聚酰亚胺(PI)薄膜上沉积了Ag、bi掺杂Ag和sb掺杂Ag薄膜。通过对x射线衍射图的分析,确定了薄膜的取向和应变。此外,通过浸渍试验评价了薄膜与PI衬底之间的粘附性。Bi和Sb分别在160°C和320°C的温度下促进了Ag薄膜的[111]生长,其中(111)取向对Ag薄膜的面心立方结构具有最低的表面能。在PI薄膜中存在的应变不应用于生长的薄膜。在pH为9的缓冲液中,掺杂Bi或Sb降低了薄膜应变,阻止了Ag薄膜与PI薄膜的分离,但在160°C下生长的掺杂Sb的Ag薄膜表现出不均匀生长。因此,Bi或Sb掺杂可以通过增强银薄膜的(111)取向和对衬底的粘附性来抑制银薄膜的缩合。结果表明,Bi和sb辅助生长技术可以稳定银薄膜,提高基于这些薄膜的器件的可靠性。
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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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