B. Wicher, V. Rogoz, J. Lu, K. Kulikowski, A. Lachowski, S. Kolozsvári, P. Polcik, G. Greczynski
{"title":"The crucial influence of Al on the high-temperature oxidation resistance of Ti1-xAlxBy diboride thin films (0.36 ≤ x ≤ 0.74, 1.83 ≤ y ≤ 2.03)","authors":"B. Wicher, V. Rogoz, J. Lu, K. Kulikowski, A. Lachowski, S. Kolozsvári, P. Polcik, G. Greczynski","doi":"10.1016/j.apsusc.2024.162081","DOIUrl":null,"url":null,"abstract":"The high-temperature oxidation resistance and mechanical properties of Ti<sub>1-x</sub>Al<sub>x</sub>B<sub>y</sub> (0.36 ≤ x ≤ 0.74, and 1.83 ≤ y ≤ 2.03) films grown by hybrid HiPIMS/DCMS co-sputtering from TiB<sub>2</sub> and AlB<sub>2</sub> targets at substrate temperatures (<180 °C) are studied. The air-annealing experiments conducted at temperatures ranging from 700 to 900 °C reveal a strong correlation between the starting Al concentration and the oxidation resistance. Low Al content films (x ≤ 0.49 ± 0.03 in the as-deposited state) show higher oxidation rates and develop B-depleted porous oxide scales as the original film is consumed. In contrast, oxides growing on top of high-Al content films (x ≥ 0.58 ± 0.03) are compact, composed of amorphous alumina (Al<sub>2</sub>O<sub>3</sub>) and borate (Al<sub>18</sub>B<sub>4</sub>O<sub>33</sub>), which passivate the surface against oxidation effectively. Oxide scales on films with x ≥ 0.58 are, on average, 60 % harder and have 18 % higher elastic moduli. The hardest scale grew on the Ti<sub>0.42</sub>Al<sub>0.58</sub>B<sub>1.87</sub> film, with the nanoindentation hardness of 27.3 ± 2.7 GPa, which is comparable to that of as-deposited TiAlN, used widely for high-temperature wear protection. Electron microscopy also shows that for x ≥ 0.58 ± 0.03, the oxide scales adhere well to the bottom unoxidized portions of Ti<sub>1-x</sub>Al<sub>x</sub>B<sub>y</sub> film, which is explained by a better match of the respective thermal expansion coefficients.","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"86 1","pages":""},"PeriodicalIF":6.3000,"publicationDate":"2024-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Surface Science","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.apsusc.2024.162081","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
The high-temperature oxidation resistance and mechanical properties of Ti1-xAlxBy (0.36 ≤ x ≤ 0.74, and 1.83 ≤ y ≤ 2.03) films grown by hybrid HiPIMS/DCMS co-sputtering from TiB2 and AlB2 targets at substrate temperatures (<180 °C) are studied. The air-annealing experiments conducted at temperatures ranging from 700 to 900 °C reveal a strong correlation between the starting Al concentration and the oxidation resistance. Low Al content films (x ≤ 0.49 ± 0.03 in the as-deposited state) show higher oxidation rates and develop B-depleted porous oxide scales as the original film is consumed. In contrast, oxides growing on top of high-Al content films (x ≥ 0.58 ± 0.03) are compact, composed of amorphous alumina (Al2O3) and borate (Al18B4O33), which passivate the surface against oxidation effectively. Oxide scales on films with x ≥ 0.58 are, on average, 60 % harder and have 18 % higher elastic moduli. The hardest scale grew on the Ti0.42Al0.58B1.87 film, with the nanoindentation hardness of 27.3 ± 2.7 GPa, which is comparable to that of as-deposited TiAlN, used widely for high-temperature wear protection. Electron microscopy also shows that for x ≥ 0.58 ± 0.03, the oxide scales adhere well to the bottom unoxidized portions of Ti1-xAlxBy film, which is explained by a better match of the respective thermal expansion coefficients.
期刊介绍:
Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.