Polarization-Induced Internal Electric Field-Dominated S-Scheme KNbO3-CuO Heterojunction for Photoreduction of CO2 with High CH4 Selectivity.

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-12-18 Epub Date: 2024-12-04 DOI:10.1021/acsami.4c16163
Fei Liu, Pengfei Li, Zoufei Du, Lidan Lan, Haijiao Xie, Yi Dan, Yun Huang, Long Jiang
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Abstract

The polarization-induced internal electric field (IEF) in ferroelectric materials could promote photogenerated charge transfer across the heterojunction interface, but the effect of polarization-induced IEF on the mechanism of photogenerated charge transfer is ambiguous. In this study, a KNbO3-CuO heterojunction was synthesized by depositing copper oxide (CuO) onto KNbO3. Incorporating CuO broadens the light absorption of KNbO3, thereby enhancing the dissociation of the photogenerated charges. The results show that the polarization-induced IEF in KNbO3 determines that the charge transport mechanism in the KNbO3-CuO heterojunction follows the S-scheme. Owing to the S-scheme heterojunctions and efficient CO2 capture and activation by CuO, the CH4 production rate of KNbO3-CuO increased by nearly 26 times compared to KNbO3. Additionally, the CH4 selectivity of KNbO3-CuO could reach up to 97.80%. This research offers valuable insights into enhancing the photogenerated charge separation and constructing heterojunctions.

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极化诱导内电场主导S-Scheme KNbO3-CuO异质结光还原CO2的高CH4选择性。
铁电材料中的极化内电场(IEF)可以促进光生电荷在异质结界面上的转移,但其对光生电荷转移机制的影响尚不明确。在本研究中,通过在KNbO3上沉积氧化铜(CuO)合成了KNbO3-CuO异质结。加入CuO扩大了KNbO3的光吸收,从而增强了光生电荷的解离。结果表明,KNbO3中极化诱导的IEF决定了KNbO3- cuo异质结中的电荷输运机制遵循s模式。由于s型异质结和CuO对CO2的高效捕获和活化,KNbO3-CuO的CH4产率比KNbO3提高了近26倍。此外,KNbO3-CuO的CH4选择性可达97.80%。该研究为增强光生电荷分离和构建异质结提供了有价值的见解。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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