Scalable Large-Signal Modeling for GaN HEMTs Including Kink Effect

0 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE microwave and wireless technology letters Pub Date : 2024-10-09 DOI:10.1109/LMWT.2024.3471874
Jing Bai;Ao Zhang;Jianjun Gao
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Abstract

An improved scalable large-signal model for gallium nitride high-electron-mobility transistors (GaN HEMTs) based on the EEHEMT model is proposed. The derived DC model can accurately predict the current-voltage behavior including the kink effect over a wide range of bias points by introducing the parameter $V_{\textrm {kink}}$ and new equations using fitting parameters. To ensure the scalability of the model, the scaling rules are modified. The proposed model has been validated by comparing the measured and modeled DC I–V characteristics and multibias scattering parameters (S-parameters) up to 40 GHz for GaN HEMTs with different gate widths including $2\times 25~\mu $ m, $2\times 50~\mu $ m, $2\times 75~\mu $ m, and $2\times 100~\mu $ m gate width (number of gate fingers $\times $ unit gate width).
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含扭结效应的GaN hemt可扩展大信号建模
在EEHEMT模型的基础上,提出了一种改进的氮化镓高电子迁移率晶体管(GaN hemt)的可扩展大信号模型。通过引入参数$V_{\textrm {kink}}$和使用拟合参数的新方程,推导出的直流模型可以准确地预测包括偏置点上的扭结效应在内的电流-电压行为。为了保证模型的可扩展性,修改了伸缩规则。通过比较实测和建模的直流I-V特性和高达40 GHz的多偏置散射参数(s参数),验证了所提出的模型,该模型适用于不同栅极宽度的GaN hemt,栅极宽度包括$2 × 25~\mu $ m、$2 × 50~\mu $ m、$2 × 75~\mu $ m和$2 × 100~\mu $ m栅极宽度(栅极指数$\乘以$单位栅极宽度)。
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