Recent advances in non-ionic surfactant templated synthesis of porous metal oxide semiconductors for gas sensing applications

IF 33.6 1区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Progress in Materials Science Pub Date : 2024-12-06 DOI:10.1016/j.pmatsci.2024.101409
Jinwu Hu, Yidong Zou, Yu Deng, Hui-Jun Li, Hui Xu, Ding Wang, Limin Wu, Yonghui Deng, Guisheng Li
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Abstract

With the advancement of nanomaterials science and technology, metal oxide semiconductor (MOS) has been extensively explored to develop high-performance gas sensors for various applications, especially in environmental protection, chemical industry, food safety, and disease precaution. Among various nanostructure, porous MOS materials have garnered significant attention for their outstanding features including abundant interconnected pores, numerous active sites and high specific surface area, which are particularly favorable to enhance gas–solid interactions in gas sensing. The non-ionic surfactant templates are commonly used to synthesize porous MOS because they can precisely control the porous parameters including pore structure, size, wall thickness and the pore wall surface chemistry. This review aims to present a thorough and critical analysis of the advancements and current state of porous MOS sensitive materials synthesized by non-ionic surfactant template, focusing on their designed synthesis, gas sensing performance and novel mechanism. The classification and definition of common non-ionic templates in the field of gas sensing are summarized, and the advantages of non-ionic templates in the synthesis of porous MOS are discussed. By virtue of the porosity of the as-synthesized high-crystallinity MOS materials, the sensitization strategies of porous MOS materials, including noble metal sensitization, heteroatom doping, heterojunction design, and multicomponent recombination, were also systematically reviewed and discussed. Lastly, we summarized the development trends and challenges of porous MOS sensitive materials synthesized by non-ionic template.

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非离子表面活性剂模板合成多孔金属氧化物半导体的研究进展
随着纳米材料科学技术的进步,金属氧化物半导体(MOS)被广泛地应用于开发高性能气体传感器,特别是在环境保护、化学工业、食品安全、疾病预防等领域。在各种纳米结构中,多孔MOS材料以其丰富的互连孔、众多的活性位点和高比表面积等突出的特点,尤其有利于在气敏中增强气固相互作用而备受关注。非离子表面活性剂模板可以精确地控制孔隙结构、孔径、壁厚和孔壁表面化学等孔隙参数,是制备多孔MOS的常用模板。本文综述了非离子表面活性剂模板制备多孔MOS敏感材料的研究进展和现状,重点介绍了其设计合成方法、气敏性能和新型机理。综述了气敏领域常用的非离子模板的分类和定义,讨论了非离子模板在多孔MOS合成中的优势。利用所合成的高结晶度MOS材料的多孔性,对贵金属敏化、杂原子掺杂、异质结设计和多组分复合等多孔MOS材料的敏化策略进行了系统的评述和讨论。最后,总结了非离子模板法合成多孔MOS敏感材料的发展趋势和面临的挑战。
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来源期刊
Progress in Materials Science
Progress in Materials Science 工程技术-材料科学:综合
CiteScore
59.60
自引率
0.80%
发文量
101
审稿时长
11.4 months
期刊介绍: Progress in Materials Science is a journal that publishes authoritative and critical reviews of recent advances in the science of materials. The focus of the journal is on the fundamental aspects of materials science, particularly those concerning microstructure and nanostructure and their relationship to properties. Emphasis is also placed on the thermodynamics, kinetics, mechanisms, and modeling of processes within materials, as well as the understanding of material properties in engineering and other applications. The journal welcomes reviews from authors who are active leaders in the field of materials science and have a strong scientific track record. Materials of interest include metallic, ceramic, polymeric, biological, medical, and composite materials in all forms. Manuscripts submitted to Progress in Materials Science are generally longer than those found in other research journals. While the focus is on invited reviews, interested authors may submit a proposal for consideration. Non-invited manuscripts are required to be preceded by the submission of a proposal. Authors publishing in Progress in Materials Science have the option to publish their research via subscription or open access. Open access publication requires the author or research funder to meet a publication fee (APC). Abstracting and indexing services for Progress in Materials Science include Current Contents, Science Citation Index Expanded, Materials Science Citation Index, Chemical Abstracts, Engineering Index, INSPEC, and Scopus.
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