A 15.4-ppm/°C GaN-Based Voltage Reference With Process-Variation-Immunity and High PSR for Electric Vehicle Power Systems

IF 2.2 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE IEEE Solid-State Circuits Letters Pub Date : 2024-12-02 DOI:10.1109/LSSC.2024.3510597
Po-Jui Chiu;Chi-Yu Chen;Xiao-Quan Wu;Yu-Ting Huang;Tz-Wun Wang;Sheng-Hsi Hung;Ke-Horng Chen;Kuo-Lin Zheng;Chih-Chen Li
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引用次数: 0

Abstract

The proposed gallium nitride (GaN)-based voltage reference ( $V_{\mathrm { REF}}$ ) generator has a low temperature coefficient (TC) of 15.4 ppm/°C, small $V_{\mathrm { REF}}$ deviation at different process corners (standard deviation of 0.22%), line sensitivity as low as 0.0023%/V, and high power supply rejection (PSR) of −187 and −114 dB at 100 Hz and 50 MHz, respectively. The proportional-to-absolute-temperature (PTAT) gate current for enhancement-mode GaN (eGaN) optimizes TC. Eliminating depletion-mode GaN (dGaN) gate leakage and using multiple stacked composite dGaNs can improve line regulation and PSR. All performance is achieved with a low power consumption of $10.9~\mu $ W.
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一种15.4 ppm/°C、过程抗扰度和高PSR的基于gan的电动汽车电源基准电压
所提出的基于氮化镓(GaN)的参考电压发生器($V_{\ maththrm {REF}}$)具有15.4 ppm/°C的低温系数(TC),在不同工艺角的$V_{\ maththrm {REF}}$偏差较小(标准差为0.22%),线路灵敏度低至0.0023%/V,在100 Hz和50 MHz时电源抑制(PSR)分别为- 187和- 114 dB。增强模式GaN (eGaN)的比例-绝对温度(PTAT)栅极电流优化了TC。消除耗尽型GaN (dGaN)栅极泄漏和使用多个堆叠的复合dGaN可以改善线路调节和PSR。所有的性能都是在低功耗10.9~\mu $ W的情况下实现的。
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来源期刊
IEEE Solid-State Circuits Letters
IEEE Solid-State Circuits Letters Engineering-Electrical and Electronic Engineering
CiteScore
4.30
自引率
3.70%
发文量
52
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