Wide Bandwidth, High Power Radio Frequency Limiter Based on Lanthanum Cobalt Oxide on SiC

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Electron Devices Pub Date : 2024-12-05 DOI:10.1109/TED.2024.3506500
Rajashree Bhattacharya
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Abstract

The insulator-to-metal phase transition oxides offer an opportunity to overcome the current constraints in RF limiter technology. In this article, we present shunt power limiters based on sputtered lanthanum cobalt oxide (LaCoO3, LCO) on silicon carbide substrate. The LCO limiters presented in this article achieve limiting behavior over the broadest temperature range ever reported for an insulator to metal transition (IMT) material-based RF switch, from 10 °C to 225 °C. At 2 GHz, the power limiter provides <1-dB insertion loss up to 75 °C, resilience up to 40 dBm, and leakage power of 20 dBm. S-parameter testing was conducted from 0.1 to 50 GHz, verifying the broadband viability of LCO microwave devices. We present low small signal losses at high temperature and frequency, with a maximum insertion loss of 1.15 dB at 125 °C and 50 GHz. Finally, we report on a 3-D multiphysics model that accurately predicts the LCO RF device behavior and can be used for further device optimization.
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基于SiC上氧化镧的宽带高功率射频限频器
绝缘体到金属的相变氧化物为克服目前射频限制器技术的限制提供了一个机会。在本文中,我们提出了基于碳化硅衬底上溅射氧化镧(LaCoO3, LCO)的并联功率限制器。本文中介绍的LCO限制器在迄今为止报道的基于绝缘体到金属过渡(IMT)材料的射频开关的最宽温度范围(从10°C到225°C)内实现了限制行为。在2ghz时,功率限制器在75°C下提供< 1db的插入损耗,弹性高达40dbm,泄漏功率为20dbm。在0.1 ~ 50 GHz范围内进行s参数测试,验证了LCO微波器件的宽带可行性。我们在高温和高频率下提供低小信号损耗,在125°C和50 GHz时最大插入损耗为1.15 dB。最后,我们报告了一个三维多物理场模型,该模型可以准确地预测LCO射频器件的行为,并可用于进一步的器件优化。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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