The Failure Mechanism of Internal Circuit During ESD Striking a Power to Another Power

IF 2.5 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Device and Materials Reliability Pub Date : 2024-09-24 DOI:10.1109/TDMR.2024.3467116
Chih-Cherng Liao;Ching-Ho Li;Karuna Nidhi;Chieh-Yao Chuang;Hsien-Feng Liao;Yeh-Ning Jou;Ke-Horng Chen;Jian-Hsing Lee
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Abstract

Although power supply stressed with respect to another supply is one test items of the electrostatic-discharge (ESD) qualification. However, a current path still exists that has not been reported earlier. From the failure analysis result, the damage is located at the high-voltage N-Well (HVNW) guard-ring of the zapped power domain. Based on the TCAD simulation, the failure mechanism is identified, and shows good agreement with silicon. It proves that the ESD current can only flow through the internal circuit of the zapped power domain and P+ guard-ring (VSS) to become a quiescent current before the power clamp device turns on. So, the internal circuit of the zapped power domain and P+ guard-ring become a substrate triggering circuit to turn on the parasitic npn bipolar between two different power domains, resulting in most ESD current flowing through HVNW guard-rings to induce the damage.
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ESD对电源冲击时内部电路的失效机理
虽然电源相对于其他电源的受力是静电放电(ESD)资格的一个测试项目。然而,当前的路径仍然存在,这是之前没有报道的。从失效分析结果来看,损伤部位位于被击穿电源域的高压n井(HVNW)保护环。在TCAD仿真的基础上,确定了其失效机理,并与硅的失效机理吻合良好。证明了在电源钳位器件导通之前,ESD电流只能流过被击穿的功率域和P+保护环(VSS)的内部电路,成为静态电流。因此,被击穿的功率域和P+保护环的内部电路成为衬底触发电路,打开两个不同功率域之间的寄生npn双极,导致大部分ESD电流流过HVNW保护环,从而诱发损坏。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Device and Materials Reliability
IEEE Transactions on Device and Materials Reliability 工程技术-工程:电子与电气
CiteScore
4.80
自引率
5.00%
发文量
71
审稿时长
6-12 weeks
期刊介绍: The scope of the publication includes, but is not limited to Reliability of: Devices, Materials, Processes, Interfaces, Integrated Microsystems (including MEMS & Sensors), Transistors, Technology (CMOS, BiCMOS, etc.), Integrated Circuits (IC, SSI, MSI, LSI, ULSI, ELSI, etc.), Thin Film Transistor Applications. The measurement and understanding of the reliability of such entities at each phase, from the concept stage through research and development and into manufacturing scale-up, provides the overall database on the reliability of the devices, materials, processes, package and other necessities for the successful introduction of a product to market. This reliability database is the foundation for a quality product, which meets customer expectation. A product so developed has high reliability. High quality will be achieved because product weaknesses will have been found (root cause analysis) and designed out of the final product. This process of ever increasing reliability and quality will result in a superior product. In the end, reliability and quality are not one thing; but in a sense everything, which can be or has to be done to guarantee that the product successfully performs in the field under customer conditions. Our goal is to capture these advances. An additional objective is to focus cross fertilized communication in the state of the art of reliability of electronic materials and devices and provide fundamental understanding of basic phenomena that affect reliability. In addition, the publication is a forum for interdisciplinary studies on reliability. An overall goal is to provide leading edge/state of the art information, which is critically relevant to the creation of reliable products.
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2024 Index IEEE Transactions on Device and Materials Reliability Vol. 24 Table of Contents Blank Page IEEE Transactions on Device and Materials Reliability Information for Authors TechRxiv: Share Your Preprint Research with the World!
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