Predicting and understanding vacancy-modified oxygen diffusion in dilute Ni-based alloys by first-principles calculations

IF 8.3 1区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Acta Materialia Pub Date : 2024-12-17 DOI:10.1016/j.actamat.2024.120664
Shun-Li Shang, Michael C. Gao, Zi-Kui Liu
{"title":"Predicting and understanding vacancy-modified oxygen diffusion in dilute Ni-based alloys by first-principles calculations","authors":"Shun-Li Shang, Michael C. Gao, Zi-Kui Liu","doi":"10.1016/j.actamat.2024.120664","DOIUrl":null,"url":null,"abstract":"Controlling oxygen (O) diffusion is critical to materials synthesis, materials degradation, and their oxidation and hot corrosion protection. Herein we investigate O diffusion in dilute Ni-based alloys Ni<sub>30</sub>VaXO by density functional theory (DFT) based transition state theory using a vacancy (Va) modified mechanism, where X represents 22 alloying elements. The diffusion jump rates are predicted by DFT-based phonon calculations and the quasiharmoinc approach (QHA). It is found that the reactive elements (e.g., Y, Hf, Al, and Cr) that form oxides easily increase O diffusivity while the noble Pt-group elements (e.g., Pt, Pd, Ir, and Rh) that are difficult to oxidize decrease O diffusivity in Ni-based alloys. These results indicate that the bonding strength between X and O, determinable by Ellingham diagram, plays a critical role in affecting O diffusion in Ni. Correlation analysis by means of linear fitting, sequential feature selection, and Shapley value indicates that O diffusivity in Ni<sub>30</sub>VaXO connects closely to the electronic structures of alloying elements X, such as work function, electronegativity, and valence electrons. In addition, the identified outliers by correlation analysis are mainly alloying elements Y and Mn to correlate O diffusion in Ni<sub>30</sub>VaXO.","PeriodicalId":238,"journal":{"name":"Acta Materialia","volume":"11 1","pages":""},"PeriodicalIF":8.3000,"publicationDate":"2024-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Acta Materialia","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.actamat.2024.120664","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Controlling oxygen (O) diffusion is critical to materials synthesis, materials degradation, and their oxidation and hot corrosion protection. Herein we investigate O diffusion in dilute Ni-based alloys Ni30VaXO by density functional theory (DFT) based transition state theory using a vacancy (Va) modified mechanism, where X represents 22 alloying elements. The diffusion jump rates are predicted by DFT-based phonon calculations and the quasiharmoinc approach (QHA). It is found that the reactive elements (e.g., Y, Hf, Al, and Cr) that form oxides easily increase O diffusivity while the noble Pt-group elements (e.g., Pt, Pd, Ir, and Rh) that are difficult to oxidize decrease O diffusivity in Ni-based alloys. These results indicate that the bonding strength between X and O, determinable by Ellingham diagram, plays a critical role in affecting O diffusion in Ni. Correlation analysis by means of linear fitting, sequential feature selection, and Shapley value indicates that O diffusivity in Ni30VaXO connects closely to the electronic structures of alloying elements X, such as work function, electronegativity, and valence electrons. In addition, the identified outliers by correlation analysis are mainly alloying elements Y and Mn to correlate O diffusion in Ni30VaXO.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
通过第一原理计算预测和理解稀镍基合金中的空位改性氧扩散
控制氧(O)扩散对材料合成、材料降解、材料氧化和热腐蚀保护至关重要。在此,我们采用基于密度泛函理论(DFT)的过渡态理论,利用空位(Va)修正机制(其中 X 代表 22 种合金元素)研究了稀镍基合金 Ni30VaXO 中的 O 扩散。基于 DFT 的声子计算和准谐波方法 (QHA) 预测了扩散跃迁率。研究发现,容易形成氧化物的活性元素(如 Y、Hf、Al 和 Cr)会增加 O 的扩散率,而难以氧化的铂族惰性元素(如 Pt、Pd、Ir 和 Rh)会降低 O 在镍基合金中的扩散率。这些结果表明,X 与 O 之间的键合强度(可通过埃林厄姆图确定)在影响 Ni 中 O 的扩散方面起着关键作用。通过线性拟合、序列特征选择和 Shapley 值进行的相关性分析表明,Ni30VaXO 中 O 的扩散性与合金元素 X 的电子结构(如功函数、电负性和价电子)密切相关。此外,通过相关分析确定的异常值主要是合金元素 Y 和 Mn,从而与 Ni30VaXO 中的 O 扩散相关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Acta Materialia
Acta Materialia 工程技术-材料科学:综合
CiteScore
16.10
自引率
8.50%
发文量
801
审稿时长
53 days
期刊介绍: Acta Materialia serves as a platform for publishing full-length, original papers and commissioned overviews that contribute to a profound understanding of the correlation between the processing, structure, and properties of inorganic materials. The journal seeks papers with high impact potential or those that significantly propel the field forward. The scope includes the atomic and molecular arrangements, chemical and electronic structures, and microstructure of materials, focusing on their mechanical or functional behavior across all length scales, including nanostructures.
期刊最新文献
Twin nucleation at grain boundaries in Mg analyzed through in situ electron back-scatter diffraction and high-resolution digital image correlation Unusually large oxygen non-stoichiometry and defect thermodynamics in Sr4Mn2–xFe1+xO10–δ Ruddlesden-Popper layered oxides Grain size dependence of microscopic strain distribution in a high entropy alloy at the onset of plastic deformation S-scheme MoSi2N4/AlN with a 2D heterojunction for photocatalytic water dissociation Novel 3-3-like heterostructure engineering enables BaTiO3-based ferroelectric ceramics with superior electrocaloric performance
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1