Selective etching of Aluminium towards the synthesis of AlB2 derived aqueous dispersion of luminescent boron-based Nanosheets

IF 2.5 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Applied Physics A Pub Date : 2024-12-18 DOI:10.1007/s00339-024-08171-6
M. Anupama, Reeja Gopalakrishnan Nair, Aji A. Anappara
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Abstract

The selective extraction of metal atoms interspersed between the boron layers in the bulk metal diboride crystals - which are layered ionic solids akin to ion-intercalated graphene - offer a promising route for fabricating boron-based two-dimensional nanosystems. This study introduces an eco-friendly and cost-effective synthesis method utilizing the non-toxic citric acid and the green oxidant- hydrogen peroxide, to selectively etch aluminum atoms from the layered aluminium diboride crystals in powder form. Performed under ambient conditions with simple magnetic stirring, this synthesis route is both sustainable and scalable for industrial use. The resulting non-stochiometric, free-standing, aluminium diboride-derived, highly boron-rich nanostructures were found to be chemically functionalized with hydroxyl, hydride and oxide functional groups. In addition to endowing excellent dispersion stability, the surface moities created defect centers in the nanosheets, which, in turn, accounted for excellent photoluminescence properties. Thus, this synthesis process provides an opportunity to harness the astounding capabilities of boron in its nanodomain.

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铝的选择性蚀刻合成由AlB2衍生的发光硼基纳米片水分散体
选择性提取分散在大块金属二硼化物晶体(类似于离子嵌入石墨烯的分层离子固体)中硼层之间的金属原子,为制造硼基二维纳米系统提供了一条有前途的途径。本研究介绍了一种环保、经济的合成方法,利用无毒的柠檬酸和绿色氧化剂过氧化氢,选择性地从层状二硼化铝晶体中蚀刻出粉末形式的铝原子。在环境条件下进行简单的磁搅拌,这种合成路线既可持续又可扩展,可用于工业用途。由此产生的非化学计量的、独立的、二硼化铝衍生的、高度富硼的纳米结构被羟基、氢化物和氧化物官能团化学官能团化。除了具有优异的分散稳定性外,表面运动还在纳米片中产生缺陷中心,这反过来又解释了优异的光致发光性能。因此,这个合成过程提供了一个利用硼在其纳米领域的惊人能力的机会。
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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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